Thin Films by Chemical Vapour Deposition, Volume 7

1st Edition

Authors: C.E. Morosanu
Editors: G. Siddall
Hardcover ISBN: 9780444988010
eBook ISBN: 9781483291734
Imprint: Elsevier Science
Published Date: 26th July 1990
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Table of Contents



Part I Introduction

1 Evolution of CVD Films

1.1 Introductory Remarks

1.2 Short History of CVD Thin Films

Part II Fundamentals

2 Techniques of Preparing Thin Films

2.1 Introduction

2.2 Electrolytic Deposition Techniques

2.3 Vacuum Deposition Techniques

2.4 Plasma Deposition Techniques

2.5 Liquid-Phase Deposition Techniques

2.6 Solid-Phase Deposition Techniques

2.7 Chemical Vapour Conversion of Substrate

2.8 Chemical Vapour Deposition

2.9 Comparison between CVD and Other Thin Film Deposition Techniques

3 Chemical Processes Used in CVD

3.1 Introduction

3.2 Description of Chemical Reactions Used in CVD

4 Thermodynamics of CVD

4.1 General Remarks

4.2 Feasibility of a CVD Process

4.3 Techniques for Equilibrium Calculations in CVD Systems

4.4 Examples of Thermodynamic Studies of CVD Systems

5 Kinetics of CVD

5.1 Introduction

5.2 Steps and Control Type of a CVD Heterogeneous Reaction

5.3 Influence of Experimental Parameters on Thin Film Deposition Rate

5.4 Continuous Measurement of the Deposition Rate

5.5 Experimental Methods for Studying CVD Kinetics

5.6 Role of Homogeneous Reactions in CVD

5.7 Mechanism of CVD Processes

5.8 Kinetics and Mechanism of Dopant Incorporation

5.9 Transport Phenomena in CVD

5.10 Status of Kinetic and Mechanism Investigations in CVD Systems

6 Measurement of Thin Film Thickness

6.1 Intro


The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology.

In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously.

Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechan


© Elsevier Science 1990
Elsevier Science
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About the Authors

C.E. Morosanu Author

Affiliations and Expertise

Electronic Components Research and Development Centre, Bucharest, Romania

About the Editors

G. Siddall Editor