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Journal of Process Control

A journal of IFAC, the International Federation of Automatic Control

Journal of Process Control
ISSN: 0959-1524
Imprint: ELSEVIER

Statistics
Impact Factor: 1.606
Issues per year: 10

Editorial Board



Editor

W Marquardt
Lehrstuhl Prozesstechnik, RWTH Aachen University (Rheinisch-Westfälische Technische Hochschule), Templergraben 46, 52062 Aachen, Germany, Tel: 0049 241 806712, Fax: 0049241 8888326, Email: wolfgang.marquart@avt.rwth-aachen.de, Tel: 0049 241 806712, Email: wolfgang.marquart@avt.rwth-aachen.de

Regional Editor (Asia / Australasia)

H.-P. Huang
Dept. of Chemical Engineering, National Taiwan University, 1 4 Sec. 4 Roosevelt Rd., 106-17 Taipei, Taiwan, Email: huanghpc@ntu.edu.tw, Email: huanghpc@ntu.edu.tw

Regional Editor (Europe / Africa / Middle East)

D Dochain
CESAME, Batiment Euler, Université Catholique de Louvain (UCL), avenue Georges Lemaître 4, B-1348 Louvain-la-Neuve, Belgium, Tel: 010 47 23 78, Email: denis.dochain@uclouvain.be, Tel: 010 47 23 78, Email: denis.dochain@uclouvain.be

Regional Editor (The Americas)

N L Ricker
Dept. of Chemical Engineering, University of Washington, Box 351750, Seattle WA 98195-1750, USA, Tel: 206-543-8786, Fax: 206 543 3451, Email: ricker@u.washington.edu, Tel: 206-543-8786, Email: ricker@u.washington.edu

Reviews Editor

J Doyle
Dept. of Chemical Engineering, University of California, Mail Code 5080, Santa Barbara CA 93106, USA, Email: doyle@engineering.ucsb.edu, Email: doyle@engineering.ucsb.edu

Associate Editor

Y Arkun
Koç University, Istanbul, Turkey
J. Bao
University of New South Wales, Sydney, New South Wales, Australia
D Bonvin
Laboratoire d' Automatique, Lausanne, Switzerland
R Braatz
University of Illinois, Urbana, Illinois, United States
M-S Chiu
National University of Singapore (NUS), Singapore, Singapore
B.J Cott
Shell Global Solutions, Houston, Texas, United States
S Engell
Universität Dortmund, Dortmund, Germany
F. Forbes
University of Alberta, Edmonton, Alberta, Canada
B Foss
Norwegian University of Science & Technology (NTNU), Trondheim, Norway
F Gao
Hong Kong University of Science and Technology (HKUST), Hong Kong, China
S Hasebe
Kyoto University, Kyoto, Japan
M.A. Henson
University of Massachusetts at Amherst, Amherst, Massachusetts, United States
A Horch
ABB Corporate Research, Ladenburg, Germany
R King
Technische Universität Berlin (TUB), Berlin, Germany
J Lee
Georgia Institute of Technology, Atlanta, Georgia, United States
G. Pannocchia
Università di Pisa, Pisa, Italy
S. Qin
University of Southern California (USC), Los Angeles, California, United States
C Scali
Università di Pisa, Pisa, Italy
N. Thornhill
Imperial College London, London, United Kingdom
D Wilson
Auckland University of Technology, Auckland, New Zealand
 
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