Semiconductor Silicon Crystal Technology

Semiconductor Silicon Crystal Technology

1st Edition - December 28, 1988

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  • Editor: Fumio Shimura
  • eBook ISBN: 9780323150484

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Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.

Table of Contents

  • Preface

    1. Introduction

    2. Atomic Structure and Chemical Bonds

    2.1 Atomic Structure

    2.2 Chemical Bond


    3. Basic Crystallography

    3.1 Solid-State Structure

    3.2 X-Ray and Electron Diffraction

    3.3 Properties of Silicon Crystal

    3.4 Crystal Defects


    4. Basic Semiconductor Physics

    4.1 Semiconductors

    4.2 Electrical Conductivity

    4.3 Electronic Device Physics

    4.4 Transistors


    5. Silicon Crystal Growth and Wafer Preparation

    5.1 Starting Materials

    5.2 Single Crystal Growth

    5.3 Impurities

    5.4 New Crystal Growth Methods

    5.5 Wafer Shaping Process and Wafer Properties

    5.6 Silicon Epitaxy


    6. Crystal Characterization

    6.1 Electrical Characterization

    6.2 Chemical Characterization

    6.3 Physical Characterization


    7. Grown-In and Process-Induced Defects

    7.1 Grown-In Defects

    7.2 Process-Induced Defects

    7.3 Effects of Defects on Electrical Properties

    7.4 Gettering


    8. Silicon Wafer Criteria for VLSI/ULSI Technology

    8.1 High-Technology Silicon Wafer Concept

    8.2 VLSI/ULSI Wafer Characteristics

    8.3 Concluding Remarks




Product details

  • No. of pages: 434
  • Language: English
  • Copyright: © Academic Press 1988
  • Published: December 28, 1988
  • Imprint: Academic Press
  • eBook ISBN: 9780323150484

About the Editor

Fumio Shimura

Affiliations and Expertise

Shizuoka Institute of Science and Technology

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