- Print ISBN 9781437778816
- Electronic ISBN 9781437778823
In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.
This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.
Feature: Comprehensive coverage of innovations in surface contamination and cleaning
Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning
problem, saving the time involved in consulting a range of disparate sources.
Feature: Written by established experts in the contamination and cleaning field
Benefit: Provides an authoritative resource
Feature: Each chapter is a comprehensive review of the state of the art.
Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute
Feature: Case studies included
Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning
and contamination problems.
As a whole, the series will create a unique and comprehensive knowledge base of crucial importance to those in research & development, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books.
About the Editors
Chapter 1. Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide
2 Surface Cleanliness Levels
3 Dense-Phase Fluids
4 Principles of Dense-Phase CO2 Cleaning
5 Advantages and Disadvantages of Dense-Phase CO2 Cleaning
7 Summary and Conclusions
Chapter 2. Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications
2 Plasma Reactor Configurations
3 Semiconductor Manufacturing
4 Photovoltaic Cell Processing
5 Plasma Sterilization
6 Plasma Cleaning in the Restoration Industry
7 Plasma Cleaning Applications in Electron Microscopy
8 Additional Plasma Applications
9 Summary and Future Needs
Chapter 3. Clean Room Wipers for Removal of Surface Contamination
1 Principles of Wiping for Removal of Contaminants
2 Types of Wipers
3 Wiper Testing
4 Methods to Assess Wiper Quality
5 The Importance of Automation
7 Current Trends in Wiper Technology
8 Future Developments in Clean Room Wipers
Chapter 4. Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing
2 Impact of Microorganisms in the Environment
4 Environmental Monitoring
5 Environmental Contamination Control
6 Future Developmental Requirements
Chapter 5. Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale
2 Basic Concepts
3 Experimental Requirements