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List of Contributors
Chapter 1 Optical Lithography
II. Optical Resists
III. Contact and Proximity Printing
IV. Projection Printing
Chapter 2 Lumped Parameter Model for Optical Lithography
III. Lumped Parameter Model
IV. Comparison with Experimental Data
Appendix A: Image Intensity Distribution
Appendix B: Theory and Mathematics of the Lumped Parameter Model
Chapter 3 The Evolution of Electron-Beam Pattern Generators for Integrated Circuit Masks at AT&T Bell Laboratories
II. Integrated Circuit Masks
III. A New System: EBES4
IV. Overall System Description
Chapter 4 Electron Resist Process Modeling
II. Electron-Beam Exposure Modeling
III. Electron Resist Development Modeling
IV. Electron Resist Profile Modeling
Chapter 5 Ion-Beam Lithography
II. Processing with Ion Beams
III. Ion-Substrate Interactions
IV. Ion-Beam Lithography Systems and Instrumentation
V. Problems and Limitations in Ion-Beam Lithography
Chapter 6 Alignment Techniques in Optical and X-Ray Lithography
II. Review of Optical Principles
III. Methods of Alignment
IV. Measurement of Aligned Wafers
Chapter 7 Metrology in Microlithography
II. Accuracy and Precision
III. Imaging in the Optical Microscope
IV. Imaging in the Scanning Electron Microscope
V. Dimensional Metrology
Chapter 8 Electrical Measurements for Characterizing Lithography
II. Lithographic Systems
III. Electrical Measurement
IV. Imagery Characterization
V. Overlay Characterization
VLSI Electronics Microstructure Science, Volume 16: Lithography for VLSI treats special topics from each branch of lithography, and also contains general discussion of some lithographic methods.
This volume contains 8 chapters that discuss the various aspects of lithography. Chapters 1 and 2 are devoted to optical lithography. Chapter 3 covers electron lithography in general, and Chapter 4 discusses electron resist exposure modeling. Chapter 5 presents the fundamentals of ion-beam lithography. Mask/wafer alignment for x-ray proximity printing and for optical lithography is tackled in Chapter 6. Chapters 7 and 8 on metrology deal with the characterization of lithography by measurements of various types.
Engineers, scientists, and technical managers in the semiconductor industry, and engineering and applied physics faculty and graduate students will find the text very useful.
- No. of pages:
- © Academic Press 1987
- 2nd September 1987
- Academic Press
- eBook ISBN:
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