1965 Transactions of the Third International Vacuum Congress

1965 Transactions of the Third International Vacuum Congress

28 Jun–2 July 1965, Stuttgart, Germany

1st Edition - January 1, 1967

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  • Editor: H. Adam
  • eBook ISBN: 9781483156309

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Description

1965 Transactions of the Third International Vacuum Congress, Volume 2 presents the methods for the epitaxial growth of silicon, which makes use of an ultra-thin layer of a silicon alloy on the substrate surface to develop epitaxial layers at temperature as low as 750°C. This book discusses the potential advantages of the technique and the mechanism of the epitaxial growth process. Organized into four sessions encompassing 42 chapters, this volume starts with an overview of the exact influence of the thin alloy layer. This text then describes the novel X-ray method and its application to semiconductor thin-film problems. Other chapters consider the field of electronic carrier transport in semiconductor films with particular reference to active thin-film devices and their typical behavior. The final chapter deals with the beta-ray single-scatter gauge, which are tested and described in very simple operation. This book is a valuable resource for physicists and scientists.

Table of Contents


  • Part II

    Session 5. Evaporation and Thin Films

    A New Technique for Producing Epitaxial Silicon Layers Using Ultra-thin Alloy Zones

    "Perfect Epitaxy" of Silicon Films on Silicon as Seen in Large-Area X-ray Topographs

    Epitaxial Growth of Si on Si in Ultra-high Vacuum

    Evaporation de permalloy par bombardement electronique

    Thin Film Semiconductors

    Some Experiments in the Reactive Evaporation of Tantalum Oxide

    Preparation of High Mobility Thin Films of Indium Antimonide

    Thermal Shock Effects in Quartz Crystal Microbalances

    Weighing at Low Pressures

    Impact Activated Sorption as a Means for Gas Incorporation in Sputtered Thin Films

    Thin-film Hafnium-Hafnium Oxide Capacitors for high Temperature Operation

    Uber die Aggregation von Silber- und Goldaufdampfschichten, die auf Kohlefolien erhohter Temperatur im Ultrahochvakuum niedergeschlagen wurden

    Session 6. Vacuum Systems and Pumping Procedures

    Pumpzeitberechnung von Vakuumanlagen bei variabler Wandtemperatur

    Design Considerations for Vacuum Systems with built-in Getter Ion and Sublimation Pumps

    Speed Measuring of Ion Getter Pumps by the "Three-Gauge" Method

    The Measurement of Water Vapor Pressure in Vacuum Systems Using a Quartz Crystal Oscillator

    Charakteristik von Pumpsystemen ftir grosse Wasserdampfmengen unter Vakuum unter Anwendung von Kondensation und Kompression des Wasserdampfes

    Eine gepulste Hochfrequenz-Entladung als Gasumwalzpumpe

    Die Anwendung des Kryopumpenprinzips zur Verklirzung der Pumpzeiten in Vakuumkammern

    The Effect of Non-condensable Gas Pressure on the Evaporation Rate in a Short Path Distillation Unit

    Session 7. Adsorption and Desorption

    Modulated Molecular Beam Apparatus for Studies of Atomic Interactions with Surfaces

    Controlled Hydrogen Partial Pressure in a Field Ion Microscope

    The Chemisorption of Oxygen on Polycrystalline Tungsten

    Messung von Adsorptionsisothermen mit Schwingquarzen

    Adsorption Isotherms for Hydrogen, Deuterium, Helium, Argon, Neon, Oxygen and Nitrogen on Molecular Sieve 5A at 77°K

    Sorption von Wasserstoff an kondensierten Titanschichten bei niedrigen Driicken

    A Study of a Sorption Process

    Ober die Bestimmung der Haftwahrscheinlichkeit von Gasen an reinen Metalloberflachen

    Anwendung des Omegatrons mit schnellem Elektrometerverstarker zur Untersuchung von Desorptionsvorgangen

    Untersuchung von Halbleiteroberflachen durch Desorptionsspektroskopie

    Gas Desorption by Synchrotron Radiation in Storage Rings

    Die mittlere Verweilzeit und Haftwahrscheinlichkeit von Kohlendioxyd an Eisen

    Session 8. Pressure Measurement and Leak Detection

    Measurement of Small Ion Currents in a Mass Spectrometer with a Scintillation Detector

    High Sensitive D.C. Split-magnetron Ionization Gauge

    Utilization of Omegatron Type Mass Spectrometer for the Analysis of Release Gases and Hydrolysis Gases from Alkali Fluorides Samples at High Temperature

    The Stability of Omegatron Sensitivity for Different Electrode Materials

    Theoretische Grundlagen und experimentelle Ergebnisse einer neuen Methode der Partialdruckmessung fur Vakuumanlagen

    Yacuum Chromatography

    A Two-Chamber Ionization Gauge

    A Cycloidal Path Mass Spectrometer with Wirewound Electric Field Structure

    Electrochemical Vacuum Gauges

    The Electron-Single-Scatter Gauge - A New Vacuum Gauge for the Range from 10~5 Torr to 1 Torr

    Part III

    Session 9. Cryogenics; Vacuum Metallurgy

    Eine Kryopumpe fiir Temperaturen bis 1,5°K mit sehr geringem Kaltemittelverbrauch

    Ein Beitrag zu den Untersuchungen des Saugvermogens einer Kryopumpe fiir Gasgemische

    A Simple Cryo-Getter Pump for Ultra-high Vacuum

    Pump Speed Measurements in a New Type of Cryopumped Vacuum System

    Yerteilung der molekularen Dichte und des Saugvermogens innerhalb grosser, mit Kryopumpen ausgerusteter, Yakuumkammern

    Herstellung extrem gasfreier Metalle nach dem van Arkel-Yerfahren durch mehrfache Umsetzung

    Das Vakuumgiessen von hochreinen Kupferteilen

    Elektronenstrahl-Schweissen unter Yakuum und an Atmosphare

    Vergleichende Betrachtungen der Umschmelzbedingungen im Yakuumlichtbogenofen und Elektronenstrahl-Mehrkammerofen

    Session 10. Sputtering and Gettering

    Optimale Ausnutzung des Magnetfeldes bei Ionen-Zerstauberpumpen

    Untersuchung der elektrischen Gasaufzehrung von Ar, He, N2 und CO

    Measurement by a Hot W Filament Technique of the Clean-up of Water Vapor in a N2 Atmosphere by Means of a Getter

    Low Energy Triode Sputtering

    An Evaluation of Sputtering Processes for Long-Term Electric Propulsion System Testing

    Bias Sputtering of Molybdenum Films

    RF Sputtering of Insulators

    Dynamic Absolute Sputtering Yield Measurement in the Threshold Region

    Sputtering Studies of Insulators by Means of Langmuir Probes

    Getter-Ion Pumps with Directly Heated Titanium Evaporators

    Session 11. Adsorption and Desorption

    Sorption de l'oxyde de Carbone sur le Nickel polycristallin

    Temperature Dependence of the Desorption of Argon Ionically Pumped in Glass

    Sorption of inert gas ions by titanium

    The Adsorption of Oxygen on Discontinuous Metal Films

    Adsorptionsmessungen von Xenon an Aktivkohle im Hochvakuum bei — 196°C mit Hilfe eines radioaktiven Tracers

    Ion Bombardment of Tungsten by Inert-Gas Ions and Subsequent Adsorption of Oxygen as observed in the Field Emission Microscope

    Session 12. Space Simulation

    Mesures directes en haute atmosphere

    Thermal Radiative Properties of Carbon Dioxide Cryodeposits

    Analysis of High Sticking Coefficient Cryopanel Arrays for the Simulation of the Permissive Nature of the Space Environment

    The 2 m-Space Simulation Chamber of the DVL

    Bericht iiber das Hochvakuum-Erprobungslaboratorium in Ottobrunn bei Miinchen

    Session 13. Vacuum Metallurgy

    Uber die Vakuumentgasung fliissiger Metalle mit Hilfe der Gasblasenpumpe

    Moglichkeiten der Vakuum-Gas-Metallurgie bei der Herstellung des Stahles

    Einfluss des Sauerstoff- und Wasserdampfpartialdruckes auf die Entgasung von Niob und Tantal

    Influence des efforts appliques sur la deformation des microgeometries et la conductance interfaciale de deux solides en contact

    Contents of Volume 1

    Contents of Volume 2, Part I

Product details

  • No. of pages: 275
  • Language: English
  • Copyright: © Pergamon 1967
  • Published: January 1, 1967
  • Imprint: Pergamon
  • eBook ISBN: 9781483156309

About the Editor

H. Adam

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