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| ADVANCES IN IMAGING AND ELECTRON PHYSICS, 153
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Aberration-corrected microscopy
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Peter Hawkes, CEMES/Laboratoire d'Optique Electronique du Centre National de la Recherche Scientifique, Toulouse, France
Included in series
Advances in Imaging and Electron Physics,
Audience
All users of electron microscopes as well as physicists, electrical engineers and applied mathematicians in all branches of image processing and microscopy as well as electron physics in general.
Contents
History of aberration correction in electron microscopy (H. Rose)
Present and future hexapole aberration correctors for high resolution
electron microscopy (M. Haider)
Aberration correction and STEM (O.L. Krivanek)
First results using the Nion third order STEM corrector
(P. Batson)
STEM and EELS: Mapping materials atom by atom (A.B. Bleloch)
Aberration correction with the SACTEM-Toulouse: from imaging
to diffraction (M. Hytch, F. Hue, E. Snoeck and F. Houdellier)
Novel aberration corrections concepts (B. Kabius)
Aberration corrected
imaging in CTEM and STEM (A. Kirkland, P.D. Nellist, Lan-Yun Chang and S.J. Haigh)
Materials applications of aberration-corrected STEM
(S.J. Pennycook, M. F. Chisholm, A. R. Lupini, M. Varela, K. van Benthem, A. Y. Borisevich, M. P. Oxley, W. Luo and S. T. Pantelides)
Spherical aberration corrected transmission electron microscopy for nanomaterials in Japan (N. Tanaka)
Aberration correction in practice
(K. Urban and J. Mayer)
Aberration-corrected electron microscopes at Brookhaven National Laboratory (Y. Zhu and J. Wall)
| Bibliographic details |
Hardbound, 590 pages, publication date: DEC-2008
ISBN-13: 978-0-12-374220-9
Imprint: ACADEMIC PRESS
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Price:
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GBP 129.99
EUR 153.95
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Last update: 15 Oct 2009
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