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Laser and Ion Beam Modification of Materials - 1st Edition - ISBN: 9780444819949, 9781483164045

Laser and Ion Beam Modification of Materials

1st Edition

Proceedings of the Symposium U: Material Synthesis and Modification by Ion Beams and Laser Beams of the 3rd IUMRS International Conference on Advanced Materials, Sunshine City, Ikebukuro, Tokyo, Japan, August 31 - September 4, 1993

Editors: I. Yamada H. Ishiwara E. Kamijo
eBook ISBN: 9781483164045
Imprint: Elsevier
Published Date: 1st January 1994
Page Count: 646
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Laser and Ion Beam Modification of Materials is a compilation of materials from the proceedings of the symposium U: Material Synthesis and Modification by Ion beams and Laser Beams. This collection discusses the founding of the KANSAI Science City in Japan, and the structures, equipment, and research projects of two institutions are discussed pertaining to eV-MeV ion beams. A description of ion beams as used in materials research and in manufacturing processes, along with trends in ion implantation technology in semiconductors, is discussed. Research into ion beams by China and its industrial uses in non-semiconductor area is noted. For industrial applications, developing technology in terms of high speed, large surface modifications and use of high doses is important. Thus, the development of different ion beam approaches is examined. Industrial applications of ion and laser processing are discussed as cluster beams are used in solid state physics and chemistry. Mention is made on a high power discharge pumped solid state physics (ArF) excimer laser as a potential light source for better material processing. Under ion beam material processing is nanofabrication using focused ion beams, important for research work in mesoscopic systems. Progress in the use of ion-beam mixing using kinetic energy of ion-beams to mingle with pre-deposited surface layers of substrate materials has shown promise. Advanced materials researchers and scientists, as well as academicians in the field of nuclear physics, will find this collection helpful.

Table of Contents

General Preface

Conference Organizers, Sponsor, Advisors


Supporting Sponsors

Contents of Each Volume

Names of Symposia and Organizing Committees

Symposium U Materials Synthesis and Modification by Ion Beams and/or Laser Beams


Organizers and Committees

Sponsors and Session Chairmen

1. Plenary Talks

Review of Ion Engineering Center Corporation and Related Research Projects in Ion Engineering Research Institute Corporation

Development Program for Advanced Material-Processing and Machining Technology in Japan

2. Prospects for Ion/Laser Processes

The Growth of Heterostructures by Pulsed Laser Deposition

Ion Beams Past and Present

Trends in Ion Implantation Technology of Semiconductors

Ion Beam Research in China

3. Large Scale Ion Beam Systems

Development of High Current Metal Ion Beams

Development of a High Energy Large Sheet Ion Beam System and a Low Energy Ion Beam Deposition System

Multiple Ionized-Beams System for High Deposition Rates

High Energy High Current Ion Implantation System Using Variable Energy RFQ

Electrostatic Accelerators Facility for Multiple Ion Beam Applications

Experiment of Wide Energy Range Control for Metal Ion Beam

Development of a Reentrant-Cavity-Type Electron Cyclotron Resonance (ECR) Ion Source and its Applications for Material Processing

Facilities for In Situ Ion Beam Studies in Transmission Electron Microscopes

4. Ionized Cluster Beams

Surface Modification with Ionized Gas-Cluster Beams

Ionized Cluster Beam Source Characteristics for High-Intensity Cluster Deposition and Erosion

Molecular-Dynamics Simulation of Metal Surface Sputtering by Energetic Rare-Gas Cluster Impact

Irradiation Effects of Gas-Cluster Ar Ion Beams on Solid Surfaces

5. Ion and Laser Processing for Industrial Applications

Ionized Cluster Beam Techniques for Film Formation

Fabrication of Soft X-ray Multilayer Mirrors Using Low Energy Ion Beam

Modification of Large Area Glass Surfaces by Ion Implantation

Investigation of Laser and Ion Beam Applications for Industrial Use

High Current Metal Ion Beam Transport Through a 90° Sector Magnet

Performance Characteristics of a Sheet-Shaped Microwave Ion Source Using Slot Antennas on a Rectangular Waveguide

6. Thin Film Deposition by Ion Beams I

Iron Film Formation by Ion Beam Deposition

In-situ STM Observation of Surfaces Irradiated with Low Energy Ion Beam

In-situ Subplantation of Low-Energy (~100 eV) C+ into GaAs using Combined Ion Beam and Molecular Beam Epitaxy

Al/Si Epitaxial Deposition by UHV Electric-Mirror Sputtering

Structural Studies on C60 Thin Films Formed by Ionized Cluster Beam Deposition

Diamond-Like Carbon Films Produced by Cluster Deposition

Thermal Stability of Mo-based Multilayer Soft X-ray Mirrors

7. Large Scale Laser Systems

High-Power High Beam Quality ArF Laser

High-Repetition-Rate XeCl Excimer Laser

High Repetition Rate Operation of a High Power Long Pulse XeCl Laser

Beam Manipulation Techniques for KrF Excimer Laser

8. Laser Processes I

Formation of Low Stress SiO2 Films by Physical Vapor Deposition Using a CO2 Laser

Surface Alterations of Quartz Glass with Vacuum Ultraviolet Rare Gas Excimer Lasers

Chemical Processes in Laser-Induced Aerosol Formation from Vaporized Carbon Disulfide

Ionic Clusters of Triazine Derivatives Produced by Matrix-Assisted N2 Laser Desorption and CO2 Laser Desorption

Improvement of High Temperature Oxidation Resistance by Laser Remelted Si-Cr-Ti Coating on C103-Nb alloy

Photon Assisted Implantation of B and As in Si

Enhanced Vacuum Ultraviolet and X-ray Radiation from Electrically Controlled KrF Laser Plasma

9. Thin Film Deposition by Ion Beams II

Epitaxial Growth of Metal-Insulator-Metal Structures on Si(lll) Substrates

Characteristics of Polyimide Prepared by Ion Beam Assisted Vapor Deposition

Epitaxial Al Films Grown on Heavily Doped Si(100) Surfaces by ICB Methods for Fabricating ULSI Contacts

Zn3P2 Thin Film Growth by Ionized-Cluster Beam Deposition

STM Observations of the Initial Growth Processes of Metal Thin Film

Formation of TiN Barrier Films at the Bottom of Contact Holes by Ionized Cluster Beam

Low Temperature Growth of Epitaxial and Highly Oriented TiO2 Rutile Films by ICB

10. Laser Processes II

Laser-Induced Deposition of Aluminum Thin Film

Laser Ablation Studies Relevant to Thin Film Deposition

Production of CnN Clusters by Laser Vaporization of a Nitrogen-Rich Polymer

Organic Thin Films Formation by Laser Ablation

Preparation of Organic Fine Particles by Excimer Laser-Induced Ablation of Solid Organic Monomers

KrF Laser Source with Variable Pulse Width for Material Processing

Characterization of Tungsten-Silicon Multilayer Mirrors Fabricated Using an ArF Excimer Laser

Excimer Laser-assisted Chemical Etching of Copper and Silicon in Chlorine Atmospheres

11. Laser Processes III

Thin Film Growth by Pulsed Laser Deposition

Large Area Oxide Thin Film by Laser Deposition

Laser Ablation in Epitaxial Growth and Processing of Semiconductor Quantum Wells and Superlattices

Off-Axis Laser Deposition of YBa2Cu3O7-δ Thin Films and SrTiO3 Insulation Layers

Reduction of Particulates on Laser Deposited Thin Films

Gated ICCD Photography of the KrF-Laser Ablation of Graphite into Background Gases

Characterization of Laser Ablated Plasma Plume from Pb(Zrx,Ti1-x)O3 Target

12. Ion Implantation I

Lattice Damage During Ion Implantation of Semiconductors

Application of Large Area Ion-Doping Technique to AM-LCD

Photoluminescence Investigation of a New Emission Formed in Mn+ Implanted Ultra-Pure GaAs Grown by MBE

Incorporation of Implanted Hydrogen in Si

High Energy Heavy Ion Irradiation Effects on Electron Transport Property in La2-xSrxCuO4

Crystallization Behavior of Silicon Implanted with Copper

Shallow SIMOX Technology (SST): A Double Mechanically Scanned Approach

Epitaxial Crystallization of a-Si and a-GaAs Induced by Low-Energy Ion Bombardments

13. Ion Implantation II

Multiple-Species Implantation for Defect Engineering of Shallow p+ Junctions in Si(100)

Heavy Ion Microprobes for Microanalysis of Materials Surfaces

Behavior and Chemical State of Gold Atoms Implanted into Silicon

Ion Induced Damage and Dynamic Annealing Processes

14. Ion Beam Mixing and Sputtering

Synthesis of A1N Thin Films by Dual Ion Beam Sputtering Method

Metallization on Polyimide Film by Ion and Vapor Deposition (IVD) Method

Preparation of Tantalum Oxide Thin Films on Si Substrate by Ion Beam Sputtering

Magnetostriction of Thin Films of TbxDy1-xFe2 Prepared by Ion Beam Sputtering

Epitaxial Growth Condition of Ni Films DC-Bias-Sputter-Deposited on MgO(00l)

Synthesis of A1N Thin Film by Ion Beam Assisted Sputter Deposition

Anomalous Ion Mixing/Sputtering in Metallized Compound Semiconductors

Monoenergetic Positron Beam Formation with 22Na and Electrostatic Field

Tc Decay of Bi-Pb-Sr-Ca-Cu-O Etched by He Ion

Enhancement of Thickness of Nitrogen Compound Layer Formed by Plasma Processing in Metals by Means of Preparative Irradiation of Electron Beam or Ion Beam

Rapid Rate of He Ion Etching Rate of High Tc Bi-Pb-Sr-Ca-Cu-O

Aging Induced High Tc of Excess Etched Bi-Pb-Sr-Ca-Cu-O by He Ion

Polishing of Bi-Pb-Sr-Ca-Cu-O by He Ion Etching

Hydrogen in Silicon: Surface Modification and Passivation of Defects and Impurities

15. Ion Implantation Into Metals, Insulators and Organic Materials

The Tribological Properties of Ion-Implanted JIS SUS304 Stainless Steel

Extension of Implanted Layers Using Repeated Cycles of W-Ti Alloy Evaporation and Multiple B+ Ion Implantation

Acoustic Spectro-Microscopy of Al-Implanted Ni and Ni Alloys

High Resolution Transmission Electron Microscopy of Fe16N2 Produced in Iron by Ion Implantation Method

Ion Implantation and Dynamic Recovery of Tin-Doped Indium Oxide Films

Application of Ion Implantation in a Glass for Radiotherapy

Modification of Surface Hardness of Alumina by Ion Implantation

Depth Dependence of IR Absorption of MeV and GeV Irradiated PMMA and PETP Foils

16. Ion Implantation into Semiconductors

Topological Transformation of In Films on Si Substrates by Ion Irradiation

Ion Beam Synthesis of Heteroepitaxial Si/CoxNi1-xSi2/Si(lll) Structures

Changes of Physical and Chemical Properties of Polycrystalline Silicon Films by Low Energy High Dose Arsenic Implantation

17. Ion Beam Material Processing I

Nanofabrication Using Focused Ion Beams

Plasma Immersion Ion Implantation

Study of Structural Phase Transition by Ion Beams

Formation of Colloidal Ag Precipitates in Fused Silica by MeV Ion Implantation

Modification of Metal Surfaces by Ion Implantation

Ion Implantation of Diamond: Damage, Doping and Lift-Off

Temperature-Dependent Ion Beam Mixing

18. Ion Beam Material Processing II

Solid and Liquid Phase Doping of Energetic Ion Tracks in Polymers

Surface Modification of Sapphire for Enhanced Infrared Window Performance

Furnace Annealing of Single Crystal Zirconia Implanted with Hafnium Ions

Regrowth Measurements in Ion-Beam Amorphised Ceramics Using Time Resolved Reflectivity

Nitrogen and Argon Irradiation of Silver-Implanted Silica

Molecular Beam Epitaxy of Oxide Thin Films Using Mass-Separated Low-Energy 0+ beams

Author Index

Subject Index


No. of pages:
© Elsevier 1994
1st January 1994
eBook ISBN:

About the Editors

I. Yamada

Affiliations and Expertise

Kyoto, Japan

H. Ishiwara

E. Kamijo

Ratings and Reviews