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Semiconductor Silicon Crystal Technology
1st Edition - December 28, 1988
Editor: Fumio Shimura
Language: English
eBook ISBN:9780323150484
9 7 8 - 0 - 3 2 3 - 1 5 0 4 8 - 4
Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology…Read more
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Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.
Preface
1. Introduction
2. Atomic Structure and Chemical Bonds
2.1 Atomic Structure
2.2 Chemical Bond
References
3. Basic Crystallography
3.1 Solid-State Structure
3.2 X-Ray and Electron Diffraction
3.3 Properties of Silicon Crystal
3.4 Crystal Defects
References
4. Basic Semiconductor Physics
4.1 Semiconductors
4.2 Electrical Conductivity
4.3 Electronic Device Physics
4.4 Transistors
References
5. Silicon Crystal Growth and Wafer Preparation
5.1 Starting Materials
5.2 Single Crystal Growth
5.3 Impurities
5.4 New Crystal Growth Methods
5.5 Wafer Shaping Process and Wafer Properties
5.6 Silicon Epitaxy
References
6. Crystal Characterization
6.1 Electrical Characterization
6.2 Chemical Characterization
6.3 Physical Characterization
References
7. Grown-In and Process-Induced Defects
7.1 Grown-In Defects
7.2 Process-Induced Defects
7.3 Effects of Defects on Electrical Properties
7.4 Gettering
References
8. Silicon Wafer Criteria for VLSI/ULSI Technology
8.1 High-Technology Silicon Wafer Concept
8.2 VLSI/ULSI Wafer Characteristics
8.3 Concluding Remarks
References
Appendixes
Index
No. of pages: 434
Language: English
Edition: 1
Published: December 28, 1988
Imprint: Academic Press
eBook ISBN: 9780323150484
FS
Fumio Shimura
Affiliations and expertise
Shizuoka Institute of Science and Technology
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