1965 Transactions of the Third International Vacuum Congress - 1st Edition - ISBN: 9780080121260, 9781483156309

1965 Transactions of the Third International Vacuum Congress

1st Edition

28 Jun–2 July 1965, Stuttgart, Germany

Editors: H. Adam
eBook ISBN: 9781483156309
Imprint: Pergamon
Published Date: 1st January 1967
Page Count: 275
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Description

1965 Transactions of the Third International Vacuum Congress, Volume 2 presents the methods for the epitaxial growth of silicon, which makes use of an ultra-thin layer of a silicon alloy on the substrate surface to develop epitaxial layers at temperature as low as 750°C. This book discusses the potential advantages of the technique and the mechanism of the epitaxial growth process. Organized into four sessions encompassing 42 chapters, this volume starts with an overview of the exact influence of the thin alloy layer. This text then describes the novel X-ray method and its application to semiconductor thin-film problems. Other chapters consider the field of electronic carrier transport in semiconductor films with particular reference to active thin-film devices and their typical behavior. The final chapter deals with the beta-ray single-scatter gauge, which are tested and described in very simple operation. This book is a valuable resource for physicists and scientists.

Table of Contents


Part II

Session 5. Evaporation and Thin Films

A New Technique for Producing Epitaxial Silicon Layers Using Ultra-thin Alloy Zones

"Perfect Epitaxy" of Silicon Films on Silicon as Seen in Large-Area X-ray Topographs

Epitaxial Growth of Si on Si in Ultra-high Vacuum

Evaporation de permalloy par bombardement electronique

Thin Film Semiconductors

Some Experiments in the Reactive Evaporation of Tantalum Oxide

Preparation of High Mobility Thin Films of Indium Antimonide

Thermal Shock Effects in Quartz Crystal Microbalances

Weighing at Low Pressures

Impact Activated Sorption as a Means for Gas Incorporation in Sputtered Thin Films

Thin-film Hafnium-Hafnium Oxide Capacitors for high Temperature Operation

Uber die Aggregation von Silber- und Goldaufdampfschichten, die auf Kohlefolien erhohter Temperatur im Ultrahochvakuum niedergeschlagen wurden

Session 6. Vacuum Systems and Pumping Procedures

Pumpzeitberechnung von Vakuumanlagen bei variabler Wandtemperatur

Design Considerations for Vacuum Systems with built-in Getter Ion and Sublimation Pumps

Speed Measuring of Ion Getter Pumps by the "Three-Gauge" Method

The Measurement of Water Vapor Pressure in Vacuum Systems Using a Quartz Crystal Oscillator

Charakteristik von Pumpsystemen ftir grosse Wasserdampfmengen unter Vakuum unter Anwendung von Kondensation und Kompression des Wasserdampfes

Eine gepulste Hochfrequenz-Entladung als Gasumwalzpumpe

Die Anwendung des Kryopumpenprinzips zur Verklirzung der Pumpzeiten in Vakuumkammern

The Effect of Non-condensable Gas Pressure on the Evaporation Rate in a Short Path Distillation Unit

Session 7. Adsorption and Desorption

Modulated Molecular Beam Apparatus for Studies of Atomic Interactions with Surfaces

Controlled Hydrogen Partial Pressure in a Field Ion Microscope

The Chemisorption of Oxygen on Polycrystalline Tungsten

Messung von Adsorptionsisothermen mit Schwingquarzen

Adsorption Isotherms for Hydrogen, Deuterium, Helium, Argon, Neon, Oxygen and Nitrogen on Molecular Sieve 5A at 77°K

Sorption von Wasserstoff an kondensierten Titanschichten bei niedrigen Driicken

A Study of a Sorption Process

Ober die Bestimmung der Haftwahrscheinlichkeit von Gasen an reinen Metalloberflachen

Anwendung des Omegatrons mit schnellem Elektrometerverstarker zur Untersuchung von Desorptionsvorgangen

Untersuchung von Halbleiteroberflachen durch Desorptionsspektroskopie

Gas Desorption by Synchrotron Radiation in Storage Rings

Die mittlere Verweilzeit und Haftwahrscheinlichkeit von Kohlendioxyd an Eisen

Session 8. Pressure Measurement and Leak Detection

Measurement of Small Ion Currents in a Mass Spectrometer with a Scintillation Detector

High Sensitive D.C. Split-magnetron Ionization Gauge

Utilization of Omegatron Type Mass Spectrometer for the Analysis of Release Gases and Hydrolysis Gases from Alkali Fluorides Samples at High Temperature

The Stability of Omegatron Sensitivity for Different Electrode Materials

Theoretische Grundlagen und experimentelle Ergebnisse einer neuen Methode der Partialdruckmessung fur Vakuumanlagen

Yacuum Chromatography

A Two-Chamber Ionization Gauge

A Cycloidal Path Mass Spectrometer with Wirewound Electric Field Structure

Electrochemical Vacuum Gauges

The Electron-Single-Scatter Gauge - A New Vacuum Gauge for the Range from 10~5 Torr to 1 Torr

Part III

Session 9. Cryogenics; Vacuum Metallurgy

Eine Kryopumpe fiir Temperaturen bis 1,5°K mit sehr geringem Kaltemittelverbrauch

Ein Beitrag zu den Untersuchungen des Saugvermogens einer Kryopumpe fiir Gasgemische

A Simple Cryo-Getter Pump for Ultra-high Vacuum

Pump Speed Measurements in a New Type of Cryopumped Vacuum System

Yerteilung der molekularen Dichte und des Saugvermogens innerhalb grosser, mit Kryopumpen ausgerusteter, Yakuumkammern

Herstellung extrem gasfreier Metalle nach dem van Arkel-Yerfahren durch mehrfache Umsetzung

Das Vakuumgiessen von hochreinen Kupferteilen

Elektronenstrahl-Schweissen unter Yakuum und an Atmosphare

Vergleichende Betrachtungen der Umschmelzbedingungen im Yakuumlichtbogenofen und Elektronenstrahl-Mehrkammerofen

Session 10. Sputtering and Gettering

Optimale Ausnutzung des Magnetfeldes bei Ionen-Zerstauberpumpen

Untersuchung der elektrischen Gasaufzehrung von Ar, He, N2 und CO

Measurement by a Hot W Filament Technique of the Clean-up of Water Vapor in a N2 Atmosphere by Means of a Getter

Low Energy Triode Sputtering

An Evaluation of Sputtering Processes for Long-Term Electric Propulsion System Testing

Bias Sputtering of Molybdenum Films

RF Sputtering of Insulators

Dynamic Absolute Sputtering Yield Measurement in the Threshold Region

Sputtering Studies of Insulators by Means of Langmuir Probes

Getter-Ion Pumps with Directly Heated Titanium Evaporators

Session 11. Adsorption and Desorption

Sorption de l'oxyde de Carbone sur le Nickel polycristallin

Temperature Dependence of the Desorption of Argon Ionically Pumped in Glass

Sorption of inert gas ions by titanium

The Adsorption of Oxygen on Discontinuous Metal Films

Adsorptionsmessungen von Xenon an Aktivkohle im Hochvakuum bei — 196°C mit Hilfe eines radioaktiven Tracers

Ion Bombardment of Tungsten by Inert-Gas Ions and Subsequent Adsorption of Oxygen as observed in the Field Emission Microscope

Session 12. Space Simulation

Mesures directes en haute atmosphere

Thermal Radiative Properties of Carbon Dioxide Cryodeposits

Analysis of High Sticking Coefficient Cryopanel Arrays for the Simulation of the Permissive Nature of the Space Environment

The 2 m-Space Simulation Chamber of the DVL

Bericht iiber das Hochvakuum-Erprobungslaboratorium in Ottobrunn bei Miinchen

Session 13. Vacuum Metallurgy

Uber die Vakuumentgasung fliissiger Metalle mit Hilfe der Gasblasenpumpe

Moglichkeiten der Vakuum-Gas-Metallurgie bei der Herstellung des Stahles

Einfluss des Sauerstoff- und Wasserdampfpartialdruckes auf die Entgasung von Niob und Tantal

Influence des efforts appliques sur la deformation des microgeometries et la conductance interfaciale de deux solides en contact

Contents of Volume 1

Contents of Volume 2, Part I

Details

No. of pages:
275
Language:
English
Copyright:
© Pergamon 1967
Published:
Imprint:
Pergamon
eBook ISBN:
9781483156309

About the Editor

H. Adam