Materials and Process Characterization - 1st Edition - ISBN: 9780122341069, 9781483217734

Materials and Process Characterization, Volume 6

1st Edition

Editors: Norman G. Einspruch Graydon B. Larrabee
eBook ISBN: 9781483217734
Imprint: Academic Press
Published Date: 28th June 1983
Page Count: 614
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Table of Contents


List of Contributors


Preface


Chapter 1 Characterization of Silicon Materials for VLSI


I. Introduction


II. Characterization Techniques


III. Polycrystalline Silicon


IV. Single-Crystal Silicon


V. Slice Preparation


VI. Summary


Appendix. Properties of 54 Elements in Single-Crystal Silicon


References


Chapter 2 Characterization of Silicon Epitaxial Films


I. Introduction


II. Epitaxial-Growth Process


III. Electrical Characterization


IV. Physical and Optical Characterization


V. Epitaxial-Defect Characterization


VI. Epitaxial-Defect Measurements


VII. Summary


References


Chapter 3 Characterization of Dielectric Films


I. Introduction and Background


II. Basic Structure and Properties of Gate Dielectrics


III. The Classification of Dielectric Charges


IV. The Spatial Location of Oxide Charge


V. The Amount and Energy Location of Interface Traps


VI. Temperature Effects on Mobile Ionic Charge


VII. Injected Charge Trapping in Oxide Films


VIII. The Role of Dielectric Layer Characterization in VLSI


References


Chapter 4 The Status of Dry-Developed Resists for Each Lithographic Technology


I. Introduction


II. The Total Dry Process


III. Ablative Resists


IV. Photoresist Analogs


V. X-Ray Resist Analogs


VI. Electron Resist Analogs


VII. Ion-Beam Resist Analogs


VIII. Conclusions


References


Chapter 5 Microlithography in Semiconductor Device Processing


I. Introduction


II. Pattern Generation


III. Photomask Fabrication


IV.


Description

VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics.

This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered.

This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.


Details

No. of pages:
614
Language:
English
Copyright:
© Academic Press 1983
Published:
Imprint:
Academic Press
eBook ISBN:
9781483217734

Ratings and Reviews


About the Editors

Norman G. Einspruch Editor

Graydon B. Larrabee Editor