
Thin Films for Emerging Applications
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Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.
Readership
Researchers, students, and engineers concerned with electronic and optical devices, thin film applications, and novel new materials such as High Tc Superconductors.
Table of Contents
- N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.
Product details
- No. of pages: 367
- Language: English
- Copyright: © Academic Press 1992
- Published: May 22, 1992
- Imprint: Academic Press
- eBook ISBN: 9781483288918
About the Serial Editor
John Vossen
Affiliations and Expertise
RCA Laboratories, Princeton, New Jersey
About the Editor
Maurice Francombe
Affiliations and Expertise
Georgia State University, Atlanta, U.S.A.
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