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ADVANCES IN COLLOID AND INTERFACE SCIENCE
An International Journal Devoted to Experimental and Theoretical Developments in Interfacial and Colloidal Phenomena and their Implications in Biology, Chemistry, Physics and Technology

ISSN: 0001-8686


Editorial Board


Editors:

J. Berg
Department of Chemical Engineering, University of Washington, PO Box 351750, Seattle, WA 98195-1750, USA, Tel: +1 206 543 2029, Fax: +1 206 543 3778, Email: berg@cheme.washington.edu
R. Miller
Max Planck Institute of Colloid and Interface Science, Max-Planck-Campus, Haus 2, Am Mühlenberg 2, D-14476 Golm/Potsdam, Germany, Tel: +49 331 5679252, Fax: +49 331 567 9202, Email: miller@mpikg-golm.mpg.de


Editor Emeritus:

J.Th.G. Overbeek
University of Utrecht, The Netherlands


Editorial Board:

Z. Adamczyk
Cracow, Poland
R. Aveyard
Hull, UK
M.A. Cohen-Stuart
Wageningen, The Netherlands
I. Dekany
Szeged, Hungary
S.S. Dukhin
Kiev, Ukraine
V.B. Fainerman
Donetzk, Ukraine
L. Liggieri
Genova, Italy
B. Lindman
Lund, Sweden
P.F. Luckham
London, UK
J. Mewis
Heverlee, Belgium
R. Narayanan
Gainsville, FL, USA
A.W. Neumann
Toronto, Ont., Canada
D. Platikanov
Sofia, Bulgaria
D.C. Prieve
Pittsburgh, PA, USA
V.M. Starov
Loughborough, UK
W.A. Steele
University Park, PA, USA
D. Vollhardt
Berlin, Germany
H. Watzke
Lausanne, Switzerland


Honarary Editor:

Th.T. Tadros
Wokingham, UK
Advances in Colloid and Interface Science
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