Dept. of Chemical Engineering, University of Washington, Box 351750, Seattle, WA 98195-1750, USA, Fax: 206 543 3451, Tel: 206-543-8786, Email: ricker@u.washington.edu
Reviews Editor
S.
Skogestad
Inst. of Chemical Engineering, Norwegian University of Science & Technology (NTNU), N-7491 Trondheim, Norway, Fax: +47 735 94080, Tel: +47 735 94154, Email: sigurd.skogestad@chemeng.ntnu.no
Associate Editor
Y.
Arkun
Istanbul, Turkey
J.
Bao
University of New South Wales, Sydney, NSW, Australia
D.
Bonvin
Laboratoire d' Automatique, Lausanne, Switzerland
R.
Braatz
University of Illinois at Urbana-Champaign, Urbana, IL, USA
M-S.
Chiu
National University of Singapore (NUS), Singapore
B.J.
Cott
Shell Projects and Technology, Amsterdam, Netherlands
S.
Engell
Technische Universität Dortmund, Dortmund, Germany
B.
Foss
Norwegian University of Science & Technology (NTNU), Trondheim, Norway
F.
Gao
Hong Kong University of Science & Technology, Kowloon, Hong Kong
R.
Gudi
Indian Institute of Technology, Mumbai, India
T.
Harris
Queens University, Kingston, ON, Canada
M.A.
Henson
University of Massachusetts at Amherst, Amherst, MA, USA
A.
Horch
ABB Corporate Research, Ladenburg, Germany
M.
Kano
Kyoto University, Kyoto, Japan
R.
King
Technische Universität Berlin (TUB), Berlin, Germany
J.
Lee
Georgia Institute of Technology, Atlanta, GA, USA
G.
Pannocchia
Università di Pisa, Pisa, Italy
S.
Qin
University of Southern California (USC), Los Angeles, CA, USA
C.
Scali
Università di Pisa, Pisa, Italy
N.
Thornhill
Imperial College, London, UK
D.
Wilson
Auckland University of Technology, Auckland, New Zealand