Description

New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning microscope image processing for metal and non-metallic microstructures.

Engineers and scientists face the pressing problem in ULSI development and quality assurance: microscopy methods can’t keep pace with the continuous shrinking of feature size in microelectronics. Nanometer scale sizes are below the resolution of light, and imaging these features is nearly impossible even with electron microscopes, due to image noise.

This book presents novel "smart" image processing methods, applications, and case studies concerning quality improvement of microscope images of microelectronic chips and process optimization. It explains an approach for high-resolution imaging of advanced metallization for micro- and nanoelectronics. This approach obviates the time-consuming preparation and selection of microscope measurement and sample conditions, enabling not only better electron-microscopic resolution, but also more efficient testing and quality control. This in turn leads to productivity gains in design and development of nano-scale ULSI chips.

The authors also present several approaches for super-resolving low-resolution images to improve failure analysis of microelectronic chips.

Key Features

  • Acquaints users with new software-based approaches to enhance high-resolution microscope imaging of microchip structures
  • Demonstrates how these methods lead to productivity gains in the development of ULSI chips
  • Presents several techniques for the superresolution of images, enabling engineers and scientists to improve their results in failure analysis of microelectronic chips

Readership

Engineers and scientists involved in advanced metallization for micro and nanoelectronics
Engineers and scientists involved in design, development, manufacturing, and testing of ULSI chips
Engineers and scientists producing transmission and scanning microscopes
Scientists and research students in electrical engineering with specialization in microelectronics

Table of Contents

Preface

Chapter 1. Introduction

1.1 Basics of Image Processing

1.2 The Problems of Shrinking Feature Size in ULSI Development and Failure Analysis

1.3 High Resolution Imaging of Structures

1.4 Fabrication Techniques in ULSI Industry

References

Chapter 2. New Image Processing Methods for Advanced Metallization in Micro- and Nano-Electronics

2.1 Characteristics of Metal Ultrathin Films’ Microstructures

2.2 Increased Productivity by Obviating Steps of Selection of Measurement Conditions

2.3 Demonstration of Method Capabilities

References

Chapter 3. New Super Resolving Techniques and Methods for Microelectronics

3.1 The basics of super resolution

3.2 Super-Resolution Imaging for Improved Failure Analysis

3.3 Usage of Radon Transform for Improved Failure Analysis

References

Details

No. of pages:
110
Language:
English
Copyright:
© 2014
Published:
Imprint:
William Andrew
eBook ISBN:
9780128000175
Print ISBN:
9780323241434

About the authors

Zeev Zalevsky

Affiliations and Expertise

Faculty of Engineering and the Center for Advanced Materials and Nanotechnology, Bar-Ilan University

Pavel Livshits

Affiliations and Expertise

Researcher at Bar-Ilan University, Faculty of Engineering, Israel

Eran Gur

Affiliations and Expertise

Dept. of Electronics Engineering, Jerusalem College of Engineering, Jerusalem, 91035, Israel