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COLLOIDS AND SURFACES A: PHYSICOCHEMICAL AND ENGINEERING ASPECTS

An International Journal Devoted to the Principles and Applications of Colloid and Interface Science

Contact Addresses

con ad colsua

For all publication matters pertaining to this journal contact:
Rob van Daalen
Publishing Editor Physical & Theoretical Chemistry
Elsevier B.V.
Radarweg 29
1043 NX Amsterdam
The Netherlands
Fax: +31-20-485-2623
E-mail:g.daalen@elsevier.com
Colloids and Surfaces A: Physicochemical and Engineering Aspects
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