Thin Film Growth

Thin Film Growth

Physics, Materials Science and Applications

1st Edition - July 18, 2011

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  • Editor: Zexian Cao
  • Paperback ISBN: 9780081017227
  • eBook ISBN: 9780857093295

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Description

Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films.Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films.With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.

Key Features

  • Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films
  • Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films
  • An essential reference for engineers in electronics, energy materials and mechanical engineering

Readership

Engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.

Table of Contents

  • Contributor contact details

    Praface

    Part I: Theory of thin film growth

    Chapter 1: Measuring nucleation and growth processes in thin films

    Abstract:

    1.1 Introduction

    1.2 Basic theory of epitaxial growth

    1.3 Observation method of atomic steps

    1.4 Two-dimensional-island nucleation and step-flow growth modes

    1.5 The motion of atomic steps on a growing and evaporating Si(111) surface

    1.6 Morphological instability of atomic steps

    1.7 Conclusion and future trends

    1.9 Appendix

    Chapter 2: Quantum electronic stability of atomically uniform films

    Abstract:

    2.1 Introduction

    2.2 Electronic growth

    2.3 Angle-resolved photoemission spectroscopy

    2.4 Atomically uniform films

    2.5 Quantum thermal stability of thin films

    2.6 General principles of film stability and nanostructure development

    2.7 Beyond the particle-in-a-box

    2.8 Future trends

    2.9 Acknowledgments

    Chapter 3: Phase-field modeling of thin film growth

    Abstract:

    3.1 Introduction

    3.2 Modeling

    3.3 Numerical results

    3.4 Conclusion

    Chapter 4: Analysing surface roughness evolution in thin films

    Abstract:

    4.1 Introduction

    4.2 Roughness during homo-epitaxial growth

    4.3 Roughness during hetero- or non-epitaxial growth

    4.4 Future trends

    Chapter 5: Modelling thin film deposition processes based on real-time observation

    Abstract:

    5.1 Introduction: time resolved surface science

    5.2 Basics of growth and relevant length of and timescales for in-situ observation of film deposition

    5.3 Experimental techniques for real-time and in-situ studies

    5.4 Experimental case studies

    5.5 Future trends

    5.6 Sources of further information and advice

    Part II: Techniques of thin film growth

    Chapter 6: Silicon nanostructured films grown on templated surfaces by oblique angle deposition

    Abstract:

    6.1 Introduction

    6.2 Preparation of templated surface for oblique angle deposition

    6.3 Fan-out on templated surface with normal incident flux

    6.4 Fan-out growth on templated surfaces with oblique angle incident flux

    6.5 Control of fan-out growth with substrate rotations

    6.6 Applications and future trends

    Chapter 7: Phase transitions in colloidal crystal thin films

    Abstract:

    7.1 Introduction

    7.2 Experimental tools

    7.3 Description of colloidal crystal phases: historical survey

    7.4 Phase transition sequence in colloidal crystal thin films

    7.5 Conclusions and future trends

    7.6 Acknowledgements

    Chapter 8: Thin film growth for thermally unstable noble-metal nitrides by reactive magnetron sputtering

    Abstract:

    8.1 Introduction

    8.2 Deposition of stoichiometric Cu3N

    8.3 Nitrogen re-emission

    8.4 Doping of Cu3N by co-sputtering

    8.5 Conclusions

    Chapter 9: Growth of graphene layers for thin films

    Abstract:

    9.1 Introduction

    9.2 Large-scale pattern growth of graphene films for stretchable transparent electrodes

    9.3 Roll-to-roll production of 30-inch graphene films for transparent electrodes

    9.4 Conclusions

    Chapter 10: Epitaxial growth of graphene thin films on single crystal metal surfaces

    Abstract:

    10.1 Introduction

    10.2 Structure of graphene on metals

    10.3 Growth of graphene on a metal

    10.4 Future trends

    10.5 Sources of further information and advice

    10.6 Acknowledgements

    Chapter 11: Electronic properties and adsorption behaviour of thin films with polar character

    Abstract:

    11.1 Introduction to oxide polarity

    11.2 Polar oxide films

    11.3 Measuring polarity of thin oxide films

    11.4 Adsorption properties of polar films

    11.5 Conclusion and future trends

    11.7 Acknowledgements

    11.6 Sources of further information and advice

    Chapter 12: Polarity controlled epitaxy of III-nitrides and ZnO by molecular beam epitaxy

    Abstract:

    12.1 Introduction

    12.2 Lattice polarity and detection methods

    12.3 Polarity issues at heteroepitaxy and homoepitaxy

    12.4 Polarity controlled epitaxy of GaN and AlN

    12.5 Polarity controlled epitaxy of InN

    12.6 Polarity controlled epitaxy of ZnO

    12.7 Conclusions

    Chapter 13: Understanding substrate plasticity and buckling of thin films

    Abstract:

    13.1 Introduction

    13.2 Experimental observations

    13.3 Modelling

    13.4 Discussion

    13.5 Conclusions

    Chapter 14: Controlled buckling of thin films on compliant substrates for stretchable electronics

    Abstract:

    14.1 Introduction

    14.2 Mechanics of one-dimensional non-coplanar mesh design

    14.3 Mechanics of two-dimensional non-coplanar mesh design

    14.4 Conclusions

    Chapter 15: The electrocaloric effect (ECE) in ferroelectric polymer films

    Abstract:

    15.1 Introduction

    15.2 Thermodynamic considerations on materials with large electrocaloric effect (ECE)

    15.3 Previous investigations on electrocaloric effect (ECE) in polar materials

    15.4 Large electrocaloric effect (ECE) in ferroelectric polymer films

    15.5 Future trends

    15.6 Conclusion

    15.7 Acknowledgements

    Chapter 16: Network behavior in thin films and nanostructure growth dynamics

    Abstract:

    16.1 Introduction

    16.2 Origins of network behavior during thin film growth

    16.3 Monte Carlo simulations

    16.4 Results and discussion

    16.5 Conclusions

    Index

Product details

  • No. of pages: 432
  • Language: English
  • Copyright: © Woodhead Publishing 2011
  • Published: July 18, 2011
  • Imprint: Woodhead Publishing
  • Paperback ISBN: 9780081017227
  • eBook ISBN: 9780857093295

About the Editor

Zexian Cao

Zexian Cao is a Professor at the Institute of Physics of the Chinese Academy of Sciences in Beijing, China.

Affiliations and Expertise

Chinese Academy of Sciences, China

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