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Thin Films from Free Atoms and Particles is an eight-chapter text that describes the primary reaction modes of atoms or coordination-deficient particles. This book presents first an introduction to free atoms and particles, followed by a chapter describing the embryonic growth of films, such as dimers, trimers, and other small telomers formed and detected. The next chapters discuss the understanding of discharge processes for forming free atoms and particles. The remaining chapters deal with the technology, techniques, and materials in thin films. Physicists, engineers, materials scientists, and chemists will find this book of great value.
1. Introduction to Free Atoms and Particles
I. Free Atoms
II. Free Particles
III. The Elements
IV. Molecular Solids
V. Experimental Methods
VI. Uses of Free Atoms and Particles in Chemical and Film-Formation Processes
2. Clustering of Free Atoms and Particles: Polymerization And The Beginning Of Film Growth
I. Historical Considerations
II. Microclusters—The Beginning of Film Growth by the Clustering of Free Atoms
III. Reactive Particles that Polymerize to Films
3. Analysis of Glow Discharges for Understanding the Process of Film Formation
II. Glow Discharges
III. Diagnostics: Theory and Experiment
IV. Review of Results
V. Concluding Remarks
4. Preparation, Structure, and Properties of Hard Coatings on the Basis of i-C and i-BN
II. Preparation—Mechanism and Techniques
III. Properties and Structure of i-C Films
IV. Properties and Structure of i-BN and Composite Films
V. Outlook on Applications
5. High-Vacuum Deposition Methods Involving Superthermal Free Particles
II. Ion-Surface Interactions
III. Experimental—Principle and Description
IV. Ion-Beam Sputtering Deposition
V. Ion-Beam Deposition—Ionized Cluster Beam Deposition
6. Formation of Thin Semiconducting Films by Magnetron Sputtering
II. The Magnetron Cathode
III. Effects Governing Deposition Rate of Elemental and Compound Semiconductors
IV. Deposition of Compound Semiconductors
V. Compound Semiconductors Deposited by Magnetron Sputtering
7. Silicon Carbide Films
II. Physical Properties
III. Film Formation by Chemical Vapor Deposition
IV. Film Formation by Physicaland Reactive Vapor Deposition
V. Liquid-Phase Growth of Thin Films
VI. Thin Films of Amorphous Sic 318
VII. Applications for Sic Films
8 Characterization of Thin Films by X-Ray Diffraction Armin Segmuller and Masanori Murakami
II. X-Ray Diffraction Instrumentation for Thin-Film Studies
III. Characterization of Thin Films by X-Ray Diffraction
- No. of pages:
- © Academic Press 1985
- 10th January 1986
- Academic Press
- eBook ISBN:
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