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SiGe Based Technologies

  • 1st Edition, Volume 31 - February 18, 1993
  • Editors: Y. Shiraki, T.P. Pearsall, Erwin Kasper
  • Language: English
  • eBook ISBN:
    9 7 8 - 0 - 4 4 4 - 5 9 6 8 9 - 5

The preparation of silicon germanium microstructures, their physical, chemical and electrical characterization, and their device processing and application are reviewed in this… Read more

SiGe Based Technologies

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The preparation of silicon germanium microstructures, their physical, chemical and electrical characterization, and their device processing and application are reviewed in this book. Special emphasis is given to ultrathin Si/Ge superlattices. Topics covered include: Wafer preparation and epitaxial growth; surface effects driven phenomena, such as clustering, segregation, 'surfactants'; Analysis, both in situ and ex situ; Strain adjustment methods; High quality buffers; Modification of material properties by quantum wells and superlattices; Devices: Novel concepts, processing, modelling, demonstrators. The questions highlighted, particularly those articles comparing related or competing activities, will provide a wealth of knowledge for all those interested in the future avenues of theory and applications in this field.