HANDBOOK OF CHEMICAL VAPOR DEPOSITION, 2ND EDITION
Principles, Technology and Applications To order this title, and for more information, click here Second Edition
By Hugh O. Pierson, Sandia National Laboratories (retired)
Description Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology
has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably.
The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The
second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors
in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance
of CVD in production of semiconductor and related applications.
Audience
Completely up-to-date look at the entire chemical vapor deposition process, for engineers and technologists in the semiconductor, optoelectronic,
optics, cutting tool, refractory fibers, filter and other industries.
Contents 1. Introduction and General Considerations
1.0 Introduction
2.0 Historical Perspective
3.0 The Applications Of CVD
4.0 Profile
of the CVD Business
5.0 Book Objectives
6.0 Background References
References
2. Fundamentals of Chemical Vapor Deposition
1.0
Introduction
2.0 Thermodynamics of CVD
3.0 Kinetics and Mass-Transport Mechanisms
4.0 Growth Mechanism and Structure of Deposit
References
3. The Chemistry of CVD
1.0 Categories of CVD Reactions
2.0 CVD Precursors
3.0 Halide Precursors
4.0 Metal-Carbonyl
Precursors
5.0 Hydride Precursors
References
4. Metallo-Organic CVD (MOCVD)
1.0 Introduction
2.0 MOCVD Process and Equipment
3.0 MOCVD Precursors: Alkyl, Alicyclic, and Aryl Compounds
4.0 Acetylacetonate Compounds
5.0 MOCVD Reactions for the Deposition
of Metals
6.0 MOCVD Reactions for the Deposition of Carbides and Nitrides
7.0 MOCVD Reactions for the Deposition of Oxides
8.0
MOCVD Reactions for fhe Deposition of III-V and II-VI Compounds
9.0 General Applications of MOCVD
References
5. CVD Processes and
Equipment
1.0 Introduction
2.0 Closed and Open Reactor
3.0 Reactant Supply
4.0 Thermal CVD: Deposition System and Reactor Design
5.0 Exhaust and By-Product Disposal
6.0 Laser and Photo CVD
7.0 Chemical Vapor Infiltration (CVI)
8.0 Fluidized-Bed CVD
9.0
Plasma CVD
References
6. The CVD of Metals
1.0 Introduction
2.0 Aluminum
3.0 Beryllium
4.0 Chromium
5.0 Copper
6.0 Gold
7.0 Molybdenum
8.0 Nickel
9.0 Niobium (Columbium)
10.0 Platinum and Platinum Group Metals
11.0 Rhenium
12.0 Tantalum
13.0
Titanium
14.0 Tungsten
15.0 Other Metals
16.0 Intermetallics
References
7. The CVD of the Allotropes of Carbon
1.0 The Allotropes
of Carbone
2.0 The CVD of Graphite
3.0 The CVD of Diamond
4.0 The CVD of Diamond-Like-Carbone (DLC)
References
8. The CVD of
Non-Metallic Elements
1.0 Introduction
2.0 The CVD of Boron
3.0 The CVD of Silicon
4.0 The CVD of Germanium
References
9. The
CVD of Ceramic Materials: Carbides
1.0 Introduction
2.0 The CVD of Boron Carbide
3.0 The CVD of Chromium Carbide
4.0 The CVD
of Hafnium Carbide
5.0 The CVD of Niobium Carbide
6.0 The CVD of Silicon Carbide
7.0 The CVD of Tantalum Carbide
8.0 The CVD
of Titanium Carbide
9.0 The CVD of Tungsten Carbide
10.0 The CVD of Zirconium Carbide
11.0 The CVD of Miscellaneous Carbides
References
10. The CVD of Ceramic Materials: Nitrides
1.0 General Characteristics of Nitrides
2.0 The CVD of Aluminum Nitride
3.0
The CVD Hexagonal Boron Nitride
4.0 The CVD of Cubic Boron Nitride
5.0 The CVD of Hafnium Nitride
6.0 The CVD of Niobium Nitride
7.0 The CVD of Silicon Nitride
8.0 The CVD of Titanium Nitride
9.0 The CVD of Titanium Carbonitride
10.0 The CVD of Other Nitrides
References
11. The CVD of Ceramic Materials: Oxides
1.0 Introduction
2.0 Aluminum Oxide
3.0 Chromium Oxide
4.0 Hafnium Oxide
5.0 Silicon Dioxide
6.0 Tantalum Oxide
7.0 Tin Oxide
8.0 Titanium Oxide
9.0 Zirconium Oxide
10.0 Other Oxides
11.0 Mixed
Oxides and Glasses
12.0 Oxide Superconductors
References
12. The CVD of Ceramic Materials: Borides, Silicides, III-V Compounds and
II-VI Compounds (Chalcogenides)
1.0 Borides
2.0 Silicides
3.0 III-V Compounds
4.0 II-VI Compounds (Chalcogenides)
References
13. CVD in Electronic Applications: Semiconductors
1.0 Introduction
2.0 Electronic Functions and Systems
3.0 CVD in Electronic
Technology
4.0 Silicon
5.0 Germanium
6.0 III-V and II-VI Compounds
7.0 Silicon Carbide
8.0 Diamond
9.0 Processing Equipment
For CVD Electronic Materials
References
14. CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers
1.0 Introduction
2.0 The CVD of Electrical Conductors
3.0 The CVD of Electrical Insulators (Dielectrics)
4.0 The CVD of Substrates (Heat Sinks)
5.0 The CVD of Diffusion Barriers
6.0 The CVD of Superconductors
References
15. CVD in Optoelectronic and Ferroelectric Applications
1.0 CVD in Optoelectronics
2.0 Optoelectronic Materials
3.0 Optoelectronic CVD Applications
4.0 CVD in Photovoltaic
5.0 CVD
in Ferroelectricity
References
16. CVD in Optical Applications
1.0 Introduction
2.0 Optical Characteristics
3.0 Optical Materials
Produced by CVD
4.0 Optical Applications of CVD
5.0 CVD in Optical-Fiber Processing
References
17. CVD in Wear- and Corrosion-Resistant
Applications
1.0 Introduction
2.0 Wear Mechanisms
3.0 CVD Materials for Wear- and Corrosion-Resistance
4.0 CVD in Corrosion-Resistant
Applications
5.0 Decorative Applications of CVD
6.0 Nuclear Applications of CVD
7.0 Biomedical Applications of CVD
References
18. CVD in Cutting-Tool Applications
1.0 Introduction
2.0 Cutting-Tool Requirements
3.0 Coating Processes and Substrate Interaction
4.0 Cutting-Tool Materials (Substrate)
5.0 Cutting-Tool Materials (Coatings)
References
19. CVD in Fiber, Powder, and Monolithic
Applications
1.0 Introduction
2.0 CVD in Fiber Applications
3.0 CVD in Powder Applications
4.0 CVD in Monolithic and Composite
Applications
References
Conversion Guide
Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification
Index
Bibliographic details
Hardbound, 506 pages, publication date: SEP-1999
ISBN-13: 978-0-8155-1432-9
ISBN-10: 0-8155-1432-8
Imprint: WILLIAM ANDREW
Price and Ordering
Price: GBP 114.99 USD 190 EUR 135.95
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