Quadrupoles in Electron Lens Design

Quadrupoles in Electron Lens Design

1st Edition - November 21, 2022

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  • Editors: Martin Hÿtch, Peter W. Hawkes
  • eBook ISBN: 9780323988667
  • Hardcover ISBN: 9780323988650

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Description

Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams.

Key Features

  • Provides the authority and expertise of leading contributors from an international board of authors
  • Presents the latest release in the Advances in Imaging and Electron Physics series
  • Updated release includes the latest information on Coulomb Interactions in Particle Beams

Readership

Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general

Table of Contents

  • 1. Introduction

    Peter Hawkes

    2. Definitions, notation, and methods of analysis

    Peter Hawkes

    3. Quadrupole potential functions

    Peter Hawkes

    4. Quadrupole systems: Their suitability for specific tasks

    Peter Hawkes

    5. Quadrupole data

    Peter Hawkes

Product details

  • No. of pages: 398
  • Language: English
  • Copyright: © Academic Press 2022
  • Published: November 21, 2022
  • Imprint: Academic Press
  • eBook ISBN: 9780323988667
  • Hardcover ISBN: 9780323988650

About the Editors

Martin Hÿtch

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Affiliations and Expertise

Senior Scientist, French National Centre for Research (CNRS), Toulouse, France

Peter W. Hawkes

Peter W. Hawkes
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.

Affiliations and Expertise

Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics

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