Physics of Thin Films

Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This book is comprised of four chapters and begins with a discussion on metal coatings and protective layers for front surface mirrors used at various angles of incidence from the ultraviolet to the far infrared. Thin-film materials and deposition conditions suitable for minimizing reflectance changes with angle of incidence are described, along with novel oxide protective coatings with enhanced chemical stability and mechanical durability. The next chapter offers a comprehensive treatment of photoemissive materials. After giving a rather detailed review of the physics of photoemission, the main classes of thin-film photoemitters, including Ag-O-Cs, alkali antimonides, and negative-electron affinity photocathodes, are considered. A description of field-assisted cathodes potentially suitable for wavelengths beyond 1.1 micrometers, such as transferred-electron structures and field-emission arrays, is also given. The reader is then introduced to spray pyrolysis and the solution growth technique for chemical solution deposition of inorganic films. This text concludes with a chapter on plasma-enhanced chemical vapor deposition of thin films, paying particular attention to the experimental conditions required for a range of element and compound materials as well as some of the unusual film properties and structures achieved by this approach. This monograph will be useful to students and practitioners of physics, especially those interested in thin films.

Contributors to Volume 12 Preface Articles Planned for Future Volumes Contents of Previous Volumes Reflectance and Preparation of Front Surface Mirrors for Use at Various Angles of Incidence from the Ultraviolet to the Far Infrared I. Introduction II. Reflectance Measurements and Preparation of Mirror Coatings III. Reflectance of Metallic Front Surface Mirrors without Over-coating IV. Mirror Coatings with Protective Layers and Reflectance-Enhancing Surface Films V. Metal-Dielectric Mirrors for Use as Reflection-Type Filters VI. Water Absorption in Evaporated Dielectric Films References Photoemissive Materials I. Introduction II. The Mechanism of Photoemission III. The Ag-O-Cs (S-1) Photocathode IV. The Alkali Antimonides V Negative Electron Affinity Materials VI. Applications of Photoemissive Materials VII. Conclusions References Chemical Solution Deposition of Inorganic Films I. Introduction II. Spray Pyrolytic Process III. Characteristic Features of the Spray Pyrolytic Process IV. Multicomponent Doping and Alloying Effects V. Structural Properties VI. Electrical and Optical Properties VII. Solution Growth Process VIII. Impurity and Dopant Effects IX. Multicomponent Films X. Oxide Films XI. Structure XII. Transport Properties XIII. Some Large-Area Application XIV. Concluding Remarks References Plasma-Enhanced Chemical Vapor Deposition of Thin Films I. Introduction II. Deposition Techniques and Systems III. Preparation and Properties of Films IV. Plasma Oxidation V. Plasma Carburizing VI. Glow-Discharge Nitriding VII. Conclusions References Author Index Subject Index