Description

An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.

Readership

Scientists, engineers, graduate students in the fields of semiconductors, thin films, energy, environment, automotive, medical and food packaging.

Table of Contents

Thin Film Materials and Devices Thin Film Process Thin Film Growth Process Thin Film Deposition Process Characterization Sputtering Phenomena Sputtering Yield Sputtering Atoms Mechanisms of Sputtering Sputtering Systems Discharge in a Gas Sputtering System Practical Aspects of Sputtering System Deposition of Compound Thin Films Oxides Nitrides Carbides and Silicides Diamond Selenides Amorphous Thin Films Super-Lattice Structures Organic Thin Films Magnetron Sputtering Under a Strong Magentic Field Structural Control of Compound Thin Films Ferroelectric Materials and Structures Control of Structure Nanometer Structures Interfacial Control Microfabrication by Sputtering Classification by Sputtering Etching Ion Beam Sputter Etching Diode Sputter Etching Deposition into Deep Trench Structure Appendices Electric Units, Their Symbols and Conversion Factors Fundamental Physical Constants Index

Details

No. of pages:
532
Language:
English
Copyright:
© 2004
Published:
Imprint:
William Andrew
Electronic ISBN:
9780815519317
Print ISBN:
9780815514831

About the authors