Rapid Thermal Processing - 1st Edition - ISBN: 9780122476907, 9780323139809

Rapid Thermal Processing

1st Edition

Science and Technology

Editors: Richard Fair
eBook ISBN: 9780323139809
Hardcover ISBN: 9780122476907
Imprint: Academic Press
Published Date: 15th April 1993
Page Count: 430
Tax/VAT will be calculated at check-out Price includes VAT (GST)
20% off
20% off
20% off
20% off
43.99
35.19
54.95
43.96
151.77
121.42
72.95
58.36
Unavailable
Price includes VAT (GST)
DRM-Free

Easy - Download and start reading immediately. There’s no activation process to access eBooks; all eBooks are fully searchable, and enabled for copying, pasting, and printing.

Flexible - Read on multiple operating systems and devices. Easily read eBooks on smart phones, computers, or any eBook readers, including Kindle.

Open - Buy once, receive and download all available eBook formats, including PDF, EPUB, and Mobi (for Kindle).

Institutional Access

Secure Checkout

Personal information is secured with SSL technology.

Free Shipping

Free global shipping
No minimum order.

Description

This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.

Readership

Process engineers working in microelectronic research and development, production and manufacturing engineers working with silicon-integrated circuits, researchers working in semiconductor processing, graduate students and researchers in electronics, electrical engineers.

Table of Contents

  1. Rapid Thermal Processing - A Justification

  2. Rapid Thermal Processing - Based Epitaxy

  3. Rapid Thermal Growth and Processing of Dielectrics

  4. Thin-Films Deposition

  5. Extended Defects from Ion Implantation and Annealing

  6. Junction Formation in Silicon by Rapid Thermal Annealing

  7. Silicides

  8. Issues in Manufacturing Unique Silicon Devices Using Rapid Thermal Annealing

  9. Manufacturing Equipment Issues in Rapid Thermal Processing

Index

Details

No. of pages:
430
Language:
English
Copyright:
© Academic Press 1993
Published:
Imprint:
Academic Press
eBook ISBN:
9780323139809
Hardcover ISBN:
9780122476907

About the Editor

Richard Fair