Description

In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.

This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.

Key Features

  • Comprehensive coverage of innovations in surface contamination and cleaning
  • Written by established experts in the contamination and cleaning field
  • Each chapter is a comprehensive review of the state of the art
  • Case studies included

Readership

As a whole, the series will create a unique and comprehensive knowledge base of crucial importance to those in research and development, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books

Table of Contents

Preface

About the Editors

Contributors

Chapter 1. Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide

1 Introduction

2 Surface Cleanliness Levels

3 Dense-Phase Fluids

4 Principles of Dense-Phase CO2 Cleaning

5 Advantages and Disadvantages of Dense-Phase CO2 Cleaning

6 Applications

7 Summary and Conclusions

Acknowledgment

Disclaimer

References

Chapter 2. Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications

1 Introduction

2 Plasma Reactor Configurations

3 Semiconductor Manufacturing

4 Photovoltaic Cell Processing

5 Plasma Sterilization

6 Plasma Cleaning in the Restoration Industry

7 Plasma Cleaning Applications in Electron Microscopy

8 Additional Plasma Applications

9 Summary and Future Needs

References

Chapter 3. Clean Room Wipers for Removal of Surface Contamination

1 Principles of Wiping for Removal of Contaminants

2 Types of Wipers

3 Wiper Testing

4 Methods to Assess Wiper Quality

5 The Importance of Automation

6 Applications

7 Current Trends in Wiper Technology

8 Future Developments in Clean Room Wipers

References

Chapter 4. Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing

1 Introduction

2 Impact of Microorganisms in the Environment

3 Sanitization

4 Environmental Monitoring

5 Environmental Contamination Control

6 Future Developmental Requirements

References

Chapter 5. Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale

1 Introduction

2 Basic Concepts

3 Experimental Requirements

4 Examples

5 Outlook

Details

No. of pages:
240
Language:
English
Copyright:
© 2013
Published:
Imprint:
William Andrew
Print ISBN:
9781437778816
Electronic ISBN:
9781437778823