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Vacuum Technology and Applications
1st Edition - October 18, 1991
Author: David J. Hucknall
Language: English
eBook ISBN:9781483103334
9 7 8 - 1 - 4 8 3 1 - 0 3 3 3 - 4
Vacuum Technology and Applications reviews the most commonly encountered methods for the production, containment, and measurement of subatmospheric pressure. This book also…Read more
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Vacuum Technology and Applications reviews the most commonly encountered methods for the production, containment, and measurement of subatmospheric pressure. This book also outlines a number of very important applications of this technology. This text is organized into eight chapters and begins with a brief survey of the fundamental principles of vacuum technology. The succeeding chapters deal with the pumps used for the production of rough-medium and high-ultra-high vacua. These chapters specifically cover their principles, performance, and applications. These topics are followed by a discussion of the devices for residual gas analysis and partial pressure measurement. Other chapters consider the aspects of leak detection using He-specific mass spectrometer and the materials, components, and fabrication of vacuum devices. The final chapters explore the application of vacuum technology in critical areas of industrial activity, such as thin-film technology, semiconductor, metallurgy, and chemical industry. This book will prove useful to practicing mechanical, chemical, and design engineers.
PrefaceAcknowledgments1 Introduction2 Vacuum Pumps (Rough-Medium Range)3 Vacuum Pumps (High-Ultra-High Range)4 Pressure Measurement5 Leak Detection6 Vacuum System Construction7 Applications8 Appendix: Units, Conversion Factors and Other DataIndex
No. of pages: 328
Language: English
Edition: 1
Published: October 18, 1991
Imprint: Butterworth-Heinemann
eBook ISBN: 9781483103334
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