Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings

Science, Applications and Technology

2nd Edition - December 31, 1994

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  • Editor: Rointan F. Bunshah
  • eBook ISBN: 9780815517467

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Description

This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications.

Readership

Engineers, technicians, and plant personnel in the semiconductor and related industries.

Table of Contents

  • 1. Deposition Technologies: An Overview
    1.0 The Market
    2.0 Introduction
    3.0 Aim and Scope
    4.0 Definitions and Concepts
    5.0 Physical Vapor Deposition (PVD) Process Terminology
    6.0 Classification of Coating Processes
    7.0 Gas Jet Deposition with Nano-Particles
    8.0 Microstructure and Properties
    9.0 Unique Features of Deposited Materials and Gaps In Understanding
    10.0 Current Applications
    11.0 ""Frontier Areas"" for the Application of the Products of Deposition Technology
    12.0 Selection Criteria
    13.0 Summary
    Appendix 1: Deposition Process Definitions
    References
    2. Plasmas in Deposition Processes
    1.0 Introduction
    2.0 Particle Motion
    3.0 Collective Phenomena
    4.0 Plasma Discharges
    5.0 Plasma Volume Reactions
    6.0 Surface Reactions
    References
    3. Surface Preparation for Film and Coating Deposition Processes
    1.0 Introduction
    2.0 Contamination
    3.0 Environment Control
    4.0 Cleaning Processes
    5.0 Drying and Outgassing
    6.0 Monitoring of Cleaning
    7.0 In Situ Cleaning
    8.0 Plasmas
    9.0 Storage and Handling
    10.0 Activation and Sensitization
    11.0 Surface Modification
    12.0 Passivation and Preservation
    13.0 Safety
    References
    4. Evaporation: Processes, Bulk Microstructures and Mechanical Properties
    1.0 General Introduction
    2.0 Scope
    3.0 PVD Processes
    4.0 Theory and Mechanisms
    5.0 Evaporation Process and Apparatus
    6.0 Evaporation Sources
    7.0 Laser Induced Evaporation/Laser Ablation/Pulsed Laser Deposition (PLD)
    8.0 Deposition Rate Monitors and Process Control
    9.0 Deposition of Various Materials
    10.0 Microstructure of PVD Condensates
    11.0 Physical Properties of Thin Films
    12.0 Mechanical and Related Properties
    13.0 Purification of Metals by Evaporation
    Appendix
    References
    5. Sputter Deposition Processes
    1.0 Introduction
    2.0 Sputtering Mechanisms
    3.0 Sputter Deposition Techniques
    4.0 Sputter Deposition Modes
    References
    6. Ion Plating
    1.0 Introduction
    2.0 Processing Plasma
    3.0 Generation of Plasmas
    4.0 Plasma Chemistry
    5.0 Bombardment Effects on Surfaces
    6.0 Sources of Depositing Atoms
    7.0 Reactive Ion Plating
    8.0 Bombardment Effects on Film Properties
    9.0 Ion Plating System Requirements
    10.0 Process Monitoring and Control
    11.0 Problem Areas
    12.0 Applications
    13.0 Summary
    References
    7. Chemical Vapor Deposition
    1.0 Introduction
    2.0 Important Reaction Zones in CVD
    3.0 Design of CVD Experiments
    4.0 Gas Flow Dynamics
    5.0 Rate-Limiting Steps During CVD
    6.0 Reaction Mechanisms
    7.0 Nucleation
    8.0 Surface Morphology and Microstructure of CVD Materials
    9.0 Selective Deposition
    10.0 Some Applications of the CVD Technique
    11.0 Outlook
    References
    8. Plasma-Enhanced Chemical Vapor Deposition
    1.0 Introduction
    2.0 Reactor Influence on Plasma Behavior
    3.0 Films Deposited by CVD
    References
    9. Plasma-Assisted Vapor Deposition Processes: Overview
    1.0 Introduction
    2.0 Plasma-Assisted Deposition Processes
    3.0 Model of a Deposition Process
    4.0 Materials Deposited by Reactive Vapor Deposition Processes
    5.0 Key Issues in Plasma-Assisted Reactive Vapor Deposition Processes
    6.0 Plasma-Assisted Deposition Techniques in Current Usage
    7.0 Limitations of Current Plasma-Assisted Techniques
    8.0 Hybrid Processes
    9.0 Conclusions
    References
    10. Deposition from Aqueous Solutions: An Overview
    1.0 Introduction
    2.0 General Principles
    3.0 Electrodeposition
    4.0 Processing Techniques
    5.0 Selection of Deposit
    6.0 Selected Special Processes
    7.0 Structures and Properties of Deposits
    8.0 Summary
    Appendix A: Preparation of Substrates for Electroplating
    Appendix B: Representative Electroless Plating Solution Formulation
    Appendix C: Comparison of Aluminum Anodizing Processes (Types I, II and III)
    References
    11. Advanced Thermal Spray Deposition Techniques
    1.0 Introduction
    2.0 Equipment and Processes
    3.0 Total Coating Process
    4.0 Coating Structure and Properties
    5.0 Summary
    References
    12. Non-Elemental Characterization of Films and Coatings
    1.0 Introduction
    2.0 Characterization
    3.0 Film Formation
    4.0 Elemental And Structural Analysis
    5.0 Some Property Measurements
    6.0 Summary
    References
    13. Nucleation, Film Growth, and Microstructural Evolution
    1.0 Introduction
    2.0 Nucleation and the Early Stages of Film Growth
    3.0 Computer Simulations of Microstructure Evolution
    4.0 Microstructure Evolution and Structure-Zone
    5.0 Effects of Low-Energy Ion Irradiation During Film Growth
    References
    14. Metallurgical Applications
    1.0 Introduction
    2.0 Corrosion
    3.0 Galvanic Corrosion
    4.0 EMF and Galvanic Series
    5.0 Coatings for Galvanic Corrosion
    6.0 Methods of Deposition of Metallic Coatings
    7.0 Examples of Corrosion-Resistant Coatings
    8.0 High Temperature Oxidation/Corrosion
    9.0 Friction and Wear
    10.0 Coatings to Reduce Friction and Wear
    References
    15. Characterization of Thin Films and Coatings
    1.0 Introduction
    2.0 Surface Analysis Techniques
    3.0 Imaging Analysis Techniques
    4.0 Optical Analysis Techniques
    References
    16. Jet Vapor Deposition
    1.0 Introduction
    2.0 Principles and Apparatus of JVD
    3.0 Discussion
    4.0 Examples of JVD Films and Applications
    5.0 Summary
    References
    Index

Product details

  • No. of pages: 888
  • Language: English
  • Copyright: © William Andrew 1994
  • Published: December 31, 1994
  • Imprint: William Andrew
  • eBook ISBN: 9780815517467

About the Editor

Rointan F. Bunshah

Affiliations and Expertise

University of California at Los Angeles, USA

About the Author

Rointan F. Bunshah

Affiliations and Expertise

University of California at Los Angeles, USA

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