Thin Films From Free Atoms and Particles

Thin Films From Free Atoms and Particles

1st Edition - January 10, 1986

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  • Editor: Kenneth Klabunde
  • eBook ISBN: 9780323153485

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Thin Films from Free Atoms and Particles is an eight-chapter text that describes the primary reaction modes of atoms or coordination-deficient particles. This book presents first an introduction to free atoms and particles, followed by a chapter describing the embryonic growth of films, such as dimers, trimers, and other small telomers formed and detected. The next chapters discuss the understanding of discharge processes for forming free atoms and particles. The remaining chapters deal with the technology, techniques, and materials in thin films. Physicists, engineers, materials scientists, and chemists will find this book of great value.

Table of Contents

  • Contributors


    1. Introduction to Free Atoms and Particles

    I. Free Atoms

    II. Free Particles

    III. The Elements

    IV. Molecular Solids

    V. Experimental Methods

    VI. Uses of Free Atoms and Particles in Chemical and Film-Formation Processes


    2. Clustering of Free Atoms and Particles: Polymerization And The Beginning Of Film Growth

    I. Historical Considerations

    II. Microclusters—The Beginning of Film Growth by the Clustering of Free Atoms

    III. Reactive Particles that Polymerize to Films


    3. Analysis of Glow Discharges for Understanding the Process of Film Formation

    I. Introduction

    II. Glow Discharges

    III. Diagnostics: Theory and Experiment

    IV. Review of Results

    V. Concluding Remarks


    4. Preparation, Structure, and Properties of Hard Coatings on the Basis of i-C and i-BN

    I. Introduction

    II. Preparation—Mechanism and Techniques

    III. Properties and Structure of i-C Films

    IV. Properties and Structure of i-BN and Composite Films

    V. Outlook on Applications


    5. High-Vacuum Deposition Methods Involving Superthermal Free Particles

    I. Introduction

    II. Ion-Surface Interactions

    III. Experimental—Principle and Description

    IV. Ion-Beam Sputtering Deposition

    V. Ion-Beam Deposition—Ionized Cluster Beam Deposition

    VI. Conclusion


    6. Formation of Thin Semiconducting Films by Magnetron Sputtering

    I. Introduction

    II. The Magnetron Cathode

    III. Effects Governing Deposition Rate of Elemental and Compound Semiconductors

    IV. Deposition of Compound Semiconductors

    V. Compound Semiconductors Deposited by Magnetron Sputtering

    VI. Conclusion


    7. Silicon Carbide Films

    I. Introduction

    II. Physical Properties

    III. Film Formation by Chemical Vapor Deposition

    IV. Film Formation by Physicaland Reactive Vapor Deposition

    V. Liquid-Phase Growth of Thin Films

    VI. Thin Films of Amorphous Sic 318

    VII. Applications for Sic Films

    VIII. Summary


    8 Characterization of Thin Films by X-Ray Diffraction Armin Segmuller and Masanori Murakami

    I. Introduction

    II. X-Ray Diffraction Instrumentation for Thin-Film Studies

    III. Characterization of Thin Films by X-Ray Diffraction

    IV. Summary



Product details

  • No. of pages: 376
  • Language: English
  • Copyright: © Academic Press 1986
  • Published: January 10, 1986
  • Imprint: Academic Press
  • eBook ISBN: 9780323153485

About the Editor

Kenneth Klabunde

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