Physics of Thin Films

Physics of Thin Films

Advances in Research and Development

1st Edition - December 28, 1982

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  • Editors: Georg Hass, Maurice H. Francombe, John L. Vossen
  • eBook ISBN: 9781483144993

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Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This book is comprised of four chapters and begins with a discussion on metal coatings and protective layers for front surface mirrors used at various angles of incidence from the ultraviolet to the far infrared. Thin-film materials and deposition conditions suitable for minimizing reflectance changes with angle of incidence are described, along with novel oxide protective coatings with enhanced chemical stability and mechanical durability. The next chapter offers a comprehensive treatment of photoemissive materials. After giving a rather detailed review of the physics of photoemission, the main classes of thin-film photoemitters, including Ag-O-Cs, alkali antimonides, and negative-electron affinity photocathodes, are considered. A description of field-assisted cathodes potentially suitable for wavelengths beyond 1.1 micrometers, such as transferred-electron structures and field-emission arrays, is also given. The reader is then introduced to spray pyrolysis and the solution growth technique for chemical solution deposition of inorganic films. This text concludes with a chapter on plasma-enhanced chemical vapor deposition of thin films, paying particular attention to the experimental conditions required for a range of element and compound materials as well as some of the unusual film properties and structures achieved by this approach. This monograph will be useful to students and practitioners of physics, especially those interested in thin films.

Table of Contents

  • Contributors to Volume 12


    Articles Planned for Future Volumes

    Contents of Previous Volumes

    Reflectance and Preparation of Front Surface Mirrors for Use at Various Angles of Incidence from the Ultraviolet to the Far Infrared

    I. Introduction

    II. Reflectance Measurements and Preparation of Mirror Coatings

    III. Reflectance of Metallic Front Surface Mirrors without Over-coating

    IV. Mirror Coatings with Protective Layers and Reflectance-Enhancing Surface Films

    V. Metal-Dielectric Mirrors for Use as Reflection-Type Filters

    VI. Water Absorption in Evaporated Dielectric Films


    Photoemissive Materials

    I. Introduction

    II. The Mechanism of Photoemission

    III. The Ag-O-Cs (S-1) Photocathode

    IV. The Alkali Antimonides

    V Negative Electron Affinity Materials

    VI. Applications of Photoemissive Materials

    VII. Conclusions


    Chemical Solution Deposition of Inorganic Films

    I. Introduction

    II. Spray Pyrolytic Process

    III. Characteristic Features of the Spray Pyrolytic Process

    IV. Multicomponent Doping and Alloying Effects

    V. Structural Properties

    VI. Electrical and Optical Properties

    VII. Solution Growth Process

    VIII. Impurity and Dopant Effects

    IX. Multicomponent Films

    X. Oxide Films

    XI. Structure

    XII. Transport Properties

    XIII. Some Large-Area Application

    XIV. Concluding Remarks


    Plasma-Enhanced Chemical Vapor Deposition of Thin Films

    I. Introduction

    II. Deposition Techniques and Systems

    III. Preparation and Properties of Films

    IV. Plasma Oxidation

    V. Plasma Carburizing

    VI. Glow-Discharge Nitriding

    VII. Conclusions


    Author Index

    Subject Index

Product details

  • No. of pages: 340
  • Language: English
  • Copyright: © Academic Press 1982
  • Published: December 28, 1982
  • Imprint: Academic Press
  • eBook ISBN: 9781483144993

About the Editors

Georg Hass

Maurice H. Francombe

John L. Vossen

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