Prof. Tania Sandoval

Tania Sandoval is an associate professor in Chemical Engineering at Universidad Técnica Federico Santa María (UTFSM) in Chile. She received her M.S. (2014) and Ph.D. (2018) in Chemical Engineering from Stanford University, working under the supervision of Professor Stacey Bent. In 2017, she received the American Vacuum Society (AVS) Russell and Sigurd Varian Award for outstanding achievement in vacuum science and technology from her thesis work. In 2018, she started her tenure-track at UTFSM to continue her academic career as an assistant professor. Her research interests expand from mechanistic studies of small molecules adsorption to their influence in thin film deposition processes using atomic-scale simulations. She has received several funding grants from the National Science Agency in Chile, as well as funding from industrial partners, and works in close collaboration with leading experimental groups in thin film deposition. She received tenure in 2023.

In addition, she is an active member of the International and Chilean scientific community. She is a member of the programming committee for the thin film division of the AVS International conference, the scientific committee for the AVS International Conference on ALD, and the scientific committee of the Area Selective Deposition (ASD) Workshop. She is currently an active member of the AVS publication committee, the editorial board of the Journal of Vacuum Science & Technology and serve as a guest editor for special issues on ASD. She received the Thin Film Division Paul H. Holloway Young Investigator Award in 2025.