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CURRENT OPINION IN COLLOID & INTERFACE SCIENCE

ISSN: 1359-0294


Editorial Board


Editors:

E.W. Kaler
Stony Brook University, 407 Administration Building, Stony Brook, NY 11794-1401, Tel: +1 631-632-7317, Fax: +1 631 632 7112, Email: eric.kaler@stonybrook.edu
K. Holmberg
Department of Applied Surface Chemistry, Chalmers University of Technology, SE-412 96 Göteborg, Sweden, Tel: +46 31 772 2969, Fax: +46 31 16 0062, Email: kh@chem.chalmers.se


Section Editors



Applications:

N. Garti
Casali Institute of Applied Chemistry, Hebrew University of Jerusalem, Jerusalem, Israel
A. Hatton
Massachusetts Institute of Technology, Department of Chemical Engineering, Cambridge, MA, USA
J. Texter
Eastern Michigan University, College of Technology and Coatings Research Institute, Ypsilanti, MI, USA


Biological Colloids and Interfaces:

M. Malmsten
Uppsala University, Uppsala, Sweden
S. Zauscher
Duke University, Durham, NC, USA


Electrokinetics:

J. Lyklema
Wageningen University, The Netherlands
C. Werner
Institute for Polymer Research, Dresden, Germany


Emulsions and Microemulsions:

K. Aramaki
Graduate School of Environment & Information Sciences Yokohama National University, Yokohama, Japan
C. Solans
Department de Tecnologia de Tensioactius, Instituto de Investigaciones Quimicas y Ambientales de Barcelona, Barcelona, Spain


Food Colloids:

E. Dickinson
Procter Department of Food Science, The University of Leeds, Leeds, UK
M. Leser
Nestlé Research Center Lausanne, Lausanne, Switzerland


Liquid Crystals:

S. Hyde
The Australia National University, Canberra, Australia


Microscopy Methods:

D. Danino
Department of Biotechnology and Food Engineering, Haifa, Israel


Nanostructures:

R.F. Lobo
Department of Chemical Engineering, University of Delaware, Newark, DE, USA
A. Palmqvist
Department of Applied Surface Chemistry, Chalmers University of Technology, Goteborg, Sweden


NMR:

I. Furo
Royal Institute of Technology, Department of Chemistry, Stockholm, Sweden


Polyelectrolytes:

L. Piculell
Lund University, Center for Chemistry and Chemical Eng., Lund, Sweden
M. Santore
Department of Polymer Science, University of Massachusetts, Amherst, MA, USA


Self Assembly:

A. Blume
Institute of Physical Chemistry, Department of Chemistry, Martin Luther University Hall-Wittenberg, Halle/Saale, Germany
J. Li
Key Lab. of Colloid & Surface Science, Chinese Academy of Sciences, Institute of Chemistry, Beijng, China
T. Zemb
Service de Chimie Moleculaire, C.E.A./ Saclay , Gif-sur-Yvette, France


Surface Analysis Techniques:

L. Liggieri
CNR, Genova, Italy
R. Miller
Max-Planck-Institute for Colloids and Interfaces, Berlin, Germany


Surfactants:

P.D.I Fletcher
Surfactant & Colloid Group, Department of Chemistry, University of Hull, Hull, UK
M.P. Krafft
Chimie des Systéms Associatifs, Institut Charles Sadron (CNRS), Strasbourg, France
R. Strey
Institüt für Physikalische Chemie, Köln, Germany


Theory:

N. Dan
Department of Chemical Engineering, Drexel University, Philadelphia, PA, USA
B. Jönsson
Lund University, Theoretical Chemistry, Lund, Sweden


Thin Films and Foams:

D. Platikanov
University of Sofia, Department of Physical Chemistry, Sofia, Bulgaria
D. Exerowa
Bulgarian Academy of Sciences, Institute of Physical Chemistry, Sofia, Bulgaria


X-Ray and Neutron Scattering:

J. Penfold
ISIS Facility, CLRC, Rutherford Appleton Laboratory, Chilton Didcot, UK
P. Schurtenberger
Physics Department, Soft Condensed Matter Group, University of Fribourg, Fribourg, Switzerland
N. Wagner
Chemical Engineering, Colburn Laboratory, University of Delaware, Newark, DE, USA


Editor Emeritus:

B.H. Robinson
Norwich, UK


Editorial Board:

J. Anderson
USA
M.E. Cates
UK
K. Dawson
Ireland
A.P. Gast
USA
T.W. Healy
Australia
H. Hoffmann
Germany
J. Holzwarth
Germany
J.N. Israelachvili
USA
T. Kunitake
Japan
D. Langevin
France
B. Lindman
Sweden
R.A. Mackay
USA
S. Mann
UK
H. Möhwald
Germany
B.W. Ninham
Australia
R.H. Ottewill
UK
C.J. Radke
USA
E. Ruckenstein
USA
W.B. Russel
USA
S.A. Safran
Israel
D.C. Steytler
UK
Y. Talmon
Israel
R.K. Thomas
USA
D. Wasan
USA
J. Weers
USA
Current Opinion in Colloid & Interface Science
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