Lithography for VLSI

List of Contributors

Preface

Chapter 1 Optical Lithography

I. Introduction

II. Optical Resists

III. Contact and Proximity Printing

IV. Projection Printing

References

Chapter 2 Lumped Parameter Model for Optical Lithography

I. Introduction

II. Background

III. Lumped Parameter Model

IV. Comparison with Experimental Data

V. Summary

Appendix A: Image Intensity Distribution

Appendix B: Theory and Mathematics of the Lumped Parameter Model

References

Chapter 3 The Evolution of Electron-Beam Pattern Generators for Integrated Circuit Masks at AT&T Bell Laboratories

I. Introduction

II. Integrated Circuit Masks

III. A New System: EBES4

IV. Overall System Description

V. Conclusions

References

Chapter 4 Electron Resist Process Modeling

I. Introduction

II. Electron-Beam Exposure Modeling

III. Electron Resist Development Modeling

IV. Electron Resist Profile Modeling

V. Conclusions

References

Chapter 5 Ion-Beam Lithography

I. Introduction

II. Processing with Ion Beams

III. Ion-Substrate Interactions

IV. Ion-Beam Lithography Systems and Instrumentation

V. Problems and Limitations in Ion-Beam Lithography

VI. Conclusions

References

Chapter 6 Alignment Techniques in Optical and X-Ray Lithography

I. Introduction

II. Review of Optical Principles

III. Methods of Alignment

IV. Measurement of Aligned Wafers

V. Summary

References

Chapter 7 Metrology in Microlithography

I. Introduction

II. Accuracy and Precision

III. Imaging in the Optical Microscope

IV. Imaging in the Scanning Electron Microscope

V. Dimensional Metrology

VI. Conclusions

References

Chapter 8 Electrical Measurements for Characterizing Lithography

I. Introduction

II. Lithographic Systems

III. Electrical Measurement

IV. Imagery Characterization

V. Overlay Characterization

VI. Conclusion

Appendix A

References

Index