Home | Site map | Elsevier websites | Alerts
Elsevier
Product information search
Search all Elsevier sites
Search
Advanced Product Search
Go to Elsevier home page
SiteStat.jsp
JOURNAL OF CRYSTAL GROWTH

ISSN: 0022-0248


Editorial Board


Principal Editor:

T.F. Kuech
Dept. of Chemical Engineering, University of Wisconsin-Madison, Madison, WI 53706, USA, Email: kuech@engr.wisc.edu


Editorial Board:

R.S. Feigelson
Geballe Laboratory for Advanced Materials, McCullough Bldg., Stanford University, Stanford, CA 94305-4045, USA, Fax: +1 650 723 3044, Email: feigel@leland.stanford.edu
R. Kern
CRMC2, CNRS, Campus Luminy, Case 913, F-13288 Marseille Cedex 9, France, Fax: +33 491 418 916, Email: kern@crmcn.univ-mrs.fr
K. Nakajima
Tohoku University, Institute for Materials Research, 2-1-1, Katahira, Aoba-ku, Sendai 980-8577, Japan, Fax: +81 22-215-2011, Email: nakasisc@imr.tohoku.ac.jp
G.B. Stringfellow
Electrical and Computer Engineering Department, University of Utah, 50 S. Central Campus Drive, 3280 MEB, Salt Lake City, UT 84112, USA, Tel: +1 801 581 8387, Fax: +1 801 581 8692, Email: stringfellow@eng.utah.edu
M. Schieber (Founding Editor)
The Fredy and Nadine Herrmann Graduate School of Appl. Sci., Hebrew University, Jerusalem 91904, Israel, Fax: +972 2 566 3878, Email: schieber@vms.huji.ac.il


Associate Editors:

H. Asahi (Molecular Beam Epitaxy)
The Institute of Scientific and Industrial Research, Osaka University, 8-1, Mihogaoka, Ibraki, Osaka 567-0047, Japan, Tel: +81 6 6879 8405, Fax: +81 6 6879 8409, Email: asahi@sanken.osaka-u.ac.jp
K.W. Benz (Microgravity, Electronic Materials)
Freiburger Materialforschungszentrum, Albert-Ludwigs-Universität, Stefan-Meier-Strasse 21, D-79104 Freiburg, Germany, Fax: +49 761 203 4709, Email: klaus-werner.benz@fmf.uni-freiburg.de
R. Bhat (Thin Film, Epitaxial Growth)
Corning, Inc., SP PR 02-3, Sullivan Park, Corning, NY 14831, USA, Tel: +1 607 974 1035, Fax: +1 607 974 1650, Email: bhatr@corning.com
R.M. Biefeld (Epitaxial Growth and Nanostructures)
Manager, Dept 1126, MS 0601, Sandia National Labs, PO Box 5800, Albuquerque, NM 87185-0601, USA, Tel: +1 505 844 1556, Fax: +1 505 844 3211, Email: rmbiefe@sandia.gov
E. Calleja (Molecular Beam Epitaxy of Compound Semiconductors, Materials for Devices)
ISOM Dept. Electronics Engineering, ETSI Telecommunicacion, UPM, 28040 Madrid, Spain, Tel: +34 91 3367315, Fax: +34 91 3367323, Email: calleja@die.upm.es
J.J. Derby (Computational Models)
Dept. of Chemical Engineering & Materials Science, University of Minnesota, 151 Amundson Hall, 421 Washington Ave .S.E., Minneapolis, MN 55455-0132, USA, Fax: 1 612 626 7246, Email: derby@umn.edu
J. De Yoreo (Solution Growth)
Laboratory Science and Technology Office, L-003, Lawrence Livermore National Laboratory, PO Box 808, Livermore, CA 94551, USA, Tel: +1 925 423 4240, Fax: +1 925 424 4820, Email: deyoreo1@11nl.gov
R. Fornari (Substrates, Growth from the melt, MO Chemical Vapour deposit, Oxides, Nitrides, Phosphides, Semicond. III-V Materials, Piezoelectric Materials)
Institut für Kristallzüchtung, Max-Born-Str. 2, 12489 Berlin, Germany, Tel: +49 30 6392 3000, Fax: +49 30 6392 3003, Email: fornari@ikz-berlin.de
V. Fratello (Oxide crystals, Liquid Phase Epitaxy of oxides, Solution growth of oxides, Magnetic materials, Optical materials)
Integrated Photonics, Inc., 132 Stryker Lane, Hillsborough, NJ 08844, USA, Tel: + 908 281 8000, Fax: +1 908 281 0191, Email: vjfratello@integratedphotonics.com
H. Fujioka (Semiconductors, nanostructures and epitaxial growth bulk crystal growth)
Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan, Tel: +81 3 5452 6342, Fax: +81 3 5452 6343, Email: hfujioka@iis.u-tokyo.ac.jp
Y. Furukawa (Crystallization kinetics and Pattern formation)
Insitute of Low Temperature Sciences, Hokkaido University, Kita-19 Nishi-8, Kita-ku,Sapporo, 060-0819, Japan, Tel: +81 11 706 5467, Fax: +81 11 706 5467, Email: frkw@lowtem.hokudai.ac.jp
M.S. Goorsky (XRD Characterization, Epitaxy for Devices)
Dept. Mat. Sci. Eng., Univ. California, Los Angeles, CA 90095-1595, USA, Tel: +1 310 206 0267, Fax: +1 310 206 7353, Email: goorsky@seas.ucla.edu
R. James (II-VI Semiconductors, Radiation Sensors)
Associate Laboratory Director, Engergy - Environment and National Security, Brookhaven National Laboratory, Building 460, Upton L.I., NY 11973, USA, Tel: +1 631 344 8633, Fax: +1 631 344 5584, Email: rjames@bnl.gov
M. Kawasaki (Oxide Thin Films and Epitaxy)
Tohoku University, Institute for Materials Research, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan, Tel: +81 22 215 2085, Fax: +81 22 215 2086, Email: kawasaki@imr.tohoku.ac.jp
B.A. Korgel (Nanocrystals and Nanowires)
Department of Chemical Engineering, Texas Materials Institute and Center for Nano- and Molecular Science and Technology, 1 University Station C0400, The University of Texas at Austin, Austin, TX 78712, Tel: +1 512 471 5633, Fax: +1 512 471 7060, Email: korgel@che.utexas.edu
G.B. McFadden (Theory)
National Institute of Standards and Technology, Building 820, Room 365, 100 Bureau Drive, Stop 8910, Gaithersburg , MD 20899-8910, USA, Tel: +1 301 975 2711, Fax: +1 301 990 4127, Email: mcfadden@nist.gov
J.B. Mullin (Semiconductors)
EMC, 22 Branksome Towers, Westminster Road, Poole, Dorset, BH13 6JT, UK, Fax: +44 1202 762 172, Email: brian.mullin@btinternet.com
D.P. Norton (Oxide Thin Films and Epitaxy)
University of Florida, Dept. of Materials Science & Engineering, 100 Rhines Hall, P.O. Box 116400, Gainsville, FL 32611-6400, USA, Tel: +1 352 846 0525, Fax: +1 352 846 1182, Email: dnort@mse.ufl.edu
A.G. Ostrogorsky (Bulk crystal growth)
Mechanical, Aerospace and Nuclear Engineering Dept. and Materials Science and Engineering Dept., JEC 2026, Rensselaer Polytechnic Institute,110 8-th Street, Troy, NY 12180, USA, Tel: +1 518 276 6975, Email: ostroa@rpi.edu
K. Ploog (Molecular Beam Epitaxy)
Paul-Drude Inst. f. Festkörperelektronik, Hausvogteiplatz 5-7, D-10017 Berlin, Germany, Fax: +49 203 77201, Email: ploog@pdi-berlinde
J.M. Redwing (Nanoscale Materials, Quantum Dots, Nanoparticles, Nanowires
Pennsylvania State University, Department of Materials Science and Engineering, 108 Steidle Building, University Park, PA 16802, USA, Tel: +1 814 865 8665, Email: redwing@matse.psu.edu
M. Rettenmayr (Soldification)
Friedrich Schiller Universitat Jena, Institut for Materialwissenschaft und Werkstofftechnologie, Lobdergraben 32, D-07743, Jena, Germany, Tel: +49 3641 947790, Fax: +49 3641 947792, Email: M.Rettenmayr@uni-jena.de
M. Roth (Nonlinear optical and electro-optical materials)
School of Applied Science, The Hebrew University, Giv'at Ram Campus, Jerusalem 91904, Israel, Tel: +972 658 6364, Fax: +972 566 3878, Email: mroth@vms.huji.ac.il
P. Rudolph (Defects, Bulk growth, Special types of growth technolgies, Semiconductors, Thermodynamics and kinetics, Melt structure)
Institute for Crystal Growth, Max-Born-Str. 2, D-12489 Berlin, Germany, Tel: +49 30 6392 3034, Fax: +49 30 6392 3003, Email: rudolph@ikz-berlin.de
K. Sato (Biocrystallisation and Organic Crystals)
Fac. Appl. Biol. Sci., Hiroshima University, Higashi-Hiroshima 724, Japan, Fax: 81 824 227 062, Email: kyosato@ipc.hiroshima-u.ac.jp
D.W. Shaw (Semiconductors, Epitaxy, Devices)
University of Texas, 503 Potomac PL, Southlake, TX 76092, USA, Fax: +1 972 234 2648, Email: dshaw@utdallas.edu
M. Skowronski (Wide band gap semiconductors)
Dept. of Materials Science and Engineering, Carnegie Mellon University, Roberts Hall 150, 5000 Forbes Avenue, Pittsburgh, PA 15213, USA, Tel: +1 412 268 2710, Fax: +1 412 268 3113, Email: mareks@cmu.edu
M. Tischler (Priority Communications)
Ocis Technology LLC, 4427 E. Turquoise Ave.,Phoenix, AZ 85028, USA, Tel: +1 602 317 6249, Email: tisch@ocistech.com
S. Uda (Oxide crystal growth, Physical chemistry of melt, Growth mechanism)
Institute for Materials Research, Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980-8577, Japan, Tel: +81 22 215 2100, Fax: +81 22 215 2101, Email: uda@imr.tohoku.ac.jp
M. Uwaha (Growth Kinetics)
Dept. of Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8502, Japan, Tel: +81 52 789 2874, Fax: +81 52 789 2928, Email: uwaha@nagoya-u.jp
S. Veesler (Solution growth: Industrial - biological macromolecules - pharmaceutical compounds)
CRMCN-CNRS, Centre de Recherche en Matiere Condensee et Nanosciences, Campus de luminy case 913, F-13288 Marseille Cedex 9, France, Tel: +33 6 62 92 28 66, Fax: +33 4 91 41 89 16, Email: veesler@crmcn.univ-mrs.fr
Journal of Crystal Growth
Printer-friendly version   Printer-friendly version
 Home | Site map | Privacy policy | Terms and Conditions | Feedback | A Reed Elsevier company
 Copyright © 2007 Elsevier B.V. All rights reserved.