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Handbook of Ion Beam Processing Technology - 1st Edition - ISBN: 9780815511991

Handbook of Ion Beam Processing Technology

1st Edition

Principles, Deposition, Film Modification and Synthesis

Authors: Jerome J. Cuomo Stephen M. Rossnagel Harold R. Kaufman
Hardcover ISBN: 9780815511991
Imprint: William Andrew
Published Date: 31st December 1989
Page Count: 456
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Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.


Engineers, technicians, and plant personnel in the semiconductor and related industries.

Table of Contents

  1. Perspective on Past, Present and Future Uses of Ion Beam Technology
    1.1 Introduction
    1.2 Past Technology
    1.3 Present Capabilities
    1.4 Future Trends
    1.5 References
    Part I. Ion Beam Technology
    2. Gridded Broad-beam Ion Sources
    2.1 Introduction
    2.2 General Description
    2.3 Discharge Chamber
    2.4 Ion Optics
    2.5 Production Applications
    2.6 Target Contamination
    2.7 Concluding Remarks
    2.8 References
    3. ECR Ion Sources
    3.1 Introduction
    3.2 Theory of Operation
    3.3 Types of Sources and Characteristics
    3.4 Etching
    3.5 Deposition
    3.6 References
    4. Hall Effect Ion Sources
    4.1 Introduction
    4.2 End-hall Ion Source
    4.3 Closed Drift Ion Source
    4.4 Concluding Remarks
    4.5 References
    5. Ionized Cluster Beam (ICB) Deposition and Epitaxy
    5.1 Introduction
    5.2 Experiment
    5.3 Aspects of Film Deposition with ICB
    5.4 Summary
    5.5 References
    Part II. Sputtering Phenomena
    6. Quantitative Sputtering
    6.1 Introduction
    6.2 Total Sputter Yield Considerations
    6.3 Differential Sputter Yield Considerations
    6.4 Experimental Considerations for Sputter Yield Measurements
    6.5 Total Sputter Yield Measurements
    6.6 Differential Yield Measurements: Angular and Energy Distributions
    6.7 Concluding Remarks
    6.8 References
    7. Laser-induced Fluorescence as a Tool for the Study of Ion Beam Sputtering
    7.1 Introduction
    7.2 Experimental Technique
    7.3 Summary of Data
    7.4 Conclusion
    7.5 References
    8. Characterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization Detection
    8.1 Introduction
    8.2 Analytical Applications
    8.3 Energy and Angle Measurements
    8.4 Nonresonant Multiphoton lonization
    8.5 Conclusion
    8.6 References
    9. The Application of Postionization for Sputtering Studies and Surface or Thin Film Analysis
    9.1 Introduction
    9.2 Postionization Techniques Using Penning Processes
    9.3 Electron Gas Postionization in Low Pressure Plasmas
    9.4 Summary
    9.5 References

    Part III. Film Modification and Synthesis
    10. The Modification of Films by Ion Bombardment
    10.1 Introduction
    10.2 Experimental Concerns for Bombardment-modification of Films
    10.3 Effects on Film Properties by Energetic Bombardment
    10.4 Reactive Film Deposition
    10.5 Summary
    10.6 References
    11. Control of Film Properties by Ion-assisted Deposition Using Broad Beam Sources
    11.1 Introduction
    11.2 Property Changes
    11.3 Film Structure Modification
    11.4 General Discussion of Ion Bombardment Mechanisms
    11.5 References
    12. Etching with Directed Beams
    12.1 Introduction
    12.2 Ion Beam Assisted Etching
    12.3 Etching GaAs
    12.4 Etching Diamond
    12.5 Hot Jet Etching
    12.6 Etching Damage
    12.7 Summary
    12.8 References
    13. Film Growth Modification by Concurrent Ion Bombardment: Theory and Simulation
    13.1 Introduction
    13.2 Film Microstructure, the Role of Impact Mobility and Substrate Temperature
    13.3 Ion Bombardment Induced Structural Modifications during Film Growth
    13.6 Conclusions
    13.7 References
    14. Interface Structure and Thin Film Adhesion
    14.1 Introduction
    14.2 Factors Affecting Adhesion
    14.3 Ion Beam Techniques
    14.4 Interface Stitching
    14.5 Low Energy Ion Sputtering
    14.6 Implantation and Adsorption
    14.7 Ion Assisted Deposition
    14.8 Summary
    14.9 References
    15. Modification of Thin Films by Off-normal Incidence Ion Bombardment
    15.1 Introduction
    15.2 Modification of Crystal Structure by Off-normal Incidence Ion Bombardment
    15.3 Topography Changes Induced by Off-normal Incidence Ion Bombardment
    15.4 Summary
    15.5 References
    16. Ion Beam Interactions with Polymer Surfaces
    16.1 Introduction
    16.2 High and Medium Energy Ions
    16.3 SIMS Studies of Polymers
    16.4 XPS Studies
    16.5 Summary
    16.6 References
    17. Topography: Texturing Effects
    17.1 Introduction
    17.2 Ion Beam Sputter Texturing Processes and Effects
    17.3 Textured Surface Properties
    17.4 References
    18. Methods and Techniques of Ion Beam Processes
    18.1 Introduction
    18.2 Ion Beam Sputtering (IBS)
    18.3 Ion Beam Sputter Deposition
    18.4 Ion Beam Assisted Deposition (IBAD)
    18.5 Dual Ion Beam Sputtering (DIBS)
    18.6 Ion Assisted Bombardment: Other Techniques
    18.7 Summary
    18.8 References
    19. Ion-assisted Dielectric and Optical Coatings
    19.1 Introduction
    19.2 Microstructure of Thin Films
    19.3 Effects of Ion Bombardment on Film Properties
    19.4 Ion-assisted Techniques
    19.5 Optical Properties of Ion-assisted Films
    19.6 Conclusion
    19.7 References
    20. Diamond and Diamond-like Thin Films by Ion Beam Techniques
    20.1 Introduction
    20.2 Principle of Diamond Synthesis
    20.3 Experimental Techniques
    20.4 Diamond-like Films
    20.5 Diamond Particles
    20.6 Conclusion
    20.7 References


No. of pages:
© William Andrew 1989
31st December 1989
William Andrew
Hardcover ISBN:

About the Authors

Jerome J. Cuomo

Stephen M. Rossnagel

Harold R. Kaufman

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