Developments in Surface Contamination and Cleaning - Vol 5

In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.

This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.

• Comprehensive coverage of innovations in surface contamination and cleaning
• Written by established experts in the contamination and cleaning field
• Each chapter is a comprehensive review of the state of the art
• Case studies included

As a whole, the series will create a unique and comprehensive knowledge base of crucial importance to those in research and development, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books

Preface

About the Editors

Contributors

Chapter 1. Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide

1 Introduction

2 Surface Cleanliness Levels

3 Dense-Phase Fluids

4 Principles of Dense-Phase CO2 Cleaning

5 Advantages and Disadvantages of Dense-Phase CO2 Cleaning

6 Applications

7 Summary and Conclusions

Acknowledgment

Disclaimer

References

Chapter 2. Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications

1 Introduction

2 Plasma Reactor Configurations

3 Semiconductor Manufacturing

4 Photovoltaic Cell Processing

5 Plasma Sterilization

6 Plasma Cleaning in the Restoration Industry

7 Plasma Cleaning Applications in Electron Microscopy

8 Additional Plasma Applications

9 Summary and Future Needs

References

Chapter 3. Clean Room Wipers for Removal of Surface Contamination

1 Principles of Wiping for Removal of Contaminants

2 Types of Wipers

3 Wiper Testing

4 Methods to Assess Wiper Quality

5 The Importance of Automation

6 Applications

7 Current Trends in Wiper Technology

8 Future Developments in Clean Room Wipers

References

Chapter 4. Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing

1 Introduction

2 Impact of Microorganisms in the Environment

3 Sanitization

4 Environmental Monitoring

5 Environmental Contamination Control

6 Future Developmental Requirements

References

Chapter 5. Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale

1 Introduction

2 Basic Concepts

3 Experimental Requirements

4 Examples

5 Outlook

References

Index