Description

Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Key Features

* Contributions from leading international scholars and industry experts * Discusses hot topic areas and presents current and future research trends * Invaluable reference and guide for physicists, engineers and mathematicians

Readership

Physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general

Table of Contents

  1. Magnetolithography - from the Bottom-Up Route to High Throughput – Amos Bardea and Ron Naaman
  2. The Optics of the Spatial Coherence Wavelets – Román Castañeda
  3. Common Diffraction Integral Calculation Based on Fast Fourier Transform Algorithm – LI Junchang, WU Yanmei and LI Yan
  4. A generalized approach to describe the interference contrast and the phase contrast method – Marcel Teschke and Stefan Sinzinger
  5. Nonlinear partial differential equations for noise problems – Booyong Choi
  6. Harmuth Corrigenda - Henning Harmuth

Details

No. of pages:
392
Language:
English
Copyright:
© 2010
Published:
Imprint:
Academic Press
Electronic ISBN:
9780123813138
Print ISBN:
9780123813121