Ion Implantation Science and Technology - 1st Edition - ISBN: 9780127806204, 9780323144018

Ion Implantation Science and Technology

1st Edition

Editors: J.F. Ziegler
eBook ISBN: 9780323144018
Imprint: Academic Press
Published Date: 1st January 1984
Page Count: 648
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Description

Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.

Table of Contents


Contents

Contributors

Preface

Part I: Ion Implantation Science

The Historical Development of Ion Implantation

The Stopping and Range of Ions in Solids

Ion Implantation Damage in Silicon

Damage Annealing in Silicon and Electrical Activity

Measurement of Electrically Active Dopants

Ion Implantation Metallurgy

Part II: Ion Implantation Technology

Ion Implantation System Concepts

An Introduction to Ion Sources

Some Principles Underlying Ion Optics Design

Mapping of Ion Implanted Wafers

Measurement and Control of Ion Implantation Accelerator Parameters

Ion Implantation: Safety and Radiation Considerations

Index

Details

No. of pages:
648
Language:
English
Copyright:
© Academic Press 1984
Published:
Imprint:
Academic Press
eBook ISBN:
9780323144018

About the Editor

J.F. Ziegler

Affiliations and Expertise

IBM Research, Yorktown Heights, NY, USA

Ratings and Reviews