Journal of Electron Spectroscopy and Related Phenomena

Journal of Electron Spectroscopy and Related Phenomena - ISSN 0368-2048
Source Normalized Impact per Paper (SNIP): 0.837 Source Normalized Impact per Paper (SNIP):
SNIP measures contextual citation impact by weighting citations based on the total number of citations in a subject field.
SCImago Journal Rank (SJR): 0.962 SCImago Journal Rank (SJR):
SJR is a prestige metric based on the idea that not all citations are the same. SJR uses a similar algorithm as the Google page rank; it provides a quantitative and a qualitative measure of the journal’s impact.
Impact Factor: 1.661 (2016) Impact Factor:
The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years.
© 2017 Journal Citation Reports ® (Clarivate Analytics, 2017)
5 Year Impact Factor: 1.71 (2016) Five-Year Impact Factor:
To calculate the five year Impact Factor, citations are counted in 2016 to the previous five years and divided by the source items published in the previous five years.
© 2017 Journal Citation Reports ® (Clarivate Analytics, 2017)
Volumes: Volumes 222-229
Issues: 8 issues
ISSN: 03682048

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Description

The Journal of Electron Spectroscopy and Related Phenomena publishes experimental, theoretical and applied work in the field of electron spectroscopy and electronic structure, involving techniques which use high energy photons (>10 eV) or electrons as probes or detected particles in the investigation.

The journal encourages contributions in the general area of atomic, molecular, ionic, liquid and solid state spectroscopy carried out using electron impact, synchrotron radiation (including free electron lasers) and short wavelength lasers. Papers using photoemission and other techniques, in which synchrotron radiation, Free Electron Lasers, laboratory lasers or other sources of ionizing radiation, combined with electron velocity analysis are especially welcome. The materials properties addressed include characterization of ground and excited state properties as well as time resolved electron dynamics.

The individual techniques of electron spectroscopy include photoelectron spectroscopy of both outer and inner shells; inverse photoemission; spin-polarised photoemission; time resolved 2-photon photoemission, resonant and non-resonant Auger spectroscopy including ion neutralization studies; edge techniques (EXAFS, NEXAFS,...) , resonant and non-resonant inelastic X-ray scattering (RIXS), spectro-microscopy, high resolution electron energy loss spectroscopy; electron scattering and resonance electron capture; electron spectroscopy in conjunction with microscopy; penning ionization spectroscopy including scanning tunneling spectroscopy; theoretical treatments of the photoemission, X-ray emission, Auger, energy loss and Penning ionization processes. Contributions on instrumentation and technique development, date acquisition - analysis - quantification are also welcome.

Subject areas covered include spectroscopic characterization of materials and processes concerning:

  • surfaces, interfaces, and thin films;
  • atomic and molecular physics, clusters;
  • semiconductor physics and chemistry;
  • materials for photovoltaics;
  • materials science including: metal surfaces, nanoparticles, ceramics, strongly correlated systems, polymers, biomaterials and other organic films;
  • catalysis