Advances in Imaging and Electron Physics
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Advances in Imaging and Electron Physics merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Key Features
- Contains contributions from leading authorities on the subject matter
- Informs and updates with all the latest developments in the field of imaging and electron physics
- Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electron, and ion emission with a valuable resource
- Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, and digital image processing
Readership
Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general
Table of Contents
- Preface
- Future Contributions
- Chapter One: Quantum Entanglement in Photon-Induced Electron Spectroscopy of Atoms and Molecules: Its Generation, Characterization, and Applications
- Abstract
- 1 Introduction
- 2 Basics of Quantum Information
- 3 Entanglement in Electron Optics of Atoms
- 4 Entanglement in Electron Optics of Molecules
- 5 Conclusions
- Acknowledgments
- Appendix A Some of the Well-Known Bipartite and Tripartite States of Qubits and Their Important Properties
- Appendix B Density Matrices for Coulombic Entanglement Generated in Some of the Processes (4)–(9)
- Appendix C Density Matrices for Fine-Structure Entanglement Generated in Some of the Processes (4)–(9)
- Chapter Two: Voltage Contrast Modes in a Scanning Electron Microscope and Their Application
- Abstract
- 1 Introduction
- 2 Sensitivity and Transfer Function of Potential Relief Measurements in a SEM
- 3 Method of Field Contrast (Trajectory Sensitive Contrast Technique)
- 4 The Potential Contrast Methods
- 5 Methods of Eliminating Factors Contributing to the Measurement Errors of Local Potential and the Resolution Deterioration
- 6 Fundamentals of Dynamic Potential Contrast Methods and Their Applications
- 7 Measurements Using Potential Contrast in a SEM
- 8 Conclusions and Outlook
- Chapter Three: A Review of Scanning Electron Microscopy in Near Field Emission Mode
- Abstract
- 1 Introduction
- 2 Instrumentation
- 3 Geometric Influence on Field Emission
- 4 Primary Electron Beam Generation
- 5 Topographic Imaging
- 6 Alternative Contrast Mechanisms
- 7 Conclusions
- Acknowlegments
- Appendix A Detector Calibration
- Appendix B Comparison of reff vs rphys
- Index
- Contents of Volumes 151-195
Product details
- No. of pages: 358
- Language: English
- Copyright: © Academic Press 2016
- Published: September 26, 2016
- Imprint: Academic Press
- Hardcover ISBN: 9780128048122
- eBook ISBN: 9780128052280
About the Author
Peter Hawkes
Professor Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peter House and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Optical Society of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Affiliations and Expertise
Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique (CEMES), France
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