Table of Contents

1. Introduction 1.1 Surface Engineering 1.2 Thin Film Processing 1.3 Process Documentation 1.4 Safety and Environmental Concerns 1.5 Units 1.6 Summary 2. Substrate (""Real"") Surfaces and Surface Modification 2.1 Introduction 2.2 Materials and Fabrication 2.3 Atomic Structure and Atom-Particle Interactions 2.4 Characterization of Surfaces and Near-Surface Regions 2.5 Bulk Properties 2.6 Modification of Substrate Surfaces 2.7 Summary 3. The Low-Pressure Gas and Vacuum Processing Environment 3.1 Introduction 3.2 Gases and Vapors 3.3 Gas-Surface Interactions 3.4 Vacuum Environment 3.5 Vacuum Processing Systems 3.6 Vacuum Pumping 3.7 Vacuum and Plasma Compatible Materials 3.8 Assembly 3.9 Evaluating Vacuum System Performance 3.10 Purchasing a Vacuum System for PVD Processing 3.11 Cleaning of Vacuum Surfaces 3.12 System-Related Contamination 3.13 Process-Related Contamination 3.14 Treatment of Specific Materials 3.15 Safety Aspects of Vacuum Technology 3.16 Summary 4. The Low-Pressure Plasma Processing Environment 4.1 Introduction 4.2 The Plasma 4.3 Plasma-Surface Interactions 4.4 Configurations for Generating Plasmas 4.5 Ion and Plasma Sources 4.6 Plasma Processing Systems 4.7 Plasma-Related Contamination 4.8 Some Safety Aspects of Plasma Processing 4.9 Summary 5. Vacuum Evaporation and Vacuum Deposition 5.1 Introduction 5.2 The

Details

No. of pages:
944
Language:
English
Copyright:
© 1998
Published:
Imprint:
William Andrew
eBook ISBN:
9780815517634
Print ISBN:
9780815514220

About the author

Donald M. Mattox

Affiliations and Expertise

Technical Director, Society of Vacuum Coaters, Albuquerque, NM, USA