Ion Implantation Science and Technology

Ion Implantation Science and Technology

1st Edition - January 1, 1984

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  • Editor: J.F. Ziegler
  • eBook ISBN: 9780323144018

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Description

Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Table of Contents


  • Contents

    Contributors

    Preface

    Part I: Ion Implantation Science

    The Historical Development of Ion Implantation

    The Stopping and Range of Ions in Solids

    Ion Implantation Damage in Silicon

    Damage Annealing in Silicon and Electrical Activity

    Measurement of Electrically Active Dopants

    Ion Implantation Metallurgy

    Part II: Ion Implantation Technology

    Ion Implantation System Concepts

    An Introduction to Ion Sources

    Some Principles Underlying Ion Optics Design

    Mapping of Ion Implanted Wafers

    Measurement and Control of Ion Implantation Accelerator Parameters

    Ion Implantation: Safety and Radiation Considerations

    Index

Product details

  • No. of pages: 648
  • Language: English
  • Copyright: © Academic Press 1984
  • Published: January 1, 1984
  • Imprint: Academic Press
  • eBook ISBN: 9780323144018

About the Editor

J.F. Ziegler

Affiliations and Expertise

IBM Research, Yorktown Heights, NY, USA

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