Description

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material.

The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.

The book is intended to be both an introduction for those who are new to the field an

Key Features

  • Fully revised and updated to include the latest developments in PVD process technology
  • ‘War stories’ drawn from the author’s extensive experience emphasize important points in development and manufacturing
  • Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing
  • Readership

    Engineers, including surface engineering personnel, technicians, and other plant personnel in process industries such as semiconductors and microelectronics. Especially informative for those new to the field.

    Table of Contents

    Introduction; Substrate ("Real") Surfaces and Surface Modification; The "Good" Vacuum (Low Pressure) Processing Environment; The Sub-Atmospheric Processing Environments; The Low-Pressure Plasma Processing Environment; Vacuum Evaporation and Vacuum Deposition; Physical Sputtering and Sputter Deposition (Sputtering); Arc Vapor Deposition; Ion Plating and Ion Beam Assisted Deposition; Atomistic Film Growth and Some Growth-Related Film Properties; Film Characterization and Some Basic Film Properties; Adhesion and Deadhesion; Cleaning; External Processing Environment; Transfer of Technology from R&D to Manufacturing

    Details

    No. of pages:
    792
    Language:
    English
    Copyright:
    © 2010
    Published:
    Imprint:
    William Andrew
    Electronic ISBN:
    9780815520382
    Print ISBN:
    9780815520375
    Print ISBN:
    9780323165532

    About the author

    Reviews

    "In addition to background theory and principles, this handbook is loaded with extensive practical information on vitually all aspects of PVD. It also has extensive listings of references, tabulated data, graphs, illustrations, and schematics – all of which greatly enhance the book and provide useful information. This handbook will be a frequented referenced book by those researchers using PVD."--Electrical Engineering