This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material.
The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.
The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
- Fully revised and updated to include the latest developments in PVD process technology
- ‘War stories’ drawn from the author’s extensive experience emphasize important points in development and manufacturing
- Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing
Engineers, including surface engineering personnel, technicians, and other plant personnel in process industries such as semiconductors and microelectronics. Especially informative for those new to the field
Introduction; Substrate ("Real") Surfaces and Surface Modification; The "Good" Vacuum (Low Pressure) Processing Environment; The Sub-Atmospheric Processing Environments; The Low-Pressure Plasma Processing Environment; Vacuum Evaporation and Vacuum Deposition; Physical Sputtering and Sputter Deposition (Sputtering); Arc Vapor Deposition; Ion Plating and Ion Beam Assisted Deposition; Atomistic Film Growth and Some Growth-Related Film Properties; Film Characterization and Some Basic Film Properties; Adhesion and Deadhesion; Cleaning; External Processing Environment; Transfer of Technology from R&D to Manufacturing
- No. of pages:
- © William Andrew 2010
- 29th April 2010
- William Andrew
- eBook ISBN:
- Hardcover ISBN:
Don obtained his B.S. degree in Physics from Eastern Kentucky State University. He served as a meteorologist and Air Weather Officer in the USAF during and after the Korean War. After being discharged from the USAF he obtained a M.S. degree in Solid State Physics in 1960 from the University of Kentucky. Don went to work for Sandia National Laboratories in 1961 and retired in 1989 after 28 years as a Member of the Technical Staff and then as a Technical Supervisor. At retirement he was Supervisor of the Surface and Interface Technology Division. After retirement Don acted as a consultant to the vacuum coating industry. Don was President of the American Vacuum Society (now AVS) in 1985. Don was the Technical Director of the Society of Vacuum Coaters (SVC) from 1991 to 2006 and Technical Editor of the SVC publications from 1989 to 2016. In 1988, the 9th International Congress on Vacuum Metallurgy presented him with a commendation, “For outstanding contributions to metallurgical coating technology for the period 1961-1988". In 1995 he was the recipient of the AVS Albert Nerken Award "For his invention of the ion-plating process and its continued development." Don is a Fellow and Emeritus Member of the AVS. In 2007 Don received the SVC Nathaniel H. Sugerman Award from the Society of Vacuum Coaters “For his development of the ion plating process and long-term commitment to education in the vacuum coating community.” Don has written numerous papers and book chapters and has authored and edited several books on PVD processing and the history of vacuum coating.
Formerly Technical Director, Society of Vacuum Coaters, Albuquerque, NM, USA
"In addition to background theory and principles, this handbook is loaded with extensive practical information on vitually all aspects of PVD. It also has extensive listings of references, tabulated data, graphs, illustrations, and schematics – all of which greatly enhance the book and provide useful information. This handbook will be a frequented referenced book by those researchers using PVD." --Electrical Engineering