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Journal of Process Control

A journal of IFAC, the International Federation of Automatic Control

Journal of Process Control
ISSN: 0959-1524
Imprint: ELSEVIER

Statistics
Impact Factor: 1.606
5-Year Impact Factor: 2.197
Issues per year: 10

Editorial Board



Editor

W. Marquardt
Lehrstuhl für Prozesstechnik, Rheinisch-Westfälische Technische Hochschule Aachen (RWTH), Templergraben 46, 52062 Aachen, Germany, Fax: 0049241 8888326, Tel: 0049 241 806712, Email: Wolfgang.Marquardt@post.rwth-aachen.de

Regional Editor (Asia / Australasia)

H.-P. Huang
Dept. of Chemical Engineering, National Taiwan University, 1 4 Sec. 4 Roosevelt Rd., 106-17 Taipei, Taiwan, ROC, Email: huanghpc@ntu.edu.tw

Regional Editor (Europe / Africa / Middle East)

D. Dochain
CESAME, Batiment Euler, Université Catholique de Louvain, avenue Georges Lemaître 4, B-1348 Louvain-la-Neuve, Belgium, Tel: 010 47 23 78, Email: denis.dochain@uclouvain.be

Regional Editor (The Americas)

N.L. Ricker
Dept. of Chemical Engineering, University of Washington, Box 351750, Seattle, WA 98195-1750, USA, Fax: 206 543 3451, Tel: 206-543-8786, Email: ricker@u.washington.edu

Reviews Editor

S. Skogestad
Inst. of Chemical Engineering, Norwegian University of Science & Technology (NTNU), N-7491 Trondheim, Norway, Fax: +47 735 94080, Tel: +47 735 94154, Email: sigurd.skogestad@chemeng.ntnu.no

Associate Editor

Y. Arkun
Istanbul, Turkey
J. Bao
University of New South Wales, Sydney, NSW, Australia
D. Bonvin
Laboratoire d' Automatique, Lausanne, Switzerland
R. Braatz
University of Illinois at Urbana-Champaign, Urbana, IL, USA
M-S. Chiu
National University of Singapore (NUS), Singapore
B.J. Cott
Shell Projects and Technology, Amsterdam, Netherlands
S. Engell
Technische Universität Dortmund, Dortmund, Germany
B. Foss
Norwegian University of Science & Technology (NTNU), Trondheim, Norway
F. Gao
Hong Kong University of Science & Technology, Kowloon, Hong Kong
R. Gudi
Indian Institute of Technology, Mumbai, India
T. Harris
Queens University, Kingston, ON, Canada
M.A. Henson
University of Massachusetts at Amherst, Amherst, MA, USA
A. Horch
ABB Corporate Research, Ladenburg, Germany
M. Kano
Kyoto University, Kyoto, Japan
R. King
Technische Universität Berlin (TUB), Berlin, Germany
J. Lee
Georgia Institute of Technology, Atlanta, GA, USA
G. Pannocchia
Università di Pisa, Pisa, Italy
S. Qin
University of Southern California (USC), Los Angeles, CA, USA
C. Scali
Università di Pisa, Pisa, Italy
N. Thornhill
Imperial College, London, UK
D. Wilson
Auckland University of Technology, Auckland, New Zealand
D. Zhou
Tsinghua University, Beijing, China
 
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