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Additional InformationReadersAuthorsLibrariansEditorsReviewersAdvertisers/Sponsors ISSN: 0272-8842 Imprint: ELSEVIER
Editorial Board
General EditorP. Vincenzini | National Research Council, Faenza, Italy |
Editors-in-ChiefJ.F. Baumard | Ecole Nationale Supérieure de Céramique Industrielle (ENSCI), Limoges Cedex, France |
R.K. Bordia | University of Washington, Seattle, WA, USA |
J. Gauckler | Eidgenössische Technische Hochschule Zürich (ETH), Zurich, Switzerland |
J. Guo | Chinese Academy of Sciences (CAS), SHANGHAI, China |
K. Koumoto | Nagoya University, Nagoya, Japan |
R. Pampuch | AGH University of Science & Technology, Krakow, Poland |
Editorial BoardD. Agrawal | Pennsylvania State University, University Park, PA, USA |
A. Akbar | The Ohio State University, Columbus, OH, USA |
R. Asthana | University of Wisconsin at Stout, Menomonie, WI, USA |
J.P. Bennett | U.S. Department of Energy, Albany, OR, USA |
P. Colombo | Università degli Studi di Padova, Padova, Italy |
R. Danzer | Montanuniversität Leoben, Leoben, Austria |
G. Fantozzi | I.N.S.A., Villeurbanne Cedex, France |
P. Fauchais | Université de Limoges, Limoges Cedex, France |
R. Flükiger | Université de Genève, Geneve 4, Switzerland |
R. Freer | The University of Manchester, Manchester, UK |
W.L. Gladfelter | University of Minnesota, Minneapolis, MN, USA |
Y. Gogotsi | Drexel University, Philadelphia, PA, USA |
P. Greil | Friedrich-Alexander-Universität Erlangen-Nürnberg, Erlangen, Germany |
D. Guyomar | INSA de Lyon, Villeurbanne, France |
K. Haberko | AGH University of Science & Technology, Kraków, Poland |
H.J. Hannink | CSIRO (The Commonwealth Scientific and Industrial Research Organization), Clayton, VIC, Australia |
J.G. Heinrich | Technische Universität Clausthal-Zellerfeld, Clausthal, Germany |
H-D. Kim | Korea Institute of Machinery and Materials, Gyeongnam, South Korea |
S. Komarneni | Pennsylvania State University, University Park, PA, USA |
W.E. Lee | Imperial College, London, UK |
J. Lis | AGH University of Science & Technology, Kraków, Poland |
S. Mathur | Universität zu Köln, Köln, Germany |
Y. Miyamoto | Toyo Tanso Co., Ltd, Osaka, Japan |
M. Murakami | Shibaura Institute of Technology, Tokyo, Japan |
R. Naslain | Domaine Universitaire, Pessac, France |
T. Ogawa | Shizuoka University, Fukuroi, Japan |
T. Ohji | National Institute of Advanced Industrial Science and Technology (AIST), Nagoya, Japan |
G. Oprea | University of British Columbia, Vancouver, BC, Canada |
A. Pierre | Université Claude Bernard - Lyon I, Villeurbanne, France |
R.M. Pilliar | University of Toronto, Toronto, ON, Canada |
J. Poirier | University of Orleans, Orleans, France |
T.A. Prikhna | Ukrainian National Academy of Sciences (NAS), Kiev, Ukraine |
R. Raj | University of Colorado at Boulder, Boulder, CO, USA |
R. Reisfeld | Hebrew University of Jerusalem, Jerusalem, Israel |
R. Riedel | Technische Universität Darmstadt, Darmstadt, Germany |
S. Sano | National Institute of Advanced Industrial Science and Technology (AIST), Nagoya, Aichi, Japan |
T. Sato | Tohoku University, Sendai, Japan |
N. Setter | École Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland |
V.I. Shevchenko | Russian Academy of Sciences, St. Petersburg, Russian Federation |
W. Sigmund | University of Florida, Gainesville, FL, USA |
M. Singh | NASA Glenn Research Center, Cleveland, OH, USA |
V.K. Srivastava | Banaras Hindu University, Varanasi, India |
C. Subbarrao | Tata Research Development and Design Centre, Pune, India |
D. Tretyakov | M. V. Lomonosov Moscow State University, Moscow, Russian Federation |
C. Vahlas | Centre Interuniversitaire de Recherche D'Ingenierie des Materiaux, Toulouse, France |
O. Van der Biest | Katholieke Universiteit Leuven, Heverlee-Leuven, Belgium |
J.A. Varela | Universidade Estadual Paulista (UNESP), Araraquara, Brazil |
K. Watari | National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki, Japan |
S. Wiederhorn | National Institute of Standards and Technology, Gaithersburg, MD, USA |
D. Yan | Chinese Academy of Sciences (CAS), SHANGHAI, China |
K.H. Yoon | Technische Universität Dresden, Dresden, Germany |
W. Zhu | Nanyang Technological University, Singapore |
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