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(partial) Leaching of Nickeliferous or Cobaltiferous Sources Using Organic Reagents: using amines, ketones, organic acids, organo-phosphorous compounds, mixtures or organic reagents. Solvent Extraction of Nickel and/or Cobalt from Solutions: using one non-heterocyclic organic compound - using amines, oximes, ketones or aldehydes, organic acids, cyanic acids or derivatives, organic agents containing sulphur, alcohols, phenols or naphthols; using mixtures of acyclic or carboxyclic compounds with organic extractants of different types - using an amine and organic acid, an amine and an anion of organic acid, quaternary ammonium extractant and an oxime or a ketone or a heterocyclic compound, an oxime and an organic acid, an oxime and a sulphonic acid, an oxime and a phenol; using heterocyclic derivatives - using quinoline derivatives, other heterocyclic derivatives; using organophosphorous or organoboron compounds - using alkyl phosphoric acid with another extraction agent, phosphines and/or phosphine-oxides. Solvent Extraction Methods used for Removal of Impurities from Nickel and/or Cobalt Containing Solutions. Appendices: patent number index; company index; subject index.
Provides a unique survey of the information contained in the patent literature concerning solvent extraction of nickel and cobalt. All the available data from the patent documentation is classified systematically for easy retrieval of authors, patents or assignees. Presented in three parts, the first deals with leaching of nickeliferous or cobaltiferous sources using organic reagents; the second reviews the solvent extraction of nickel or cobalt, or both from solutions; the third covers solvent extraction methods used to remove impurities from solutions containing nickel or cobalt. Cites over 300 patent documents.
For materials scientists, metallurgists, industrial chemists and mineralogists.
- © Pergamon 1985
- 30th August 1985
- Hardcover ISBN:
- eBook ISBN:
@qu:...a source of much valuable, but little-known, information.
@source:Endeavour New Series, Volume 10, Number 4
European Patent Office, The Hague, The Netherlands
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