Laser Crystallization of Silicon - Fundamentals to DevicesBy
- Norbert Nickel, Hahn-Meitner-Institut, Berlin, Germany
This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.
Academic and Industrial researchers across all disciplines involved in the study of semiconductors and semimetals.
Semiconductors and Semimetals
Hardbound, 204 Pages
Published: December 2003
Imprint: Academic Press
- Preface; introduction to laser crystallization of silicon; heat transfer and phase transformations in laser melting and recrystallization of amorphous thin si films; modelling laser-induced phase change processes: theory and computation; laser interference crystallization of amorphous films; structural and electronic properties of laser crystallized poly-si.