Thin Film Materials for Large Area Electronics - 1st Edition - ISBN: 9780080436074, 9780080913049

Thin Film Materials for Large Area Electronics, Volume 80

1st Edition

Authors: B. Equer B. Drevillon I. French T. Kallfass
Hardcover ISBN: 9780080436074
eBook ISBN: 9780080913049
Imprint: Elsevier Science
Published Date: 17th March 1999
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Institutional Access


Table of Contents

Selected papers: Preface. Growth mechanism of microcrystalline silicon obtained from reactive plasmas (A. Matsuda). Properties of polycrystalline silicon films prepared from fluorinated precursors (S. Ray et al.). Microcrystalline silicon growth on a-Si:H: effects of hydrogen (P. Roca i Cabarrocas, S. Hamma). Carrier transport, structure and orientation in polycrystalline silicon on glass (K. Nakahata et al.). Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO2 and glass (J. Olivares et al.). Stability of the dielectric properties of PECVD deposited carbon-doped SiOF films (J. Lubguban et al.). High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source (N.A. Morrison et al.). Shape of grain size distributions during crystal grain nucleation in a-Si (C. Spinella et al.). Advanced excimer-laser annealing process for quasi single-crystal silicon thin-film devices (M. Matsumura, C-H. Oh). Lateral growth control in excimer laser crystallized polysilicon (L. Mariucci et al.). Sensor properties of Pt doped SnO2 thin films for detecting CO (A.V. Tadeev et al.). Self-assembly of ultrathin composite TiO2/polymer films (N. Kovtyukhova et al.). Laser crystallised poly-Si TFTs for AMLCDs (S.D. Brotherton et al.). Temperature analysis of polysilicon thin-film transistors made by excimer laser crystallization (V. Foglietti et al.). Ion implantation of microcrystalline silicon for low process temperature top gate thin film transistors (V. Chu et al.). Large area X-ray detectors based on amorphous silicon technology (J-P. Moy). Al-based sputter-deposited films for large liquid-crystal-display (H. Takatsuji et al.). Influence of surface morphology of the polycrystalline silicon on field electron emission (A.A. Evtukh).


Description

Selected papers: Preface. Growth mechanism of microcrystalline silicon obtained from reactive plasmas (A. Matsuda). Properties of polycrystalline silicon films prepared from fluorinated precursors (S. Ray et al.). Microcrystalline silicon growth on a-Si:H: effects of hydrogen (P. Roca i Cabarrocas, S. Hamma). Carrier transport, structure and orientation in polycrystalline silicon on glass (K. Nakahata et al.). Solid-phase crystallization of amorphous SiGe films deposited by LPCVD on SiO2 and glass (J. Olivares et al.). Stability of the dielectric properties of PECVD deposited carbon-doped SiOF films (J. Lubguban et al.). High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source (N.A. Morrison et al.). Shape of grain size distributions during crystal grain nucleation in a-Si (C. Spinella et al.). Advanced excimer-laser annealing process for quasi single-crystal silicon thin-film devices (M. Matsumura, C-H. Oh). Lateral growth control in excimer laser crystallized polysilicon (L. Mariucci et al.). Sensor properties of Pt doped SnO2 thin films for detecting CO (A.V. Tadeev et al.). Self-assembly of ultrathin composite TiO2/polymer films (N. Kovtyukhova et al.). Laser crystallised poly-Si TFTs for AMLCDs (S.D. Brotherton et al.). Temperature analysis of polysilicon thin-film transistors made by excimer laser crystallization (V. Foglietti et al.). Ion implantation of microcrystalline silicon for low process temperature top gate thin film transistors (V. Chu et al.). Large area X-ray detectors based on amorphous silicon technology (J-P. Moy). Al-based sputter-deposited films for large liquid-crystal-display (H. Takatsuji et al.). Influence of surface morphology of the polycrystalline silicon on field electron emission (A.A. Evtukh).

Readership

For physicists, materials scientists and electronic engineers working on the science, technology and application of thin films for large area electronics.


Details

Language:
English
Copyright:
© Elsevier Science 1999
Published:
Imprint:
Elsevier Science
Hardcover ISBN:
9780080436074
eBook ISBN:
9780080913049

About the Authors

B. Equer Author

B. Drevillon Author

Affiliations and Expertise

Ecole Polytechnique, Laboratoire PICM, Palaiseau, France

I. French Author

Affiliations and Expertise

Philips Research Laboratory, Redhill, UK

T. Kallfass Author

Affiliations and Expertise

Institut für Netzwerk und Systemtheorie, University of Stuttgart, Germany