Laser Crystallization of Silicon - Fundamentals to Devices


  • Norbert Nickel, Hahn-Meitner-Institut, Berlin, Germany

This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.
View full description


Academic and Industrial researchers across all disciplines involved in the study of semiconductors and semimetals.


Book information

  • Published: December 2003
  • ISBN: 978-0-12-752184-8

Table of Contents

Preface; introduction to laser crystallization of silicon; heat transfer and phase transformations in laser melting and recrystallization of amorphous thin si films; modelling laser-induced phase change processes: theory and computation; laser interference crystallization of amorphous films; structural and electronic properties of laser crystallized poly-si.