Part I - Additions and Updates to Volumes 1 & 2. Silica, silicon nitride and oxynitride thin films - an overview of fabrication techniques, properties and applications (B. Balland, A. Glachant). A review of buried oxide structures and soi technologies (J.L. Leray). Dielectric breakdown in silica - a survey of test methods (D.R. Wolters, J.F. Verwey, T.A. Zegers-Van Duijnhoven). Hot carrier injections in silica and related instabilities in submicrometer mosfets (D. Vuillaume). Multilayer dielectrics for memory applications ((P. Gentil). Charge pumping techniques - their use for diagnosis and interface state studies in MOS transistors ((J.L. Autran, B. Balland, G. Barbottin). The study of thermal nitridation and reoxidation mechanisms using isotopic tracing methods (J.J. Ganem, I.J. Baumvol). Part II - Silicon Devices in Radiation Environments. The space radiation environment (D. Bräunig). An overview of radiation-matter interactions (W.R. Fahrner). Radiation effects in electronic components (D. Bräunig, F. Wulf). Defects and radiation - induced charge trapping phenomena in silica (P. Pailet, J.L. Leray). The effects of cosmic ions on electronic components (O. Musseau). Author index. Subject index.