Preparation and Properties of Thin Films

Preparation and Properties of Thin Films

Treatise on Materials Science and Technology, Vol. 24

1st Edition - December 28, 1982

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  • Editors: K. N. Tu, R. Rosenberg
  • eBook ISBN: 9781483218298

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Treatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding study of their properties. The book discusses the preparation and property correlations in thin film; the variation of microstructure of thin films; and the molecular beam epitaxy of superlattices in thin film. The text also describes the epitaxial growth of silicon structures (thermal-, laser-, and electron-beam-induced); the characterization of grain boundaries in bicrystalline thin films; and the mechanical properties of thin films on substrates. The ion beam modification of thin film; the use of thin alloy films for metallization in microelectronic devices; and the fabrication and physical properties of ultrasmall structures are also encompassed. Materials scientists and materials engineers will find the book invaluable.

Table of Contents

  • Contributors


    Part I. Introduction

    1 Preparation and Property Correlations in Thin Films

    Part II. Variation Of Microstructure Of Thin Films

    2 Molecular Beam Epitaxy of Superlattices in Thin Films

    I. Introduction

    II. Molecular Beam Epitaxy

    III. Structure of Semiconductor Superlattices

    IV. Properties of Superlattice Structures

    V. Concluding Remarks


    3 Epitaxial Growth of Silicon Structures—Thermal, Laser-, and Electron-Beam-Induced

    I. Introduction

    II. Thermal and Laser-Induced Epitaxy: Implanted-Amorphous Silicon

    III. Deposited Layers of Silicon on Silicon

    IV. Epitaxial Suicides

    V. Crystallization of Deposited Films

    VI. Summary


    4 Characterization of Grain Boundaries in Bicrystalline Thin Films

    I. Introduction

    II. Structure of Grain Boundaries

    III. Properties of Grain Boundaries

    IV. Preparation of Bicrystalline Thin Films

    V. Characterization of Grain Boundary Structure

    VI. Recent Experimental Results

    VII. Summary

    VIII. Perspective


    5 Mechanical Properties of Thin Films on Substrates


    II.Biaxial Strain Model

    III.Strain Relaxation Mechanisms

    IV.Strain Relaxation by Dislocation Glide

    V.Strain Relaxation by Diffusional Creep

    VI.Strain at Grain Boundaries

    VII.Strain and Stress at Film Edges

    VIII.Microstructures Which Affect Mechanical Properties of Thin Films



    Part III. Variation Of Composition Of Thin Films

    6 Ion Beam Modification of Thin Films

    I. Introduction

    II. Range and Energy Deposition

    III. Sputtering-Induced Compositional Changes

    IV Implanted Metastable Phases

    V. Ion-Beam-Induced Reactions of Metal Films


    7 Thin Alloy Films for Metallization in Microelectronic Devices

    I. Introduction

    II. Metallurgical Degradation in Microelectronic Devices

    III. Near-Equilibrium Multilayered Thin-Film Structure

    IV Applications of Thin Alloy Films in Forming Shallow Suicide Contacts

    V. Conclusion


    Part Iv Variation Of Pattern Of Thin Films

    8 Fabrication and Physical Properties of Ultrasmall Structures

    I. Introduction

    II. Fabrication

    III. Physical Properties

    IV. Summary



Product details

  • No. of pages: 350
  • Language: English
  • Copyright: © Academic Press 1982
  • Published: December 28, 1982
  • Imprint: Academic Press
  • eBook ISBN: 9781483218298

About the Editors

K. N. Tu

R. Rosenberg

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