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Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Part I: Ion Implantation Science
The Historical Development of Ion Implantation
The Stopping and Range of Ions in Solids
Ion Implantation Damage in Silicon
Damage Annealing in Silicon and Electrical Activity
Measurement of Electrically Active Dopants
Ion Implantation Metallurgy
Part II: Ion Implantation Technology
Ion Implantation System Concepts
An Introduction to Ion Sources
Some Principles Underlying Ion Optics Design
Mapping of Ion Implanted Wafers
Measurement and Control of Ion Implantation Accelerator Parameters
Ion Implantation: Safety and Radiation Considerations
- No. of pages:
- © Academic Press 1984
- 1st January 1984
- Academic Press
- eBook ISBN:
IBM Research, Yorktown Heights, NY, USA
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