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Ion Implantation Science and Technology - 2nd Edition - ISBN: 9780127806211, 9780323161657

Ion Implantation Science and Technology

2nd Edition

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Editor: J.F. Ziegler
eBook ISBN: 9780323161657
Imprint: Academic Press
Published Date: 28th June 1988
Page Count: 508
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Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Table of Contents




Part I: Ion Implantation Science

The Stopping and Range of Ions in Solids

Ion Implantation Damage in Silicon

Experimental Annealing and Activation

Measurement of Ion Implantation

Part II: Ion Implantation Technology

An Introduction to Ion Sources

Ion Optics and Focusing in Implanter Design

Wafer Cooling, Faraday Design and Wafer Charging

Photoresist Problems and Particle Contamination

Ion Implantation Diagnostics and Process Control

Safety Considerations for Ion Implanters

Emission of Ionizing Radiation from Ion Implanters



No. of pages:
© Academic Press 1988
28th June 1988
Academic Press
eBook ISBN:

About the Editor

J.F. Ziegler

Affiliations and Expertise

IBM Research, Yorktown Heights, NY, USA

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