Laser and Ion Beam Modification of Materials

Laser and Ion Beam Modification of Materials

Proceedings of the Symposium U: Material Synthesis and Modification by Ion Beams and Laser Beams of the 3rd IUMRS International Conference on Advanced Materials, Sunshine City, Ikebukuro, Tokyo, Japan, August 31 - September 4, 1993

1st Edition - January 1, 1994

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  • Editors: I. Yamada, H. Ishiwara, E. Kamijo
  • eBook ISBN: 9781483164045

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Laser and Ion Beam Modification of Materials is a compilation of materials from the proceedings of the symposium U: Material Synthesis and Modification by Ion beams and Laser Beams. This collection discusses the founding of the KANSAI Science City in Japan, and the structures, equipment, and research projects of two institutions are discussed pertaining to eV-MeV ion beams. A description of ion beams as used in materials research and in manufacturing processes, along with trends in ion implantation technology in semiconductors, is discussed. Research into ion beams by China and its industrial uses in non-semiconductor area is noted. For industrial applications, developing technology in terms of high speed, large surface modifications and use of high doses is important. Thus, the development of different ion beam approaches is examined. Industrial applications of ion and laser processing are discussed as cluster beams are used in solid state physics and chemistry. Mention is made on a high power discharge pumped solid state physics (ArF) excimer laser as a potential light source for better material processing. Under ion beam material processing is nanofabrication using focused ion beams, important for research work in mesoscopic systems. Progress in the use of ion-beam mixing using kinetic energy of ion-beams to mingle with pre-deposited surface layers of substrate materials has shown promise. Advanced materials researchers and scientists, as well as academicians in the field of nuclear physics, will find this collection helpful.

Table of Contents

  • General Preface

    Conference Organizers, Sponsor, Advisors


    Supporting Sponsors

    Contents of Each Volume

    Names of Symposia and Organizing Committees

    Symposium U Materials Synthesis and Modification by Ion Beams and/or Laser Beams


    Organizers and Committees

    Sponsors and Session Chairmen

    1. Plenary Talks

    Review of Ion Engineering Center Corporation and Related Research Projects in Ion Engineering Research Institute Corporation

    Development Program for Advanced Material-Processing and Machining Technology in Japan

    2. Prospects for Ion/Laser Processes

    The Growth of Heterostructures by Pulsed Laser Deposition

    Ion Beams Past and Present

    Trends in Ion Implantation Technology of Semiconductors

    Ion Beam Research in China

    3. Large Scale Ion Beam Systems

    Development of High Current Metal Ion Beams

    Development of a High Energy Large Sheet Ion Beam System and a Low Energy Ion Beam Deposition System

    Multiple Ionized-Beams System for High Deposition Rates

    High Energy High Current Ion Implantation System Using Variable Energy RFQ

    Electrostatic Accelerators Facility for Multiple Ion Beam Applications

    Experiment of Wide Energy Range Control for Metal Ion Beam

    Development of a Reentrant-Cavity-Type Electron Cyclotron Resonance (ECR) Ion Source and its Applications for Material Processing

    Facilities for In Situ Ion Beam Studies in Transmission Electron Microscopes

    4. Ionized Cluster Beams

    Surface Modification with Ionized Gas-Cluster Beams

    Ionized Cluster Beam Source Characteristics for High-Intensity Cluster Deposition and Erosion

    Molecular-Dynamics Simulation of Metal Surface Sputtering by Energetic Rare-Gas Cluster Impact

    Irradiation Effects of Gas-Cluster Ar Ion Beams on Solid Surfaces

    5. Ion and Laser Processing for Industrial Applications

    Ionized Cluster Beam Techniques for Film Formation

    Fabrication of Soft X-ray Multilayer Mirrors Using Low Energy Ion Beam

    Modification of Large Area Glass Surfaces by Ion Implantation

    Investigation of Laser and Ion Beam Applications for Industrial Use

    High Current Metal Ion Beam Transport Through a 90° Sector Magnet

    Performance Characteristics of a Sheet-Shaped Microwave Ion Source Using Slot Antennas on a Rectangular Waveguide

    6. Thin Film Deposition by Ion Beams I

    Iron Film Formation by Ion Beam Deposition

    In-situ STM Observation of Surfaces Irradiated with Low Energy Ion Beam

    In-situ Subplantation of Low-Energy (~100 eV) C+ into GaAs using Combined Ion Beam and Molecular Beam Epitaxy

    Al/Si Epitaxial Deposition by UHV Electric-Mirror Sputtering

    Structural Studies on C60 Thin Films Formed by Ionized Cluster Beam Deposition

    Diamond-Like Carbon Films Produced by Cluster Deposition

    Thermal Stability of Mo-based Multilayer Soft X-ray Mirrors

    7. Large Scale Laser Systems

    High-Power High Beam Quality ArF Laser

    High-Repetition-Rate XeCl Excimer Laser

    High Repetition Rate Operation of a High Power Long Pulse XeCl Laser

    Beam Manipulation Techniques for KrF Excimer Laser

    8. Laser Processes I

    Formation of Low Stress SiO2 Films by Physical Vapor Deposition Using a CO2 Laser

    Surface Alterations of Quartz Glass with Vacuum Ultraviolet Rare Gas Excimer Lasers

    Chemical Processes in Laser-Induced Aerosol Formation from Vaporized Carbon Disulfide

    Ionic Clusters of Triazine Derivatives Produced by Matrix-Assisted N2 Laser Desorption and CO2 Laser Desorption

    Improvement of High Temperature Oxidation Resistance by Laser Remelted Si-Cr-Ti Coating on C103-Nb alloy

    Photon Assisted Implantation of B and As in Si

    Enhanced Vacuum Ultraviolet and X-ray Radiation from Electrically Controlled KrF Laser Plasma

    9. Thin Film Deposition by Ion Beams II

    Epitaxial Growth of Metal-Insulator-Metal Structures on Si(lll) Substrates

    Characteristics of Polyimide Prepared by Ion Beam Assisted Vapor Deposition

    Epitaxial Al Films Grown on Heavily Doped Si(100) Surfaces by ICB Methods for Fabricating ULSI Contacts

    Zn3P2 Thin Film Growth by Ionized-Cluster Beam Deposition

    STM Observations of the Initial Growth Processes of Metal Thin Film

    Formation of TiN Barrier Films at the Bottom of Contact Holes by Ionized Cluster Beam

    Low Temperature Growth of Epitaxial and Highly Oriented TiO2 Rutile Films by ICB

    10. Laser Processes II

    Laser-Induced Deposition of Aluminum Thin Film

    Laser Ablation Studies Relevant to Thin Film Deposition

    Production of CnN Clusters by Laser Vaporization of a Nitrogen-Rich Polymer

    Organic Thin Films Formation by Laser Ablation

    Preparation of Organic Fine Particles by Excimer Laser-Induced Ablation of Solid Organic Monomers

    KrF Laser Source with Variable Pulse Width for Material Processing

    Characterization of Tungsten-Silicon Multilayer Mirrors Fabricated Using an ArF Excimer Laser

    Excimer Laser-assisted Chemical Etching of Copper and Silicon in Chlorine Atmospheres

    11. Laser Processes III

    Thin Film Growth by Pulsed Laser Deposition

    Large Area Oxide Thin Film by Laser Deposition

    Laser Ablation in Epitaxial Growth and Processing of Semiconductor Quantum Wells and Superlattices

    Off-Axis Laser Deposition of YBa2Cu3O7-δ Thin Films and SrTiO3 Insulation Layers

    Reduction of Particulates on Laser Deposited Thin Films

    Gated ICCD Photography of the KrF-Laser Ablation of Graphite into Background Gases

    Characterization of Laser Ablated Plasma Plume from Pb(Zrx,Ti1-x)O3 Target

    12. Ion Implantation I

    Lattice Damage During Ion Implantation of Semiconductors

    Application of Large Area Ion-Doping Technique to AM-LCD

    Photoluminescence Investigation of a New Emission Formed in Mn+ Implanted Ultra-Pure GaAs Grown by MBE

    Incorporation of Implanted Hydrogen in Si

    High Energy Heavy Ion Irradiation Effects on Electron Transport Property in La2-xSrxCuO4

    Crystallization Behavior of Silicon Implanted with Copper

    Shallow SIMOX Technology (SST): A Double Mechanically Scanned Approach

    Epitaxial Crystallization of a-Si and a-GaAs Induced by Low-Energy Ion Bombardments

    13. Ion Implantation II

    Multiple-Species Implantation for Defect Engineering of Shallow p+ Junctions in Si(100)

    Heavy Ion Microprobes for Microanalysis of Materials Surfaces

    Behavior and Chemical State of Gold Atoms Implanted into Silicon

    Ion Induced Damage and Dynamic Annealing Processes

    14. Ion Beam Mixing and Sputtering

    Synthesis of A1N Thin Films by Dual Ion Beam Sputtering Method

    Metallization on Polyimide Film by Ion and Vapor Deposition (IVD) Method

    Preparation of Tantalum Oxide Thin Films on Si Substrate by Ion Beam Sputtering

    Magnetostriction of Thin Films of TbxDy1-xFe2 Prepared by Ion Beam Sputtering

    Epitaxial Growth Condition of Ni Films DC-Bias-Sputter-Deposited on MgO(00l)

    Synthesis of A1N Thin Film by Ion Beam Assisted Sputter Deposition

    Anomalous Ion Mixing/Sputtering in Metallized Compound Semiconductors

    Monoenergetic Positron Beam Formation with 22Na and Electrostatic Field

    Tc Decay of Bi-Pb-Sr-Ca-Cu-O Etched by He Ion

    Enhancement of Thickness of Nitrogen Compound Layer Formed by Plasma Processing in Metals by Means of Preparative Irradiation of Electron Beam or Ion Beam

    Rapid Rate of He Ion Etching Rate of High Tc Bi-Pb-Sr-Ca-Cu-O

    Aging Induced High Tc of Excess Etched Bi-Pb-Sr-Ca-Cu-O by He Ion

    Polishing of Bi-Pb-Sr-Ca-Cu-O by He Ion Etching

    Hydrogen in Silicon: Surface Modification and Passivation of Defects and Impurities

    15. Ion Implantation Into Metals, Insulators and Organic Materials

    The Tribological Properties of Ion-Implanted JIS SUS304 Stainless Steel

    Extension of Implanted Layers Using Repeated Cycles of W-Ti Alloy Evaporation and Multiple B+ Ion Implantation

    Acoustic Spectro-Microscopy of Al-Implanted Ni and Ni Alloys

    High Resolution Transmission Electron Microscopy of Fe16N2 Produced in Iron by Ion Implantation Method

    Ion Implantation and Dynamic Recovery of Tin-Doped Indium Oxide Films

    Application of Ion Implantation in a Glass for Radiotherapy

    Modification of Surface Hardness of Alumina by Ion Implantation

    Depth Dependence of IR Absorption of MeV and GeV Irradiated PMMA and PETP Foils

    16. Ion Implantation into Semiconductors

    Topological Transformation of In Films on Si Substrates by Ion Irradiation

    Ion Beam Synthesis of Heteroepitaxial Si/CoxNi1-xSi2/Si(lll) Structures

    Changes of Physical and Chemical Properties of Polycrystalline Silicon Films by Low Energy High Dose Arsenic Implantation

    17. Ion Beam Material Processing I

    Nanofabrication Using Focused Ion Beams

    Plasma Immersion Ion Implantation

    Study of Structural Phase Transition by Ion Beams

    Formation of Colloidal Ag Precipitates in Fused Silica by MeV Ion Implantation

    Modification of Metal Surfaces by Ion Implantation

    Ion Implantation of Diamond: Damage, Doping and Lift-Off

    Temperature-Dependent Ion Beam Mixing

    18. Ion Beam Material Processing II

    Solid and Liquid Phase Doping of Energetic Ion Tracks in Polymers

    Surface Modification of Sapphire for Enhanced Infrared Window Performance

    Furnace Annealing of Single Crystal Zirconia Implanted with Hafnium Ions

    Regrowth Measurements in Ion-Beam Amorphised Ceramics Using Time Resolved Reflectivity

    Nitrogen and Argon Irradiation of Silver-Implanted Silica

    Molecular Beam Epitaxy of Oxide Thin Films Using Mass-Separated Low-Energy 0+ beams

    Author Index

    Subject Index

Product details

  • No. of pages: 646
  • Language: English
  • Copyright: © Elsevier 1994
  • Published: January 1, 1994
  • Imprint: Elsevier
  • eBook ISBN: 9781483164045

About the Editors

I. Yamada

Affiliations and Expertise

Kyoto, Japan

H. Ishiwara

E. Kamijo

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