Silicon Integrated Circuits - 1st Edition - ISBN: 9780120029600, 9781483214788

Silicon Integrated Circuits

1st Edition

Advances in Materials and Device Research

Editors: Dawon Kahng
eBook ISBN: 9781483214788
Imprint: Academic Press
Published Date: 24th July 1985
Page Count: 370
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Silicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first chapter is about the transient thermal processing of silicon, including annealing with directed-energy beams and rapid isothermal annealing; adiabatic annealing with laser and electron beams; pulsed melting; thermal flux annealing; rapid isothermal annealing; and several applications stemming from rapid annealing and semiconductor processing with directed-energy beams. The second chapter is concerned with the use of electron cyclotron resonance plasmas in two important materials processing techniques: reactive ion-beam etching and plasma deposition. The last chapter of the book deals with the exploding area of very large scale integration processing and process simulation. Physicists, chemists, and engineers involved in silicon integrated circuits will find the book invaluable.

Table of Contents

List of Contributors Preface Transient Thermal Processing of Silicon I. Introduction II. Adiabatic Annealing III. Thermal Flux Annealing IV. Isothermal Rapid Annealing V. Related Rapid Thermal Processes VI. Summary References Reactive Ion-Beam Etching and Plasma Deposition Techniques Using Electron Cyclotron Resonance Plasmas I. Introduction II. Reactive Ion-Beam Etching III. Plasma Deposition References Physics of VLSI Processing and Process Simulation I. Introduction II. Physics of Processing and Process Simulation III. Conclusions and the Future References Author Index Subject Index


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© Academic Press 1985
Academic Press
eBook ISBN:

About the Editor

Dawon Kahng

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