Silicon Epitaxy - 1st Edition - ISBN: 9780127521817, 9780080541006

Silicon Epitaxy, Volume 72

1st Edition

Serial Volume Editors: Danilo Crippa Daniel Rode
Serial Editors: J. Rossi R. K. Willardson Eicke Weber
eBook ISBN: 9780080541006
Imprint: Academic Press
Published Date: 19th September 2001
Page Count: 491
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Mobi:
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Table of Contents

1: CVD Technologies for Silicon: A Quick Survey 2: Epitaxial Growth Theory: Vapor-Phase Chemistry and Doping 3: Epitaxial Growth Facilities, Equipment, and Supplies 4: Epitaxial Growth Techniques 5: Epitaxial Growth Techniques: Molecular Beam Epitaxy 6: Epitaxial Growth Modeling 7: Epitaxial Layer Characterization and Metrology 8: Epitaxy for Discretes and Power Devices 9: Epitaxy on Patterned Wafers 10: Si-Based Alloys: SiGe and SiGe:C 11: Silicon Epitaxy: New Applications


Description

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

Readership

Researchers, graduate students, and practitioners working in the semiconductor field both at universities and in industry.


Details

No. of pages:
491
Language:
English
Copyright:
© Academic Press 2001
Published:
Imprint:
Academic Press
eBook ISBN:
9780080541006

About the Serial Volume Editors

Danilo Crippa Serial Volume Editor

Affiliations and Expertise

LPE Epitaxial Technology, Italy

Daniel Rode Serial Volume Editor

Affiliations and Expertise

Washington University, St. Louis, Missouri, U.S.A.

About the Serial Editors

J. Rossi Serial Editor

R. K. Willardson Serial Editor

Affiliations and Expertise

WILLARDSON CONSULTING SPOKANE, WASHINGTON

Eicke Weber Serial Editor

Affiliations and Expertise

Fraunhofer-Institut für Solare Energiesysteme ISE, Freiburg, Germany