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Jin Shang

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Jin Shang

City University of Hong Kong, China

Prof. Jin Shang holds a tenured position as an Associate Professor at the City University of Hong Kong, where he heads the Adsorption Separation Lab in the School of Energy and Environment. A seasoned chemical engineer, Prof. Shang's expertise lies in adsorption-based gas separation technology, specifically focusing on carbon capture, carbon removal, natural gas and hydrogen purification, and the extraction of ambient toxic gases or vapors. His research aims to understand the fundamental physical chemistry of molecular adsorption, using a blend of experimental and computational methods to engineer designer adsorbents and develop adsorption processes. Prof. Shang is credited with discovering the molecular trapdoor mechanism, a new gas separation method recognized as the 4th mechanism for adsorptive gas separation. This discovery has shown the highest CO2 selectivity in natural gas purification. His work on carbon capture technology spans adsorbent materials design, separation process development, and demonstration. He has been recognized for his contributions with several prestigious awards, such as the Carbon Capture Award for Mid-career Researcher from the International Association for Carbon Capture and Surface Measurement Systems in 2024, and the ISTP-Bogen Young Scientist Award by the International Congress on Separation and Purification Technology in 2022. Prof. Shang also serves as an editorial role for several esteemed journals in his field, including senior editor for Cambridge Prisms: Carbon Technologies, Associate Editor (Separation Processes) for Frontiers in Chemical Engineering, and editor for Carbon Capture Science & Technology. He also served as a guest editor for Separation and Purification Technology and Environment International. As of June 2024, Prof. Shang has published over 110 papers in high-impact journals, with an h-index of 48 and more than 5900 citations. He was named among Stanford's top 2% most highly cited scientists in 2022 and 2023.