Advances in Plasma-Grown Hydrogenated Films - 1st Edition - ISBN: 9780125330305, 9780080542874

Advances in Plasma-Grown Hydrogenated Films, Volume 30

1st Edition

Series Volume Editors: V. Agranovich Deborah Taylor
eBook ISBN: 9780080542874
Hardcover ISBN: 9780125330305
Imprint: Academic Press
Published Date: 28th November 2001
Page Count: 281
Tax/VAT will be calculated at check-out
30% off
30% off
30% off
30% off
30% off
20% off
20% off
30% off
30% off
30% off
30% off
30% off
20% off
20% off
30% off
30% off
30% off
30% off
30% off
20% off
20% off
170.00
119.00
119.00
119.00
119.00
119.00
136.00
136.00
135.00
94.50
94.50
94.50
94.50
94.50
108.00
108.00
220.00
154.00
154.00
154.00
154.00
154.00
176.00
176.00
Unavailable
DRM-Free

Easy - Download and start reading immediately. There’s no activation process to access eBooks; all eBooks are fully searchable, and enabled for copying, pasting, and printing.

Flexible - Read on multiple operating systems and devices. Easily read eBooks on smart phones, computers, or any eBook readers, including Kindle.

Open - Buy once, receive and download all available eBook formats, including PDF, EPUB, and Mobi (for Kindle).

Institutional Access

Secure Checkout

Personal information is secured with SSL technology.

Free Shipping

Free global shipping
No minimum order.

Table of Contents

  • Preface
  • Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications
    • 1.1 Introduction
    • 1.2 Research and Industrial Equipment
    • 1.3 Physics and Chemistry of PECVD
    • 1.4 Plasma Modeling
    • 1.5 Plasma Analysis
    • 1.6 Relation between Plasma Parameters and Material Properties
    • 1.7 Deposition Models
    • 1.8 Modifications of PECVD
    • 1.9 Hot Wire Chemical Vapor Deposition
    • 1.10 Expanding Thermal Plasma Chemical Vapor Deposition
    • 1.11 Applications
    • 1.12 Conclusion
    • Acknowledgments
  • Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon–Nitrogen Films
    • 2.1 Introduction
    • 2.2 Amorphous Hydrogenated Carbon Films
    • 2.3 Nitrogen Incorporation Into a-C:H Films
    • 2.4 Characterization of a-C(N):H Film Structure
    • 2.5 Mechanical Properties
    • 2.6 Optical and Electrical Properties
  • Subject index
    • Publisher Summary
  • Recent volumes in this series

Description

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects.

Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new title reflects more accurately the rapidly growing inclusion of research and development efforts on nanostructures, especially in relation to novel solid-state device formats

Readership

Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.


Details

No. of pages:
281
Language:
English
Copyright:
© Academic Press 2002
Published:
Imprint:
Academic Press
eBook ISBN:
9780080542874
Hardcover ISBN:
9780125330305

About the Series Volume Editors

V. Agranovich Series Volume Editor

Affiliations and Expertise

Russian Academy of Sciences, Moscow, Russia

Deborah Taylor Series Volume Editor

Affiliations and Expertise

Motorola, Austin, Texas, U.S.A.