Lithography for VLSI - 1st Edition - ISBN: 9780122341168, 9781483217826

Lithography for VLSI, Volume 16

1st Edition

VLSI Electronics Microstructure Science

Editors: Norman G. Einspruch R. K. Watts
eBook ISBN: 9781483217826
Imprint: Academic Press
Published Date: 2nd September 1987
Page Count: 374
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Table of Contents


List of Contributors


Preface


Chapter 1 Optical Lithography


I. Introduction


II. Optical Resists


III. Contact and Proximity Printing


IV. Projection Printing


References


Chapter 2 Lumped Parameter Model for Optical Lithography


I. Introduction


II. Background


III. Lumped Parameter Model


IV. Comparison with Experimental Data


V. Summary


Appendix A: Image Intensity Distribution


Appendix B: Theory and Mathematics of the Lumped Parameter Model


References


Chapter 3 The Evolution of Electron-Beam Pattern Generators for Integrated Circuit Masks at AT&T Bell Laboratories


I. Introduction


II. Integrated Circuit Masks


III. A New System: EBES4


IV. Overall System Description


V. Conclusions


References


Chapter 4 Electron Resist Process Modeling


I. Introduction


II. Electron-Beam Exposure Modeling


III. Electron Resist Development Modeling


IV. Electron Resist Profile Modeling


V. Conclusions


References


Chapter 5 Ion-Beam Lithography


I. Introduction


II. Processing with Ion Beams


III. Ion-Substrate Interactions


IV. Ion-Beam Lithography Systems and Instrumentation


V. Problems and Limitations in Ion-Beam Lithography


VI. Conclusions


References


Chapter 6 Alignment Techniques in Optical and X-Ray Lithography


I. Introduction


II. Review of Optical Principles


III. Methods of Alignment


IV. Measurement of Aligned Wafers


V. Summary


References


Chapter 7 Metrology in Microlithography


I. Introduc


Description

VLSI Electronics Microstructure Science, Volume 16: Lithography for VLSI treats special topics from each branch of lithography, and also contains general discussion of some lithographic methods.

This volume contains 8 chapters that discuss the various aspects of lithography. Chapters 1 and 2 are devoted to optical lithography. Chapter 3 covers electron lithography in general, and Chapter 4 discusses electron resist exposure modeling. Chapter 5 presents the fundamentals of ion-beam lithography. Mask/wafer alignment for x-ray proximity printing and for optical lithography is tackled in Chapter 6. Chapters 7 and 8 on metrology deal with the characterization of lithography by measurements of various types.

Engineers, scientists, and technical managers in the semiconductor industry, and engineering and applied physics faculty and graduate students will find the text very useful.


Details

No. of pages:
374
Language:
English
Copyright:
© Academic Press 1987
Published:
Imprint:
Academic Press
eBook ISBN:
9781483217826

Ratings and Reviews


About the Editors

Norman G. Einspruch Editor

R. K. Watts Editor