VLSI Electronics Microstructure Science

VLSI Electronics Microstructure Science

1st Edition - December 1, 1983

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  • Editor: Norman G. Einspruch
  • eBook ISBN: 9781483217741

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VLSI Electronics: Microstructure Science, Volume 7 presents a comprehensive exposition and assessment of the developments and trends in VLSI (Very Large Scale Integration) electronics. This treatise covers subjects that range from microscopic aspects of materials behavior and device performance to the comprehension of VLSI in systems applications. Each chapter is prepared by a recognized authority. The topics contained in this volume include a basic introduction to the application of superconductivity in high-speed digital systems; the expected impact of VLSI technology on the implementation of AI (artificial intelligence); the limits to improvement of silicon integrated circuits; and the various spontaneous noise sources in VLSI circuits and their effect on circuit operation. Scientists, engineers, researchers, device designers, and systems architects will find the book very useful.

Table of Contents

  • List of Contributors


    Chapter 1 Advanced Manufacturing Equipment for VLSI Lithography

    I. Introduction

    II. The Nature of the Lithographic Process

    III. Optical Lithography

    IV. Electron-Beam Microlithography

    V. X-Ray Lithography

    VI. Hybrid Lithography

    VII. Updated Position

    VIII. Other Considerations

    IX. Future Microlithographic Systems and Their Relation to the Factory of the Future

    X. Summary and Conclusion


    Chapter 2 Scaled MOS and Bipolar Technologies for VLSI

    I. Introduction

    II. Generic Processes for MOS and Bipolar VLSI

    III. MOS Scaling and Technology Implementation

    IV. Bipolar Scaling and Technology Implementation

    V. Conclusion


    Chapter 3 Laser Direct Writing for VLSI

    I. Introduction

    II. Instrumentation for Laser Direct Writing

    III. Laser Etching

    IV. Laser Deposition

    V. Laser Doping

    VI. Applications

    VII. Summary and Future Directions


    Chapter 4 Ultrathin-Gate Dielectric Processes for VLSI Applications

    I. Introduction

    II. Growth of Thin Oxides

    III. Characteristics and Characterization of Thin Oxides

    IV. Process-Related Issues

    V. Thin Oxides Related to Devices

    VI. Case for Alternative Dielectrics


    Chapter 5 Limits to Improvement of Silicon Integrated Circuits

    List of Symbols

    List of Acronyms

    I. Prefatory Remarks

    II. Introduction

    III. Physical Limits

    IV. Technological Limits

    V. Complexity Limits

    VI. Summary


    Chapter 6 Noise in VLSI

    I. Introduction

    II. Noise Sources in VLSI

    III. Noise Output of VLSI Building Blocks

    IV. Cross Talk

    V. α-Particle- and Cosmic-Ray-Induced Soft Errors in VLSI Circuits

    VI. Scaling


    Chapter 7 VLSI Computer Arithmetic for Real-Time Image Processing

    I. Introduction

    II. VLSI Arithmetic Modules

    III. Partitioned Matrix Algorithms

    IV. Pipelined Matrix Processors

    V. Real-Time Image Processing

    VI. Conclusions


    Chapter 8 Impact of VLSI on Artificial Intelligence

    I. Introduction

    II. Present-Day Capabilities

    III. Data- and Knowledge-Based Systems

    IV. Architectural Trends

    V. Likely Impact of VLSI on AI Systems

    VI. Summary and Assessment


    Chapter 9 Integrated Superconducting Electronics

    I. Introduction

    II. Origin of Technology

    III. Digital Devices

    IV. Structure and Fabrication

    V. Speed Considerations

    VI. Summary and Discussion



    Contents of Other Volumes

Product details

  • No. of pages: 414
  • Language: English
  • Copyright: © Academic Press 1983
  • Published: December 1, 1983
  • Imprint: Academic Press
  • eBook ISBN: 9781483217741

About the Editor

Norman G. Einspruch

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