Thin Films for Emerging Applications

Thin Films for Emerging Applications

1st Edition - May 22, 1992

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  • Editor: John Vossen
  • eBook ISBN: 9781483288918

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Description

Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.

Readership

Researchers, students, and engineers concerned with electronic and optical devices, thin film applications, and novel new materials such as High Tc Superconductors.

Table of Contents

  • N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.

Product details

  • No. of pages: 367
  • Language: English
  • Copyright: © Academic Press 1992
  • Published: May 22, 1992
  • Imprint: Academic Press
  • eBook ISBN: 9781483288918

About the Serial Editor

John Vossen

Affiliations and Expertise

RCA Laboratories, Princeton, New Jersey

About the Editor

Maurice Francombe

Affiliations and Expertise

Georgia State University, Atlanta, U.S.A.

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