Editors

  • Volker Sick

    University of Michigan, Ann Arbor, Michigan, USA

  • Alison Tomlin

    University of Leeds, Leeds, UK

Editorial Board

  • María U. Alzueta

    University of Zaragoza, Zaragoza, Spain

  • Frank Behrendt

    Technical University of Berlin, Berlin, Germany

  • Jacqueline H. Chen

    Sandia National Laboratories, Livermore, California, USA

  • Mário Costa

    Instituto Superior Técnico, Universidade de Lisboa, Lisboa, Portugal

  • Henry Curran

    National University of Ireland, Galway, Ireland

  • Pascale Desgroux

    Université des Sciences et Technologies de Lille (Lille I), Villeneuve d'Ascq Cedex, France

  • Olaf Deutschmann

    Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany

  • Sergey Dorofeev

    FM Global, Norwood, Massachusetts, USA

  • Tiziano Faravelli

    Dipartimento di Chimica e Chimica Industriale

  • Carlos Fernandez-Pello

    University of California at Berkeley, Berkeley, California, USA

  • Jonathan H. Frank

    Sandia National Laboratories, Livermore, California, USA

  • Olivier Gicquel

    Ecole Centrale Paris, Châtenay Malabry, France

  • Nils Hansen

    Sandia National Laboratories, Livermore, California, USA

  • Daniel C. Haworth

    Pennsylvania State University, University Park, Pennsylvania, USA

  • Koichi Hayasi

  • Andrew Higgins

    McGill University, Montreal, Quebec, Canada

  • Satoru Ishizuka

    Hiroshima University, Higashi-Hiroshima, Japan

  • Jenny M. Jones

    University of Leeds, Leeds, England, UK

  • Yiguang Ju

    Princeton University, New Jersey, USA

  • Andreas Kempf

    University of Duisburg-Essen, Duisburg, Germany

  • Stephen J. Klippenstein

    Argonne National Laboratory, Argonne, Illinois, USA

  • Alexander A. Konnov

    Lund University, Lund, Sweden

  • Oleg Korobeinichev

    Institute of Chemical Kinetics and Combustion of SB RAS, Novosibirsk, Russian Federation

  • Mitsuo Koshi

    University of Tokyo, Chiba, Japan

  • Markus Kraft

    University of Cambridge, Cambridge, UK

  • Dimitrios Kyritsis

    Khalifa University, Abu Dhabi, United Arab Emirates

  • Howard Levinsky

    University of Groningen, Groningen, Netherlands

  • Tim Lieuwen

    Georgia Institute of Technology, Atlanta, Georgia, USA

  • Terese Løvås

    Norwegian University of Science&Technology NTNU, Trondheim, Norway

  • Atsushi Makino

    Aichi Institute of Technology, Toyota, Aichi, Japan

  • John Mantzaras

    Paul Scherrer Institut (PSI), Villigen PSI, Switzerland

  • Assaad R. Masri

    The University of Sydney, Sydney, New South Wales, Australia

  • Keith R. McManus

    General Electric Corporation, Niskayuna, New York, USA

  • Masato Mikami

    Yamaguchi University, Yamaguchi, Japan

  • Alejandro Molina

    National University of Colombia - Medellín campus, Medellín, Colombia

  • Joseph Oefelein

    Sandia National Laboratories, Livermore, California, USA

  • Matthias Olzmann

    Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany

  • Cecile Pera

    Infineum UK Ltd., Abingdon, Oxfordshire, UK

  • Fei Qi

    Shanghai Jiao Tong University, Shanghai, China

  • Guillermo Rein

    Imperial College London, London, UK

  • David Reuss

    University of Michigan, Ann Arbor, Michigan, USA

  • S. Mani Sarathy

    King Abdullah University of Science and Technology (KAUST), Thuwal, Saudi Arabia

  • Christof Schulz

    University of Duisburg-Essen, Duisburg, Germany

  • Kalyanasundaram Seshadri

    University of California at San Diego (UCSD), San Diego, La Jolla, California, USA

  • Jeffrey Sutton

    The Ohio State University, Columbus, Ohio, USA

  • Leonardo Tognotti

    University of Pisa, Pisa, Italy

  • Arnoud Trouvé

    University of Maryland, College Park, Maryland, USA

  • Tamás Turányi

    Eötvös Loránd University, Budapest -112, Hungary

  • Denis Veynante

    CNRS and CentraleSupélec, Châtenay-Malabry, France

  • Min Xu

    Shanghai Jiao Tong University, Shanghai, China