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| ADVANCES IN RESEARCH AND DEVELOPMENT: PLASMA SOURCES FOR THIN FILM DEPOSITION AND ETCHING, 18
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To order this title, and for more information, click here
Maurice Francombe, Georgia State University, Atlanta, U.S.A.
John Vossen, RCA Laboratories, Princeton, New Jersey
Description
This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma
sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in
thin film processing plasma.
Audience
Libraries, researchers in electrical engineering, condensed matter physics, and materials science departments. All academic and industrial thin film researchers.
Contents
M.A. Lieberman and R.A. Gottscho, Design of High- Density Plasma Sources for Materials Processing. O.A. Popov, Electron
Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films. S.L. Rohde, Unbalanced
Magnetron Sputtering. C. Steinbruchel, The Formation of Particles in Thin-Film Processing Plasmas. References. Author Index.
Subject Index.
| Bibliographic details |
Hardbound, 328 pages, publication date: AUG-1994
ISBN-13: 978-0-12-533018-3
ISBN-10: 0-12-533018-9
Imprint: ACADEMIC PRESS
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| Price and Ordering |
Price:
GBP 130.99
USD 216
EUR 153.95
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Books and book related electronic products are priced in US dollars (USD), euro (EUR), and Great Britain Pounds (GBP). USD prices apply to the Americas and Asia Pacific. EUR prices apply in Europe and the Middle East. GBP prices apply to the UK and all other countries.
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050/510
Last update: 3 Oct 2009
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