Handbook of Chemical Vapor Deposition - 2nd Edition - ISBN: 9780815514329, 9780815517436

Handbook of Chemical Vapor Deposition

2nd Edition

Principles, Technology and Applications

Authors: Hugh O. Pierson
eBook ISBN: 9780815517436
Hardcover ISBN: 9780815514329
Imprint: William Andrew
Published Date: 1st September 1999
Page Count: 506
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.


Completely up-to-date look at the entire chemical vapor deposition process, for engineers and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, filter and other industries.

Table of Contents

  1. Introduction and General Considerations 1.0 Introduction 2.0 Historical Perspective 3.0 The Applications Of CVD 4.0 Profile of the CVD Business 5.0 Book Objectives 6.0 Background References References
  2. Fundamentals of Chemical Vapor Deposition 1.0 Introduction 2.0 Thermodynamics of CVD 3.0 Kinetics and Mass-Transport Mechanisms 4.0 Growth Mechanism and Structure of Deposit References
  3. The Chemistry of CVD 1.0 Categories of CVD Reactions 2.0 CVD Precursors 3.0 Halide Precursors 4.0 Metal-Carbonyl Precursors 5.0 Hydride Precursors References
  4. Metallo-Organic CVD (MOCVD) 1.0 Introduction 2.0 MOCVD Process and Equipment 3.0 MOCVD Precursors: Alkyl, Alicyclic, and Aryl Compounds 4.0 Acetylacetonate Compounds 5.0 MOCVD Reactions for the Deposition of Metals 6.0 MOCVD Reactions for the Deposition of Carbides and Nitrides 7.0 MOCVD Reactions for the Deposition of Oxides 8.0 MOCVD Reactions for fhe Deposition of III-V and II-VI Compounds 9.0 General Applications of MOCVD References
  5. CVD Processes and Equipment 1.0 Introduction 2.0 Closed and Open Reactor 3.0 Reactant Supply 4.0 Thermal CVD: Deposition System and Reactor Design 5.0 Exhaust and By-Product Disposal 6.0 Laser and Photo CVD 7.0 Chemical Vapor Infiltration (CVI) 8.0 Fluidized-Bed CVD 9.0 Plasma CVD References
  6. The CVD of Metals 1.0 Introduction 2.0 Aluminum 3.0 Beryllium 4.0 Chromium 5.0 Copper 6.0 Gold 7.0 Molybdenum 8.0 Nickel 9.0 Niobium (Columbium) 10.0 Platinum and Platinum Group Metals 11.0 Rhenium 12.0 Tantalum 13.0 Titanium 14.0 Tungsten 15.0 Other Metals 16.0 Intermetallics References
  7. The CVD of the Allotropes of Carbon 1.0 The Allotropes of Carbone 2.0 The CVD of Graphite 3.0 The CVD of Diamond 4.0 The CVD of Diamond-Like-Carbone (DLC) References
  8. The CVD of Non-Metallic Elements 1.0 Introduction 2.0 The CVD of Boron 3.0 The CVD of Silicon 4.0 The CVD of Germanium References
  9. The CVD of Ceramic Materials: Carbides 1.0 Introduction 2.0 The CVD of Boron Carbide 3.0 The CVD of Chromium Carbide 4.0 The CVD of Hafnium Carbide 5.0 The CVD of Niobium Carbide 6.0 The CVD of Silicon Carbide 7.0 The CVD of Tantalum Carbide 8.0 The CVD of Titanium Carbide 9.0 The CVD of Tungsten Carbide 10.0 The CVD of Zirconium Carbide 11.0 The CVD of Miscellaneous Carbides References
  10. The CVD of Ceramic Materials: Nitrides 1.0 General Characteristics of Nitrides 2.0 The CVD of Aluminum Nitride 3.0 The CVD Hexagonal Boron Nitride 4.0 The CVD of Cubic Boron Nitride 5.0 The CVD of Hafnium Nitride 6.0 The CVD of Niobium Nitride 7.0 The CVD of Silicon Nitride 8.0 The CVD of Titanium Nitride 9.0 The CVD of Titanium Carbonitride 10.0 The CVD of Other Nitrides References
  11. The CVD of Ceramic Materials: Oxides 1.0 Introduction 2.0 Aluminum Oxide 3.0 Chromium Oxide 4.0 Hafnium Oxide 5.0 Silicon Dioxide 6.0 Tantalum Oxide 7.0 Tin Oxide 8.0 Titanium Oxide 9.0 Zirconium Oxide 10.0 Other Oxides 11.0 Mixed Oxides and Glasses 12.0 Oxide Superconductors References
  12. The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and II-VI Compounds (Chalcogenides) 1.0 Borides 2.0 Silicides 3.0 III-V Compounds 4.0 II-VI Compounds (Chalcogenides) References
  13. CVD in Electronic Applications: Semiconductors 1.0 Introduction 2.0 Electronic Functions and Systems 3.0 CVD in Electronic Technology 4.0 Silicon 5.0 Germanium 6.0 III-V and II-VI Compounds 7.0 Silicon Carbide 8.0 Diamond 9.0 Processing Equipment For CVD Electronic Materials References
  14. CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers 1.0 Introduction 2.0 The CVD of Electrical Conductors 3.0 The CVD of Electrical Insulators (Dielectrics) 4.0 The CVD of Substrates (Heat Sinks) 5.0 The CVD of Diffusion Barriers 6.0 The CVD of Superconductors References
  15. CVD in Optoelectronic and Ferroelectric Applications 1.0 CVD in Optoelectronics 2.0 Optoelectronic Materials 3.0 Optoelectronic CVD Applications 4.0 CVD in Photovoltaic 5.0 CVD in Ferroelectricity References
  16. CVD in Optical Applications 1.0 Introduction 2.0 Optical Characteristics 3.0 Optical Materials Produced by CVD 4.0 Optical Applications of CVD 5.0 CVD in Optical-Fiber Processing References
  17. CVD in Wear- and Corrosion-Resistant Applications 1.0 Introduction 2.0 Wear Mechanisms 3.0 CVD Materials for Wear- and Corrosion-Resistance 4.0 CVD in Corrosion-Resistant Applications 5.0 Decorative Applications of CVD 6.0 Nuclear Applications of CVD 7.0 Biomedical Applications of CVD References
  18. CVD in Cutting-Tool Applications 1.0 Introduction 2.0 Cutting-Tool Requirements 3.0 Coating Processes and Substrate Interaction 4.0 Cutting-Tool Materials (Substrate) 5.0 Cutting-Tool Materials (Coatings) References
  19. CVD in Fiber, Powder, and Monolithic Applications 1.0 Introduction 2.0 CVD in Fiber Applications 3.0 CVD in Powder Applications 4.0 CVD in Monolithic and Composite Applications References Conversion Guide Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification Index


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© William Andrew 1999
William Andrew
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About the Author

Hugh O. Pierson

Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition

Affiliations and Expertise

Sandia National Laboratories (retired)


".presents an objective and systematic assessment." - High Tech Ceramics News

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