Microelectronic Engineering

Microelectronic Engineering - ISSN 0167-9317
Source Normalized Impact per Paper (SNIP): 0.915 Source Normalized Impact per Paper (SNIP):
SNIP measures contextual citation impact by weighting citations based on the total number of citations in a subject field.
SCImago Journal Rank (SJR): 0.553 SCImago Journal Rank (SJR):
SJR is a prestige metric based on the idea that not all citations are the same. SJR uses a similar algorithm as the Google page rank; it provides a quantitative and a qualitative measure of the journal’s impact.
Impact Factor: 2.305 (2019) Impact Factor:
The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years.
© 2017 Journal Citation Reports ® (Clarivate Analytics, 2017)
5 Year Impact Factor: 1.869 (2019) Five-Year Impact Factor:
To calculate the five year Impact Factor, citations are counted in 2016 to the previous five years and divided by the source items published in the previous five years.
© 2017 Journal Citation Reports ® (Clarivate Analytics, 2017)
Volumes: Volume 16
Issues: 16 issues
ISSN: 01679317
Editor-in-Chief: Gogolides

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Microelectronic Engineering is the premier nanoprocessing, and nanotechnology journal focusing on fabrication of electronic, photonic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, photonics, energy, life sciences, and environment. It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics / photonics and micro-/nano-/bio-systems. Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.

The journal addresses the following topics and considers mostly experimental work, or theoretical / simulation work directly linked and supporting experiments in the fields:

  • Microelectronics processing & materials (Lithography, Self-assembly, Plasma Processing, Metallization, 3D Integration, Related Materials?.)
  • Micro-/Nano-engineering / fabrication / technology / manufacturing
  • Nanoelectronic and photonic devices and their fabrication
  • Microsystems, microdevices (e.g., sensors and nanoenergy devices) and their fabrication
  • Microfluidics, life science devices /sensors, as well as integrated Lab-on-a-chip and their fabrication

In detail the topics covered are as follows:

1. Nanolithography and Nanopatterning:

  • Optical Lithography
  • Electron Optical Methods and Systems
  • X-ray Optical Methods and Systems
  • Resists
  • Limits of Nanolithography
  • Nanoimprint Lithography
  • EUV Lithography and Masks
  • Charged Particle Based Lithography and Patterning
  • Nanoimprint Lithography Techniques and Templates
  • Maskless Lithography
  • Emerging Nanopatterning Methods
  • Limits of Nanopatterning

2. Pattern Transfer

  • Ion Technology
  • Plasma Processing
  • Transfer of Pattern with Other Methods
  • Plasma Etching
  • Plasma Nanotechnology
  • Plasma / beam Nanopatterning
  • Plasma Surface Modification of Devices
  • Wet transfer methods

3. Materials

  • Metallization and Barrier Materials
  • Silicon on Insulators
  • Dielectrics (low K and high K)
  • Interconnects
  • New Resist Materials
  • Nanomaterials for Device Fabrication
  • Block Copolymers
  • Polymers and Flexible Substrates
  • Layered (2D) Materials and Related Transferring Techniques

4. Nanometrology, Inspection and Testing

  • Electron Beam Testers
  • Laser Probes
  • Signal and Image Processing
  • Nanometrology
  • AFM and Scanning Probe Measurements

5. Advanced Processing and Nanofabrication

  • Process Integration
  • Three Dimensional Integration
  • Other / Emerging Manufacturing and Fabrication Techniques
  • 3D Printing
  • Rapid Thermal Processing
  • Process Modelling and Simulation
  • Equipment Modelling
  • Laser Assisted Processing
  • Top-Down / Bottom-Up (Self-Assembly) Nanofabrication
  • Growth, Planarization, Cleaning Techniques for Devices
    • Plasma deposition
    • MBE
    • Other growth techniques
    • Planarization and cleaning techniques

6. Advanced Nanoelectronic, Photonic, Sensing, Energy Harvesting, and Fluidic Devices

  • Nanoelectronic, Optoelectronic and Photonic Devices
    • Memristive devices for neuromorphic computing
    • Steep slope or fast switching devices
    • Photonic devices
    • Optoelectronic devices
  • Dimension-sensitive Device Properties
  • Memory Devices
    • Magnetic and spintronic devices
  • Advanced MOS Devices
  • Vacuum Nanoelectronics
  • Flexible / Organic / Molecular Electronics
    • Organic and molecular electronics
    • Flexible electronics
    • Wearable electronics
    • Paper electronics
    • Printed electronics
  • Microdevices, Energy Harvesting Devices and Sensors
    • Physical sensors and actuators
    • Energy harvesting devices

7. Chemical, biological, bioelectronic and fluidic devices. Heterogeneous Micro-Nano and Bio Systems

  • Electro-Mechanical Systems (MEMS, NEMS)
  • Power MEMS
  • Magnetic MEMS
  • Optical and Photonic Systems

  • Micro and Nano Fluidic Devices
  • Pumping / valving devices
  • Mixing devices
  • Separation devices
  • Microreactors
  • Sample preparation devices
  • Fluidic interfaces and integration

  • Miniaturized Devices for Biology, Chemistry, Medicine
  • Biosensors
  • Chemical sensors
  • Biomimetic properties incorporated into devices
  • Bioelectronic devices
  • Micro / nano / bio interface and interconnection devices

  • Lab-on-a-chip, bioMEMS, microTAS
  • DNA / protein chips
  • Cell on chip
  • Organ on chip
  • Biomimetic properties incorporated into systems
  • Bioanalytic, diagnostic systems
  • Microseparation, pretreatment systems
  • On-chip detection systems
  • Environmental and food monitoring systems
  • Microreactors

Manuscripts of 5 (five) types are considered:

  • Review Articles that inform readers of the latest research and advances in nanoelectronics, nanofabrication, micro-nano systems, and applications (authors should e-mail editors with a review proposal and outline before submitting)
  • Accelerated Publications (Letters) that feature exciting research breakthroughs in the field
  • Regular original research papers
  • Short / Technical notes intended for original limited investigations or short description of original industrial or industrially-related research and development work
  • News and Opinions that comment on topical issues or express views on the developments in related fields, or comment on previously published work